title: Desktop nanofabrication with massively multiplexed beam pen lithography.
abstract: The development of a lithographic method that can rapidly define nanoscale features across centimetre-scale surfaces has been a long-standing goal for the nanotechnology community. If such a 'desktop nanofab' could be implemented in a low-cost format, it would bring the possibility of point-of-use nanofabrication for rapidly prototyping diverse functional structures. Here we report the development of a new tool that is capable of writing arbitrary patterns composed of diffraction-unlimited features over square centimetre areas that are in registry with existing patterns and nanostructures. Importantly, this instrument is based on components that are inexpensive compared with the combination of state-of-the-art nanofabrication tools that approach its capabilities. This tool can be used to prototype functional electronic devices in a mask-free fashion in addition to providing a unique platform for performing high-throughput nano- to macroscale photochemistry with relevance to biology and medicine.
authors.affiliation: Department of Materials Science and Engineering, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208, USA.
authors.forename: Xing
authors.initials: X
authors.lastname: Liao
authors.forename: Keith A
authors.initials: KA
authors.lastname: Brown
authors.forename: Abrin L
authors.initials: AL
authors.lastname: Schmucker
authors.forename: Guoliang
authors.initials: G
authors.lastname: Liu
authors.forename: Shu
authors.initials: S
authors.lastname: He
authors.forename: Wooyoung
authors.initials: W
authors.lastname: Shim
authors.forename: Chad A
authors.initials: CA
authors.lastname: Mirkin
mesh_terms: D004581:Electronics; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000295:instrumentation / Q000379:methods*; D055668:Photochemical Processes; D011327:Printing / Q000295:instrumentation / Q000379:methods*; D013499:Surface Properties