title: A novel planarization method based on photoinduced confined chemical etching.
abstract: A photoinduced confined chemical etching system based on TiO2 nanotube arrays is developed for the planarization of the copper surface, which is proved to be a prospective stress-free chemical planarization method for metals and semiconductors.
authors.affiliation: State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, China.
authors.forename: Qiuyan
authors.initials: Q
authors.lastname: Fang
authors.forename: Jian-Zhang
authors.initials: JZ
authors.lastname: Zhou
authors.forename: Dongping
authors.initials: D
authors.lastname: Zhan
authors.forename: Kang
authors.initials: K
authors.lastname: Shi
authors.forename: Zhao-Wu
authors.initials: ZW
authors.lastname: Tian
authors.forename: Zhong-Qun
authors.initials: ZQ
authors.lastname: Tian