title: Chemical stability of graphene fluoride produced by exposure to XeF2.
abstract: Fluorination can alter the electronic properties of graphene and activate sites for subsequent chemistry. Here, we show that graphene fluorination depends on several variables, including XeF2 exposure and the choice of substrate. After fluorination, fluorine content declines by 50-80% over several days before stabilizing. While highly fluorinated samples remain insulating, mildly fluorinated samples regain some conductivity over this period. Finally, this loss does not reduce reactivity with alkylamines, suggesting that only nonvolatile fluorine participates in these reactions.
authors: Nova Research , 1900 Elkins Street Suite 230, Alexandria, Virginia 22308, United States.
authors: Rory
authors: R
authors: Stine
authors: Woo-Kyung
authors: WK
authors: Lee
authors: Keith E
authors: KE
authors: Whitener
authors: Jeremy T
authors: JT
authors: Robinson
authors: Paul E
authors: PE
authors: Sheehan
mesh_terms: D004560:Electricity; D005459:Fluorides / Q000737:chemistry*; D006108:Graphite / Q000737:chemistry*; D014978:Xenon / Q000737:chemistry
chemical_list: D014978:Xenon; C048007:xenon fluoride; D006108:Graphite; D005459:Fluorides