title: Self-assembly of a halogenated molecule on oxide-passivated Cu(110).
abstract: The supramolecular self-assembly of brominated molecules was investigated and compared on Cu(110) and Cu(110)-O(2×1) surfaces under ultrahigh vacuum. By using scanning tunnelling microscopy, we show that brominated molecules form a disordered structure on Cu(110), whereas a well-ordered supramolecular network is observed on the Cu(110)-O(2×1) surface. The different adsorption behaviors of these two surfaces are described in terms of weakened molecule-substrate interactions on Cu(110)-O(2×1) as opposed to bare Cu(110). The effect of oxygen-passivation is to suppress debromination and it can be a convenient approach for investigating other self-assembly processes on copper-based substrates.
authors.affiliation: Centre Énergie, Matériaux et Télécommunication, Institut National de la Recherche Scientifique, Université du Québec, 1650 boulevard Lionel-Boulet, Varennes, QC J3X 1S2, Canada. elgarah@emt.inrs.ca
authors.forename: Mohamed
authors.initials: M
authors.lastname: El Garah
authors.forename: Josh
authors.initials: J
authors.lastname: Lipton-Duffin
authors.forename: Jennifer M
authors.initials: JM
authors.lastname: MacLeod
authors.forename: Rico
authors.initials: R
authors.lastname: Gutzler
authors.forename: Frank
authors.initials: F
authors.lastname: Palmino
authors.forename: Vincent
authors.initials: V
authors.lastname: Luzet
authors.forename: Frédéric
authors.initials: F
authors.lastname: Chérioux
authors.forename: Federico
authors.initials: F
authors.lastname: Rosei
keywords: copper; dehalogenation; scanning tunneling microscopy; self-assembly; template synthesis