title: Minimum detection limit and spatial resolution of thin-sample field-emission electron probe microanalysis.
abstract: The minimum detection limit and spatial resolution for a thinned semiconductor sample were determined by electron probe microanalysis (EPMA) using a Schottky field emission (FE) electron gun and wavelength dispersive X-ray spectrometry. Comparison of the FE-EPMA results with those obtained using energy dispersive X-ray spectrometry in conjunction with scanning transmission electron microscopy, confirmed that FE-EPMA is largely superior in terms of detection sensitivity. Thin-sample FE-EPMA is demonstrated as a very effective method for high resolution, high sensitivity analysis in a laboratory environment because a high probe current and high signal-to-noise ratio can be achieved.
authors.affiliation: Analysis Technology Research Center, Sumitomo Electric Industries, Ltd., 1 Taya-cho, Sakae-ku, Yokohama 244-8588, Japan. Electronic address: kubo-yugo@sei.co.jp.
authors.forename: Yugo
authors.initials: Y
authors.lastname: Kubo
authors.forename: Kotaro
authors.initials: K
authors.lastname: Hamada
authors.forename: Akira
authors.initials: A
authors.lastname: Urano
keywords: EDX; EPMA; FE; STEM; WDX