title: Robust superhydrophobicity in large-area nanostructured surfaces defined by block-copolymer self assembly.
abstract: Robust, large area, superhydrophobic surfaces with feature sizes approaching 10 nm are fabricated by block-copolymer-based thin-film patterning. We show that tuning the nanostructure shape and aspect ratio dramatically influences the surface wetting properties, with proper control crucial for achieving superhydrophobicity.
authors.affiliation: Condensed Matter Physics and Materials Science Department, Brookhaven National Laboratory, Upton, NY, 11973, USA.
authors.forename: Antonio
authors.initials: A
authors.lastname: Checco
authors.forename: Atikur
authors.initials: A
authors.lastname: Rahman
authors.forename: Charles T
authors.initials: CT
authors.lastname: Black
keywords: block-copolymer lithography; nanostructured surfaces; self assembly; superhydrophobicity; wetting