title: Photochemical grafting of methyl groups on a Si(111) surface using a Grignard reagent.
abstract: The photochemical grafting of methyl groups onto an n-type Si(111) substrate was successfully achieved using a Grignard reagent. The preparation involved illuminating a hydrogen-terminated Si(111) that was immersed in a CH3MgBr-THF solution. The success was attributed to the ability of the n-type hydrogenated substrate to produce holes on its surface when illuminated. The rate of grafting methyl groups onto the silicon surface was higher when a larger illumination intensity or when a substrate with lower dopant concentration was used. In addition, the methylated layer has an atomically flat structure, has a hydrophobic surface, and has electron affinity that was lower than the bulk Si.
authors.affiliation: Department of Materials Science and Engineering, Kyoto University, Yoshida-honmachi, Sakyo-ku, Kyoto 606-8501, Japan. Electronic address: herrera.ustaris.87s@st.kyoto-u.ac.jp.
authors.forename: Marvin Ustaris
authors.initials: MU
authors.lastname: Herrera
authors.forename: Takashi
authors.initials: T
authors.lastname: Ichii
authors.forename: Kuniaki
authors.initials: K
authors.lastname: Murase
authors.forename: Hiroyuki
authors.initials: H
authors.lastname: Sugimura
keywords: Grignard reagent; Methyl-terminated Si; Photochemical grafting; Self-assembled monolayer