title: Combining UV lithography and an imprinting technique for patterning metal-organic frameworks.
abstract: Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices.
authors.affiliation: CSIRO Division of Materials Science and Engineering (CMSE), Private Bag 33, Clayton South MDC, Victoria 3169, Australia. Cara.Doherty@csiro.au.
authors.forename: Cara M
authors.initials: CM
authors.lastname: Doherty
authors.forename: Gianluca
authors.initials: G
authors.lastname: Grenci
authors.forename: Raffaele
authors.initials: R
authors.lastname: Riccò
authors.forename: James I
authors.initials: JI
authors.lastname: Mardel
authors.forename: Julien
authors.initials: J
authors.lastname: Reboul
authors.forename: Shuhei
authors.initials: S
authors.lastname: Furukawa
authors.forename: Susumu
authors.initials: S
authors.lastname: Kitagawa
authors.forename: Anita J
authors.initials: AJ
authors.lastname: Hill
authors.forename: Paolo
authors.initials: P
authors.lastname: Falcaro
keywords: UV lithography; device fabrication; imprinting; metal-organic frameworks; patterning