title: Nanopillar array with a λ/11 diameter fabricated by a kind of visible CW laser direct lithography system.
abstract: Nanoscale functional structures are indispensable elements in many fields of modern science. In this paper, nanopillar array with a pillar diameter far smaller than Abbe's diffraction limit is realized by a new kind of continuous wave (CW) laser direct lithography technology. With atomic force microscopy technology, the average diameter of nanopillars on thin OIR906 photoresist film is about 65 nm and the smallest diameter is 48 nm, which is about 1/11 of the incident laser wavelength. Also, the influences of coma and astigmatism effects to the shape and size of nanopillar are numerically simulated by utilizing vector integral. As far as we know, it is the first time that nanopillar array is implemented by a donut-shaped 532-nm visible CW laser. The study presents a new, simple, inexpensive, and effective approach for nanopillar/pore array fabrication.
authors.affiliation: Institute of Photonics and Photo-technology, International Scientific and Technological Cooperation Base of Photoelectric Technology and Functional Materials and Application, Northwest University, 229 North Taibai Rd, Xi'an, 710069, People's Republic of China. wangkg@nwu.edu.cn.
authors.forename: Chen
authors.initials: C
authors.lastname: Zhang
authors.forename: Kaige
authors.initials: K
authors.lastname: Wang
authors.forename: Jintao
authors.initials: J
authors.lastname: Bai
authors.forename: Shuang
authors.initials: S
authors.lastname: Wang
authors.forename: Wei
authors.initials: W
authors.lastname: Zhao
authors.forename: Fang
authors.initials: F
authors.lastname: Yang
authors.forename: Changzhi
authors.initials: C
authors.lastname: Gu
authors.forename: Guiren
authors.initials: G
authors.lastname: Wang