title: Amorphization driven by defect-induced mechanical instability.
abstract: Using ab initio molecular dynamics simulations, we perform a comparative study of the defect accumulation process in silicon carbide (SiC) and zirconium carbide (ZrC). Interestingly, we find that the fcc Si sublattice in SiC spontaneously and gradually collapses following the continuous introduction of C Frenkel pairs (FPs). Above a critical amorphization dose of ~0.33 displacements per atom (dpa), the pair correlation function exhibits no long-range order. In contrast, the fcc Zr sublattice in ZrC remains structurally stable against C sublattice displacements up to the highest dose of 1.0 dpa considered. Consequently, ZrC cannot be amorphized by the accumulation of C FPs. We propose defect-induced mechanical instability as the key mechanism driving the amorphization of SiC under electron irradiation.
authors.affiliation: Department of Materials Science and Engineering, University of Wisconsin, Madison, Wisconsin 53706, USA.
authors.forename: Chao
authors.initials: C
authors.lastname: Jiang
authors.forename: Ming-Jie
authors.initials: MJ
authors.lastname: Zheng
authors.forename: Dane
authors.initials: D
authors.lastname: Morgan
authors.forename: Izabela
authors.initials: I
authors.lastname: Szlufarska