Defect-assisted plasmonic crystal sensor.
We demonstrate enhanced sensitivity of a nanostructured plasmonic sensor that utilizes resonance in intentional structural defects within a plasmonic crystal. The measured sensitivity of the fabricated nanosensor is ~500 nm/RIU showing improvement over traditional nanohole array sensors. Furthermore, the defects provide an additional design parameter to increase sensitivity by engineering plasmon lifetime.
Klipsch School of Electrical and Computer Engineering, New Mexico State University, Las Cruces, New Mexico 88003, USA.
Jayson L
JL
Briscoe
Sang-Yeon
SY
Cho
Igal
I
Brener
D008027:Light; D049329:Nanostructures; D055096:Optical Devices; D055620:Optical Phenomena