title: Contamination of PDMS microchannels by lithographic molds.
abstract: By use of synchrotron X-ray fluorescence and Rutherford backscattering spectrometry, we show the SU-8 soft lithographic process contaminates PDMS. Residues of the antimony containing photoinitiator are transferred from the master mold to the surface of PDMS, uncontrollably intensifying the surface potential, leading to electroosmotic flow variability in PDMS microfluidic devices.
authors.affiliation: Callaghan Innovation Research Ltd, PO Box 31310, Lower Hutt 5040, New Zealand. andrea.bubendorfer@callaghaninnovation.govt.nz.
authors.forename: Andrea J
authors.initials: AJ
authors.lastname: Bubendorfer
authors.forename: Bridget
authors.initials: B
authors.lastname: Ingham
authors.forename: John V
authors.initials: JV
authors.lastname: Kennedy
authors.forename: W Mike
authors.initials: WM
authors.lastname: Arnold
mesh_terms: D000965:Antimony / Q000737:chemistry; D004129:Dimethylpolysiloxanes / Q000737:chemistry*; D046210:Microfluidic Analytical Techniques / Q000295:instrumentation*; D013499:Surface Properties
chemical_list: D004129:Dimethylpolysiloxanes; D000965:Antimony