title: Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio.
abstract: Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.
authors.affiliation: Department of Chemical and Biological Engineering, Princeton University, Princeton, NJ, 08544, USA.
authors.forename: So Youn
authors.initials: SY
authors.lastname: Kim
authors.forename: Jessica
authors.initials: J
authors.lastname: Gwyther
authors.forename: Ian
authors.initials: I
authors.lastname: Manners
authors.forename: Paul M
authors.initials: PM
authors.lastname: Chaikin
authors.forename: Richard A
authors.initials: RA
authors.lastname: Register
keywords: block copolymer lithography; nanopatterning; wire grid polarizer