title: Nanoimprint lithography with a focused laser beam for the fabrication of nanopatterned microchannel molds.
abstract: We present a process based on nanoimprint lithography for the fabrication of a microchannel mold having nanopatterns formed at the bottoms of its microchannels. A focused laser beam selectively cures the resist in the micrometer scale during nanoimprint lithography. Nanopatterns within the microchannels may be used to control microfluidic behavior.
authors.affiliation: Korea Institute of Machinery and Materials, 156 Gajeongbuk-ro, Yuseong-gu, Daejeon 305-343, South Korea.
authors.forename: Hyungjun
authors.initials: H
authors.lastname: Lim
authors.forename: Jihyeong
authors.initials: J
authors.lastname: Ryu
authors.forename: Geehong
authors.initials: G
authors.lastname: Kim
authors.forename: Kee-Bong
authors.initials: KB
authors.lastname: Choi
authors.forename: Sunghwi
authors.initials: S
authors.lastname: Lee
authors.forename: Jaejong
authors.initials: J
authors.lastname: Lee
mesh_terms: D007834:Lasers; D046210:Microfluidic Analytical Techniques / Q000379:methods*; D008855:Microscopy, Electron, Scanning; D036103:Nanotechnology / Q000379:methods*; D011327:Printing / Q000379:methods*