Amorphization induced by focused ion beam milling in metallic and electronic materials.
Focused ion beam (FIB) milling using high-energy gallium ions is widely used in the preparation of specimens for transmission electron microscopy (TEM). However, the energetic ion beam induces amorphization on the edge of specimens during milling, resulting in a mischievous influence on the clearness of high-quality transmission electron micrographs. In this work, the amorphization induced by the FIB milling was investigated by TEM for three kinds of materials, metallic materials in bulk shape, and semiconductive and electronic ceramic materials as a substrate for the deposition of thin films.
Center for Analysis and Assessment, Research Institute of Industrial Science and Technology, Pohang 790-330, Republic of Korea. yhuh@rist.re.kr
Yoon
Y
Huh
Ki Jung
KJ
Hong
Kwang Soo
KS
Shin