title: Boron-doped peroxo-zirconium oxide dielectric for high-performance, low-temperature, solution-processed indium oxide thin-film transistor.
abstract: We developed a solution-processed indium oxide (In2O3) thin-film transistor (TFT) with a boron-doped peroxo-zirconium (ZrO2:B) dielectric on silicon as well as polyimide substrate at 200 °C, using water as the solvent for the In2O3 precursor. The formation of In2O3 and ZrO2:B films were intensively studied by thermogravimetric differential thermal analysis (TG-DTA), attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FT IR), high-resolution X-ray diffraction (HR-XRD), and X-ray photoelectron spectroscopy (XPS). Boron was selected as a dopant to make a denser ZrO2 film. The ZrO2:B film effectively blocked the leakage current at 200 °C with high breakdown strength. To evaluate the ZrO2:B film as a gate dielectric, we fabricated In2O3 TFTs on the ZrO2:B dielectrics with silicon substrates and annealed the resulting samples at 200 and 250 °C. The resulting mobilities were 1.25 and 39.3 cm(2)/(V s), respectively. Finally, we realized a flexible In2O3 TFT with the ZrO2:B dielectric on a polyimide substrate at 200 °C, and it successfully operated a switching device with a mobility of 4.01 cm(2)/(V s). Our results suggest that aqueous solution-processed In2O3 TFTs on ZrO2:B dielectrics could potentially be used for low-cost, low-temperature, and high-performance flexible devices.
authors.affiliation: Department of Materials Science and Engineering, Yonsei University, 50 Yonsei-ro, Seodaemun-gu, Seoul 120-749, South Korea.
authors.forename: Jee Ho
authors.initials: JH
authors.lastname: Park
authors.forename: Young Bum
authors.initials: YB
authors.lastname: Yoo
authors.forename: Keun Ho
authors.initials: KH
authors.lastname: Lee
authors.forename: Woo Soon
authors.initials: WS
authors.lastname: Jang
authors.forename: Jin Young
authors.initials: JY
authors.lastname: Oh
authors.forename: Soo Sang
authors.initials: SS
authors.lastname: Chae
authors.forename: Hyun Woo
authors.initials: HW
authors.lastname: Lee
authors.forename: Sun Woong
authors.initials: SW
authors.lastname: Han
authors.forename: Hong Koo
authors.initials: HK
authors.lastname: Baik
mesh_terms: D007204:Indium / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry; D013696:Temperature; D014173:Transistors, Electronic; D015040:Zirconium / Q000737:chemistry*
chemical_list: D007204:Indium; C047711:indium oxide; D015040:Zirconium; C028541:zirconium oxide; D012825:Silicon