title: Printed indium gallium zinc oxide transistors. Self-assembled nanodielectric effects on low-temperature combustion growth and carrier mobility.
abstract: Solution-processed amorphous oxide semiconductors (AOSs) are emerging as important electronic materials for displays and transparent electronics. We report here on the fabrication, microstructure, and performance characteristics of inkjet-printed, low-temperature combustion-processed, amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs) grown on solution-processed hafnia self-assembled nanodielectrics (Hf-SANDs). TFT performance for devices processed below 300 °C includes >4× enhancement in electron mobility (μFE) on Hf-SAND versus SiO2 or ALD-HfO2 gate dielectrics, while other metrics such as subthreshold swing (SS), current on:off ratio (ION:IOFF), threshold voltage (Vth), and gate leakage current (Ig) are unchanged or enhanced. Thus, low voltage IGZO/SAND TFT operation (<2 V) is possible with ION:IOFF = 10(7), SS = 125 mV/dec, near-zero Vth, and large electron mobility, μFE(avg) = 20.6 ± 4.3 cm(2) V(-1) s(-1), μFE(max) = 50 cm(2) V(-1) s(-1). Furthermore, X-ray diffraction analysis indicates that the 300 °C IGZO combustion processing leaves the underlying Hf-SAND microstructure and capacitance intact. This work establishes the compatibility and advantages of all-solution, low-temperature fabrication of inkjet-printed, combustion-derived high-mobility IGZO TFTs integrated with self-assembled hybrid organic-inorganic nanodielectrics.
authors.affiliation: Department of Chemistry, ‡Department of Materials Science and Engineering, §Department of Medicine, ⊥Department of Physics and Astronomy, and #Graduate Program in Applied Physics, Northwestern University , Evanston, Illinois 60208, United States.
authors.forename: Ken
authors.initials: K
authors.lastname: Everaerts
authors.forename: Li
authors.initials: L
authors.lastname: Zeng
authors.forename: Jonathan W
authors.initials: JW
authors.lastname: Hennek
authors.forename: Diana I
authors.initials: DI
authors.lastname: Camacho
authors.forename: Deep
authors.initials: D
authors.lastname: Jariwala
authors.forename: Michael J
authors.initials: MJ
authors.lastname: Bedzyk
authors.forename: Mark C
authors.initials: MC
authors.lastname: Hersam
authors.forename: Tobin J
authors.initials: TJ
authors.lastname: Marks