title: Fabrication of dense non-circular nanomagnetic device arrays using self-limiting low-energy glow-discharge processing.
abstract: We describe a low-energy glow-discharge process using reactive ion etching system that enables non-circular device patterns, such as squares or hexagons, to be formed from a precursor array of uniform circular openings in polymethyl methacrylate, PMMA, defined by electron beam lithography. This technique is of a particular interest for bit-patterned magnetic recording medium fabrication, where close packed square magnetic bits may improve its recording performance. The process and results of generating close packed square patterns by self-limiting low-energy glow-discharge are investigated. Dense magnetic arrays formed by electrochemical deposition of nickel over self-limiting formed molds are demonstrated.
authors: Electrical and Computer Engineering, University of Houston, Houston, Texas, United States of America.
authors: Zhen
authors: Z
authors: Zheng
authors: Long
authors: L
authors: Chang
authors: Ivan
authors: I
authors: Nekrashevich
authors: Paul
authors: P
authors: Ruchhoeft
authors: Sakhrat
authors: S
authors: Khizroev
authors: Dmitri
authors: D
authors: Litvinov
mesh_terms: D055664:Electrochemical Techniques; D060328:Magnetic Phenomena; D036103:Nanotechnology / Q000191:economics / Q000295:instrumentation*; D013499:Surface Properties; D013696:Temperature
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