title: Superior hydrogen storage and electrochemical properties of Mg(x)Ni(100-x)/Pd films at room temperature.
abstract: The Mg(x)Ni(100-x) films of 100 nm have been prepared by magnetron co-sputtering Mg and Ni targets, and a Pd layer of 10 nm was deposited on these films by magnetron sputtering a Pd target. Mg2Ni and MgNi2 are directly generated during the co-sputtering process in the Mg84Ni16/Pd and Mg48Ni52/Pd films. The hydrogen storage properties of the films under 0.1 MPa H2 at 298 K were investigated. The hydrogenation of the Mg84Ni16/Pd film saturates within 45 s and exhibits the faster absorption kinetics compared with Mg94Ni6/Pd and Mg48Ni52/Pd films. The electrochemical properties of the Mg(x)Ni(100-x)/Pd films were investigated in 6 M KOH with a three-electrode cell. The Mg84Ni16/Pd film can be activated just at the first cycle. The maximum discharge capacity of the Mg84Ni16/Pd film is 482.7 mAh g(-1), the highest among these films.
authors.affiliation: Key Laboratory of Aerospace Materials and Performance (Ministry of Education), School of Materials Science and Engineering, Beihang University, Beijing 100191, China. tongliu@buaa.edu.cn
authors.forename: Tong
authors.initials: T
authors.lastname: Liu
authors.forename: Yurong
authors.initials: Y
authors.lastname: Cao
authors.forename: Gongbiao
authors.initials: G
authors.lastname: Xin
authors.forename: Xingguo
authors.initials: X
authors.lastname: Li
mesh_terms: D055664:Electrochemical Techniques; D006859:Hydrogen / Q000737:chemistry*; D008274:Magnesium / Q000737:chemistry*; D009532:Nickel / Q000737:chemistry*; D010165:Palladium / Q000737:chemistry*; D013696:Temperature
chemical_list: D010165:Palladium; D009532:Nickel; D006859:Hydrogen; D008274:Magnesium