title: Quantum resistance metrology using graphene.
abstract: In this paper, we review the recent extraordinary progress in the development of a new quantum standard for resistance based on graphene. We discuss the unique properties of this material system relating to resistance metrology and discuss results of the recent highest-ever precision direct comparison of the Hall resistance between graphene and traditional GaAs. We mainly focus our review on graphene expitaxially grown on SiC, a system which so far resulted in the best results. We also briefly discuss progress in the two other graphene material systems, exfoliated graphene and chemical vapour deposition graphene, and make a critical comparison with SiC graphene. Finally, we discuss other possible applications of graphene in metrology.
authors.affiliation: National Physical Laboratory, Hampton Road, Teddington TW11 0LW, UK.
authors.forename: T J B M
authors.initials: TJ
authors.lastname: Janssen
authors.forename: A
authors.initials: A
authors.lastname: Tzalenchuk
authors.forename: S
authors.initials: S
authors.lastname: Lara-Avila
authors.forename: S
authors.initials: S
authors.lastname: Kubatkin
authors.forename: V I
authors.initials: VI
authors.lastname: Fal'ko
mesh_terms: D003198:Computer Simulation; D017097:Electric Impedance; D006108:Graphite / Q000737:chemistry* / Q000592:standards*; D008956:Models, Chemical; D011789:Quantum Theory; D012016:Reference Values
chemical_list: D006108:Graphite