title: Highly transparent and conductive ZnO: Al thin films from a low temperature aqueous solution approach.
authors.affiliation: Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Ueberlandstrasse 129, CH-8600, Duebendorf.
authors.forename: Harald
authors.initials: H
authors.lastname: Hagendorfer
authors.forename: Karla
authors.initials: K
authors.lastname: Lienau
authors.forename: Shiro
authors.initials: S
authors.lastname: Nishiwaki
authors.forename: Carolin M
authors.initials: CM
authors.lastname: Fella
authors.forename: Lukas
authors.initials: L
authors.lastname: Kranz
authors.forename: Alexander R
authors.initials: AR
authors.lastname: Uhl
authors.forename: Dominik
authors.initials: D
authors.lastname: Jaeger
authors.forename: Li
authors.initials: L
authors.lastname: Luo
authors.forename: Christina
authors.initials: C
authors.lastname: Gretener
authors.forename: Stephan
authors.initials: S
authors.lastname: Buecheler
authors.forename: Yaroslav E
authors.initials: YE
authors.lastname: Romanyuk
authors.forename: Ayodhya N
authors.initials: AN
authors.lastname: Tiwari
keywords: UV annealing; aqueous solution deposition; doped zinc oxides; low temperature processing; transparent conductive oxides