title: High-voltage nanosecond pulses in a low-pressure radio-frequency discharge.
abstract: An influence of a high-voltage (3-17 kV) 20 ns pulse on a weakly-ionized low-pressure (0.1-10 Pa) capacitively coupled radiofrequency (RF) argon plasma is studied experimentally. The plasma evolution after pulse exhibits two characteristic regimes: a bright flash, occurring within 100 ns after the pulse (when the discharge emission increases by 2-3 orders of magnitude over the steady-state level), and a dark phase, lasting a few hundreds μs (when the intensity of the discharge emission drops significantly below the steady-state level). The electron density increases during the flash and remains very large at the dark phase. 1D3V particle-in-cell simulations qualitatively reproduce both regimes and allow for detailed analysis of the underlying mechanisms. It is found that the high-voltage nanosecond pulse is capable of removing a significant fraction of plasma electrons out of the discharge gap, and that the flash is the result of the excitation of gas atoms, triggered by residual electrons accelerated in the electric field of immobile bulk ions. The secondary emission from the electrodes due to vacuum UV radiation plays an important role at this stage. High-density plasma generated during the flash provides efficient screening of the RF field (which sustains the steady-state plasma). This leads to the electron cooling and, hence, onset of the dark phase.
authors.affiliation: Max-Planck-Institut für Extraterrestrische Physik, Giessenbachstrasse 1, 85741 Garching, Germany. pustylnik@mpe.mpg.de
authors.forename: M Y
authors.initials: MY
authors.lastname: Pustylnik
authors.forename: L
authors.initials: L
authors.lastname: Hou
authors.forename: A V
authors.initials: AV
authors.lastname: Ivlev
authors.forename: L M
authors.initials: LM
authors.lastname: Vasilyak
authors.forename: L
authors.initials: L
authors.lastname: Couëdel
authors.forename: H M
authors.initials: HM
authors.lastname: Thomas
authors.forename: G E
authors.initials: GE
authors.lastname: Morfill
authors.forename: V E
authors.initials: VE
authors.lastname: Fortov