title: Photo-roll lithography (PRL) for continuous and scalable patterning with application in flexible electronics.
abstract: A novel nanofabrication methodology for continuous, scalable, and geometry-tunable lithography is developed, named photo-roll lithography (PRL), by integrating photolithography with rollable processing. As a flexible mask attached to a quartz cylinder containing a UV source rolls over a photoresistcoated substrate, PRL realizes continuous photolithographic fabrication of various micro/nanoscale patterns with geometry that is tunable by controlling mask-substrate motions.
authors.affiliation: Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan, 48109, USA; Department of Mechanical Engineering, University of Michigan, Ann Arbor, Michigan, 48109, USA.
authors.forename: Jong G
authors.initials: JG
authors.lastname: Ok
authors.forename: Moon Kyu
authors.initials: MK
authors.lastname: Kwak
authors.forename: Chad M
authors.initials: CM
authors.lastname: Huard
authors.forename: Hong Seok
authors.initials: HS
authors.lastname: Youn
authors.forename: L Jay
authors.initials: LJ
authors.lastname: Guo
keywords: flexible electronics; graphene; light-emitting diodes; nanomanufacturing; photolithography; roll-to-roll processes; spectrum filters; transparent conductors