title: Line patterns from cylinder-forming photocleavable block copolymers.
abstract: A robust route for the preparation of nanoscopic line patterns from polystyrene-block-poly(ethylene oxide) featuring a photocleavable o-nitrobenzyl ester junction is demonstrated. After mild UV (λ = 365 nm) exposure and selective removal of the PEO microdomains, the polymer trench patterns are used as scaffold to fabricate highly ordered arrays of silica or Au line patterns.
authors.affiliation: Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA.
authors.forename: Weiyin
authors.initials: W
authors.lastname: Gu
authors.forename: Hui
authors.initials: H
authors.lastname: Zhao
authors.forename: Qingshuo
authors.initials: Q
authors.lastname: Wei
authors.forename: E Bryan
authors.initials: EB
authors.lastname: Coughlin
authors.forename: Patrick
authors.initials: P
authors.lastname: Theato
authors.forename: Thomas P
authors.initials: TP
authors.lastname: Russell
keywords: block copolymers; line patterns; nanotemplates; photocleavable; self-assembly