title: Dense arrays of highly aligned graphene nanoribbons produced by substrate-controlled metal-assisted etching of graphene.
abstract: Dense arrays of aligned graphene nanoribbons (GNRs) are fabricated by substrate-controlled etching of large-area single-layer graphene. An adequate choice of etching substrate and catalyst deposition method allows densities up to 25 nanoribbons μm(-1) to be obtained with average widths of 19 nm. The efficacy of the method is evidenced by the high on/off ratios of back-gated transistors made with these GNRs, which can go up to 5000.
authors.affiliation: Institute for Materials Chemistry and Engineering (IMCE), Kyushu University, Kasuga Park 6-1, Fukuoka, 816-8580, Japan.
authors.forename: Pablo
authors.initials: P
authors.lastname: Solís-Fernández
authors.forename: Kazuma
authors.initials: K
authors.lastname: Yoshida
authors.forename: Yui
authors.initials: Y
authors.lastname: Ogawa
authors.forename: Masaharu
authors.initials: M
authors.lastname: Tsuji
authors.forename: Hiroki
authors.initials: H
authors.lastname: Ago
mesh_terms: D002384:Catalysis; D006108:Graphite / Q000737:chemistry*; D053768:Metal Nanoparticles / Q000737:chemistry; D008670:Metals / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry*; D009532:Nickel / Q000737:chemistry; D014173:Transistors, Electronic
chemical_list: D008670:Metals; D006108:Graphite; D009532:Nickel
keywords: etching; graphene; graphene nanoribbon; nanodevices; patterning