title: pH- and solute-dependent adsorption of single-wall carbon nanotubes onto hydrogels: mechanistic insights into the metal/semiconductor separation.
abstract: The gel separation of single-wall carbon nanotubes (SWCNTs) suspended in sodium dodecyl sulfate (SDS) is expected to be one of the most successful methods of large-scale and high-purity separation. Understanding the mechanism of the gel separation helps improve the quality and quantity of separation and reveals the colloidal behaviors of SWCNTs, which reflects their band structures. In this study, we characterize the pH- and solute-dependent adsorption of SWCNTs onto agarose and Sephacryl hydrogels and provide a mechanistic model of the metal/semiconductor separation. The adsorbability of SWCNTs is substantially reduced under acidic pH conditions. Importantly, the pH dependence differs between metallic and semiconducting species; therefore, the adsorbability is related to the band-structure-dependent oxidation of the SWCNTs. Oxidation confers positive charges on SWCNTs, and these charges enhance the electrostatic interactions of the SWCNTs with SDS, thereby leading to the condensation of SDS on the SWCNTs. This increase in SDS density reduces the interactions between the SWCNTs and hydrogels. Under highly basic conditions, such as pH ∼12.5, or in the presence of salts, the adsorption is dissociative because of the condensation of SDS on the SWCNTs through electrostatic screening by counterions. Desorption of the SWCNTs from the hydrogels due to the addition of urea implies a hydrophobic interface between SDS-dispersed SWCNTs and the hydrogels. These results suggest that the metal/semiconductor separation can be explained by the alteration of the interaction between SDS-dispersed SWCNTs and the hydrogels through changes in the conformation of SDS on the SWCNTs depending on the SWCNTs' band structures.
authors.affiliation: Nanosystem Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8562, Japan.
authors.forename: Atsushi
authors.initials: A
authors.lastname: Hirano
authors.forename: Takeshi
authors.initials: T
authors.lastname: Tanaka
authors.forename: Yasuko
authors.initials: Y
authors.lastname: Urabe
authors.forename: Hiromichi
authors.initials: H
authors.lastname: Kataura