title: Deep sub-wavelength imaging lithography by a reflective plasmonic slab.
abstract: By utilizing a reflective plasmonic slab, it is demonstrated numerically and experimentally in this paper deep sub-wavelength imaging lithography for nano characters with about 50 nm line width and dense lines with 32 nm half pitch resolution (about 1/12 wavelength). Compared with the control experiment without reflective plasmonic slab, resolution and fidelity of imaged resist patterns are remarkably improved especially for isolated nano features. Further numerical simulations show that near field optical proximity corrections help to improve imaging fidelity of two dimensional nano patterns.
authors.forename: Changtao
authors.initials: C
authors.lastname: Wang
authors.forename: Ping
authors.initials: P
authors.lastname: Gao
authors.forename: Zeyu
authors.initials: Z
authors.lastname: Zhao
authors.forename: Na
authors.initials: N
authors.lastname: Yao
authors.forename: Yanqin
authors.initials: Y
authors.lastname: Wang
authors.forename: Ling
authors.initials: L
authors.lastname: Liu
authors.forename: Kaipeng
authors.initials: K
authors.lastname: Liu
authors.forename: Xiangang
authors.initials: X
authors.lastname: Luo