Thin-film thickness-modulated designs for optical minus filter.
We proposed an analytical method to design optical minus filters by the thickness modulation of discrete, homogeneous thin-film layers of a two-material multilayer coating. The main stack provides the narrow, second-order rejection band, and the correct thickness-modulation apodization and match layers can effectively suppress the sidelobes of the passband. Using this approach, we can design minus filters with layer thicknesses close to half-wave of the rejection wavelength, making this method well suited for accurate monitoring during the deposition.
Key Laboratory of Advanced Microstructure Materials, Ministry of Education, Shanghai, China.
Jinlong
J
Zhang
Yujiang
Y
Xie
Xinbin
X
Cheng
Hongfei
H
Jiao
Zhanshan
Z
Wang