Absolute cross section for loss of supercoiled topology induced by 10 eV electrons in highly uniform /DNA/1,3-diaminopropane films deposited on highly ordered pyrolitic graphite.
It was recently shown that the affinity of doubly charged, 1-3 diaminopropane (Dap(2+)) for DNA permits the growth on highly ordered pyrolitic graphite (HOPG) substrates, of plasmid DNA films, of known uniform thickness [O. Boulanouar, A. Khatyr, G. Herlem, F. Palmino, L. Sanche, and M. Fromm, J. Phys. Chem. C 115, 21291-21298 (2011)]. Post-irradiation analysis by electrophoresis of such targets confirms that electron impact at 10 eV produces a maximum in the yield of single strand breaks that can be associated with the formation of a DNA(-) transient anion. Using a well-adapted deterministic survival model for the variation of electron damage with fluence and film thickness, we have determined an absolute cross section for strand-break damage by 10 eV electrons and inelastic scattering attenuation length in DNA-Dap complex films.
Laboratoire de Chimie Physique et Rayonnements - Alain Chambaudet, LRC CEA, UMR CNRS 6249, Université de Franche-Comté, 16 route de Gray, F-25030 Besançon cedex, France.
Omar
O
Boulanouar
Michel
M
Fromm
Andrew D
AD
Bass
Pierre
P
Cloutier
Léon
L
Sanche
D004247:DNA / Q000737:chemistry*; D003959:Diamines / Q000737:chemistry*; D004583:Electrons; D006108:Graphite / Q000737:chemistry*; D008958:Models, Molecular; D015394:Molecular Structure; D010957:Plasmids
D003959:Diamines; D006108:Graphite; D004247:DNA; C009475:trimethylenediamine