title: Enhancement of the reflectivity of Al/Zr multilayers by a novel structure.
abstract: The reflectivity of Al/Zr multilayers is enhanced by the use of a novel structure. The Al layers are divided by insertion of Si layers. In addition, Si barrier layers are inserted at the Al/Zr interfaces (Zr-on-Al and Al-on-Zr). As a result, crystallization of the Al layer is inhibited and that of Zr is enhanced. In grazing incidence x-ray reflectometry, x-ray diffraction, and extreme ultraviolet measurements, the novel multilayers exhibit lower interfacial roughness compared with traditional multilayer structures, and their reflectivity is increased from 48.2% to 50.0% at a 5° angle of incidence. These novel multilayers also have potential applications in other multilayer systems and the semiconductor industry.
authors.affiliation: MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092, China.
authors.forename: Qi
authors.initials: Q
authors.lastname: Zhong
authors.forename: Zhong
authors.initials: Z
authors.lastname: Zhang
authors.forename: Runze
authors.initials: R
authors.lastname: Qi
authors.forename: Jia
authors.initials: J
authors.lastname: Li
authors.forename: Zhanshan
authors.initials: Z
authors.lastname: Wang
authors.forename: Karine
authors.initials: K
authors.lastname: Le Guen
authors.forename: Jean-Michel
authors.initials: JM
authors.lastname: André
authors.forename: Philippe
authors.initials: P
authors.lastname: Jonnard
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D008027:Light; D008422:Materials Testing; D010783:Photometry / Q000379:methods*; D012031:Refractometry / Q000379:methods*; D012542:Scattering, Radiation; D012825:Silicon / Q000737:chemistry*; D015040:Zirconium / Q000737:chemistry*
chemical_list: D015040:Zirconium; D000535:Aluminum; D012825:Silicon