title: Photorefractive damage resistance threshold in stoichiometric LiNbO₃:Zr crystals.
abstract: Several optical methods including ultraviolet absorption, infrared absorption of the hydroxyl ions, Raman spectroscopy, and the Z-scan method have been used to determine the damage resistance threshold in 0-0.72 mol. % Zr-containing, flux-grown, nearly stoichiometric LiNbO₃ single crystals. All spectroscopical methods used indicate that samples containing at least ≈0.085 mol. % Zr in the crystal are above the threshold while Z-scan data locate the photorefractive damage threshold between 0.085 and 0.314 mol. % Zr.
authors.affiliation: Wigner Research Centre for Physics, Hungarian Academy of Sciences, Budapest, Hungary. kovacs.laszlo@wigner.mta.hu
authors.forename: László
authors.initials: L
authors.lastname: Kovács
authors.forename: Zsuzsanna
authors.initials: Z
authors.lastname: Szaller
authors.forename: Krisztián
authors.initials: K
authors.lastname: Lengyel
authors.forename: Ágnes
authors.initials: Á
authors.lastname: Péter
authors.forename: Ivett
authors.initials: I
authors.lastname: Hajdara
authors.forename: Gábor
authors.initials: G
authors.lastname: Mandula
authors.forename: László
authors.initials: L
authors.lastname: Pálfalvi
authors.forename: János
authors.initials: J
authors.lastname: Hebling