title: Fabrication of porous noble metal thin-film electrode by reactive magnetron sputtering.
abstract: Porous platinum films have been fabricated by reactive sputtering combined with subsequent thermal annealing. Using the SEM, XRD, XPS, and polarization resistance measurement techniques, the microstructural development of the film and its resultant electrochemical properties have been characterized. Pore evolution was understood as a result of the thermal grooving of platinum during annealing process. We demonstrated that crystallization should be followed by agglomeration for the evolution of porous microstructures. Furthermore, reaction sputtering affected the adhesion enhancement between the film and substrate compared to the film deposited by non-reactive sputtering. The polarization resistance of the porous platinum film was five times lower than that of the dense platinum film. At 600 degrees C the resistance of the porous film was 5.67 omega x cm2, and that of the dense film was 38 omega x cm2.
authors.affiliation: High Temperature Energy Materials Center, KIST, Seoul 136-791, Republic of Korea.
authors.forename: Tae-Shin
authors.initials: TS
authors.lastname: Cho
authors.forename: Heonjin
authors.initials: H
authors.lastname: Choi
authors.forename: Joosun
authors.initials: J
authors.lastname: Kim