title: Enhanced refractive index sensitivity of elevated short-range ordered nanohole arrays in optically thin plasmonic Au films.
abstract: A simple development of the colloidal lithography technique is demonstrated for fabrication of perforated plasmonic metal films elevated above the substrate surface. The bulk refractive index sensitivity of short-range ordered nanohole arrays in 20 nm thick Au films exhibits an increase of up to 37% due to reduction of substrate effect caused by lifting with a 40 nm silica layer. Analysis of the local electric field distribution suggests that the sensitivity increase is due to revealing of the enhanced field near the holes.
authors.affiliation: Interdisciplinary Nanoscience Center (iNANO), Aarhus University, Aarhus, Denmark.
authors.forename: Vladimir E
authors.initials: VE
authors.lastname: Bochenkov
authors.forename: Maj
authors.initials: M
authors.lastname: Frederiksen
authors.forename: Duncan S
authors.initials: DS
authors.lastname: Sutherland
mesh_terms: D003460:Crystallization / Q000379:methods; D004867:Equipment Design; D019544:Equipment Failure Analysis; D006046:Gold / Q000737:chemistry*; D008567:Membranes, Artificial; D053768:Metal Nanoparticles / Q000737:chemistry* / Q000648:ultrastructure*; D058608:Nanopores / Q000648:ultrastructure*; D010316:Particle Size; D012031:Refractometry / Q000295:instrumentation*
chemical_list: D008567:Membranes, Artificial; D006046:Gold