title: Sub-15 nm linewidth gratings using  roll-to-roll nanoimprinting and plasma  trimming to fabricate flexible wire-grid  polarizers with low colour shift.
abstract: Sub-15 nm-wide gratings with a high aspect ratio of up to 16:1 were fabricated using roll-to-roll nanoimprinting and plasma trimming to achieve high optical performance (up to 12 000:1 extinction ratio with an average transmittance of 82%) and low colour shift (transmittance variation less than 3%) flexible wire-grid polarizers for display applications. We applied two imprint platforms onto glass and plastic substrates to identify the optical properties and characteristics of each fabrication process. To enhance the tolerance, reproducibility, and optical performance of the process, the grating profile symmetry and varying residual layer thicknesses were precisely simulated and controlled to achieve the design targets.
authors.affiliation: Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan.
authors.forename: Chien-Li
authors.initials: CL
authors.lastname: Wu
authors.forename: Cheng-Kuo
authors.initials: CK
authors.lastname: Sung
authors.forename: Po-Hung
authors.initials: PH
authors.lastname: Yao
authors.forename: Cheng-Huan
authors.initials: CH
authors.lastname: Chen