title: Self-assembly and hierarchical patterning of aligned organic nanowire arrays by solvent evaporation on substrates with patterned wettability.
abstract: The controlled growth and alignment of one-dimensional organic nanostructures at well-defined locations considerably hinders the integration of nanostructures for electronic and optoelectronic applications. Here, we demonstrate a simple process to achieve the growth, alignment, and hierarchical patterning of organic nanowires on substrates with controlled patterns of surface wettability. The first-level pattern is confined by the substrate patterns of wettability. Organic nanostructures are preferentially grown on solvent wettable regions. The second-level pattern is the patterning of aligned organic nanowires deposited by controlling the shape and movement of the solution contact lines during evaporation on the wettable regions. This process is controlled by the cover-hat-controlled method or vertical evaportation method. Therefore, various new patterns of organic nanostructures can be obtained by combing these two levels of patterns. This simple method proves to be a general approach that can be applied to other organic nanostructure systems. Using the as-prepared patterned nanowire arrays, an optoelectronic device (photodetector) is easily fabricated. Hence, the proposed simple, large-scale, low-cost method of preparing patterns of highly ordered organic nanostructures has high potential applications in various electronic and optoelectronic devices.
authors.affiliation: Nano-organic Photoelectronic Laboratory and Key Laboratory of Photochemical Conversion and Optoelectronic Materials, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China.
authors.forename: Rong-Rong
authors.initials: RR
authors.lastname: Bao
authors.forename: Cheng-Yi
authors.initials: CY
authors.lastname: Zhang
authors.forename: Xiu-Juan
authors.initials: XJ
authors.lastname: Zhang
authors.forename: Xue-Mei
authors.initials: XM
authors.lastname: Ou
authors.forename: Chun-Sing
authors.initials: CS
authors.lastname: Lee
authors.forename: Jian-Sheng
authors.initials: JS
authors.lastname: Jie
authors.forename: Xiao-Hong
authors.initials: XH
authors.lastname: Zhang
mesh_terms: D000627:Aminophenols / Q000737:chemistry; D003503:Cyclobutanes / Q000737:chemistry; D008422:Materials Testing; D008752:Methylene Chloride / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D053770:Nanowires / Q000737:chemistry*; D012666:Semiconductors; D012822:Silicon Dioxide / Q000737:chemistry; D012997:Solvents / Q000737:chemistry; D014835:Volatilization; D017155:Wettability
chemical_list: C578774:2,4-bis(4-(N,N-diisobutylamino)-2,6-dihydroxyphenyl)squaraine; D000627:Aminophenols; D003503:Cyclobutanes; D012997:Solvents; D008752:Methylene Chloride; D012822:Silicon Dioxide