Noble-gas resonant radiation effects on electron emission in plasma devices.
Experimental investigation results for photoemission affected by vacuum ultraviolet radiation of xenon and krypton atoms from a solid in vacuum and the target surface in contact with plasma (gas) are presented. It is demonstrated that, for adsorption (or implantation) of gas atoms into the target, the photoemission response considerably (to an order of magnitude) increases. This is caused by a change in the mechanism of photoemission from a solid surface in contact with plasma (gas), as compared to vacuum. This phenomenon can be characterized by the term adsorption- (implantation-) induced resonant photoemission. The inclusion of this phenomenon has largely transformed our view of gas discharge ignition and glowing, in addition to operating a variety of plasmic and photoelectron devices. A different class of gas discharge instruments can be realized on this basis as well.
Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia.
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Bokhan
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Zakrevsky