title: A simple and scalable route to wafer-size patterned graphene.
abstract: Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale fabrication and practical applications. We report a simple, effective, and reproducible approach for patterning graphene films with controllable feature sizes and shapes. The patterns were generated using a versatile photocoupling chemistry. Features from micrometres to centimetres were fabricated using a conventional photolithography process. This method is simple, general, and applicable to a wide range of substrates including silicon wafers, glass slides, and metal films.
authors.affiliation: Department of Chemistry, Portland State University, Portland, Oregon, 97207-0751, USA.
authors.forename: Li-Hong
authors.initials: LH
authors.lastname: Liu
authors.forename: Gilad
authors.initials: G
authors.lastname: Zorn
authors.forename: David G
authors.initials: DG
authors.lastname: Castner
authors.forename: Raj
authors.initials: R
authors.lastname: Solanki
authors.forename: Michael M
authors.initials: MM
authors.lastname: Lerner
authors.forename: Mingdi
authors.initials: M
authors.lastname: Yan