title: The role of oxidative debris on graphene oxide films.
abstract: We study the effect of oxidative impurities on the properties of graphene oxide and on the graphene oxide Langmuir-Blodgett films (LB). The starting material was grupo Antolín nanofibers (GANF) and the oxidation process was a modified Hummers method to obtain highly oxidized graphene oxide. The purification procedure reported in this work eliminated oxidative impurities decreasing the thickness of the nanoplatelets. The purified material thus obtained presents an oxidation degree similar to that achieved by chemical reduction of the graphite oxide. The purified and non-purified graphene oxides were deposited onto silicon by means of a Langmuir-Blodgett (LB) methodology. The morphology of the LB films was analyzed by field emission scanning microscopy (FE-SEM) and micro-Raman spectroscopy. Our results show that the LB films built by transferring Langmuir monolayers at the liquid-expanded state of the purified material are constituted by close-packed and non-overlapped nanoplatelets. The isotherms of the Langmuir monolayer precursor of the LB films were interpreted according to the Volmer's model.
authors.affiliation: Departamento de Química Física, Facultad de Ciencias Químicas, Universidad de Salamanca, Plaza de los Caídos s/n. 37008 Salamanca (Spain), Fax: (+34) 923-294574. dld@usal.es.
authors.forename: David
authors.initials: D
authors.lastname: López-Díaz
authors.forename: Maria Mercedes
authors.initials: MM
authors.lastname: Velázquez
authors.forename: Santiago
authors.initials: S
authors.lastname: Blanco de La Torre
authors.forename: Ana
authors.initials: A
authors.lastname: Pérez-Pisonero
authors.forename: Raquel
authors.initials: R
authors.lastname: Trujillano
authors.forename: José Luis
authors.initials: JL
authors.lastname: García Fierro
authors.forename: Sergi
authors.initials: S
authors.lastname: Claramunt
authors.forename: Albert
authors.initials: A
authors.lastname: Cirera
keywords: graphene oxide; monolayers; oxidative debris; surface chemistry; thin films