title: Nanoprofiles evaluation of ZnO thin films by an evanescent light method.
abstract: The extraction efficiency of evanescent light from ZnO nanolayers and their thickness profiles in the range of (1-105) nm was evaluated by a new microscopy technique, differential evanescent light intensity imaging method. It is based on capturing the evanescent light scattered by the layer of the material deposited on glass substrates. The analyzed ZnO films were obtained by pulsed laser deposition at 27°C and 100°C, using a nanosecond UV laser source.
authors.affiliation: EE Department, Holon Institute of Technology, Holon, Israel, 58102.
authors.forename: Nina
authors.initials: N
authors.lastname: Mirchin
authors.forename: Aaron
authors.initials: A
authors.lastname: Peled
authors.forename: Liviu
authors.initials: L
authors.lastname: Duta
authors.forename: Andrei C
authors.initials: AC
authors.lastname: Popescu
authors.forename: Gabriela
authors.initials: G
authors.lastname: Dorcioman
authors.forename: Ion N
authors.initials: IN
authors.lastname: Mihailescu
keywords: ZnO nanofilms; evanescent wave imaging; pulsed laser deposition