title: Atmospheric pressure chemical vapour deposition of boron doped titanium dioxide for photocatalytic water reduction and oxidation.
abstract: Boron-doped titanium dioxide (B-TiO2) films were deposited by atmospheric pressure chemical vapour deposition of titanium(iv) chloride, ethyl acetate and tri-isopropyl borate on steel and fluorine-doped-tin oxide substrates at 500, 550 and 600 °C, respectively. The films were characterised using powder X-ray diffraction (PXRD), which showed anatase phase TiO2 at lower deposition temperatures (500 and 550 °C) and rutile at higher deposition temperatures (600 °C). X-ray photoelectron spectroscopy (XPS) showed a dopant level of 0.9 at% B in an O-substitutional position. The ability of the films to reduce water was tested in a sacrificial system using 365 nm UV light with an irradiance of 2 mW cm(-2). Hydrogen production rates of B-TiO2 at 24 μL cm(-2) h(-1) far exceeded undoped TiO2 at 2.6 μL cm(-2) h(-1). The B-TiO2 samples were also shown to be active for water oxidation in a sacrificial solution. Photocurrent density tests also revealed that B-doped samples performed better, with an earlier onset of photocurrent.
authors.affiliation: Department of Chemistry, University College London, 20 Gordon Street, London, WC1H 0AJ, UK. i.p.parkin@ucl.ac.uk.
authors.forename: Penelope
authors.initials: P
authors.lastname: Carmichael
authors.forename: David
authors.initials: D
authors.lastname: Hazafy
authors.forename: Davinder S
authors.initials: DS
authors.lastname: Bhachu
authors.forename: Andrew
authors.initials: A
authors.lastname: Mills
authors.forename: Jawwad A
authors.initials: JA
authors.lastname: Darr
authors.forename: Ivan P
authors.initials: IP
authors.lastname: Parkin