Nanosoldering carbon nanotube junctions by local chemical vapor deposition for improved device performance.
The performance of carbon nanotube network (CNN) devices is usually limited by the high resistance of individual nanotube junctions (NJs). We present a novel method to reduce this resistance through a nanoscale chemical vapor deposition (CVD) process. By passing current through the devices in the presence of a gaseous CVD precursor, localized nanoscale Joule heating induced at the NJs stimulates the selective and self-limiting deposition of metallic nanosolder. The effectiveness of this nanosoldering process depends on the work function of the deposited metal (here Pd or HfB2), and it can improve the on/off current ratio of a CNN device by nearly an order of magnitude. This nanosoldering technique could also be applied to other device types where nanoscale resistance components limit overall device performance.
Department of Electrical and Computer Engineering, ‡Department of Materials Science and Engineering and Frederick Seitz Materials Research Laboratory, §Department of Chemistry, ∥Micro and Nanotechnology Laboratory, ⊥Beckman Institute for Advanced Science and Technology, University of Illinois at Urbana-Champaign , Urbana, Illinois 61801, United States.
Jae-Won
JW
Do
David
D
Estrada
Xu
X
Xie
Noel N
NN
Chang
Justin
J
Mallek
Gregory S
GS
Girolami
John A
JA
Rogers
Eric
E
Pop
Joseph W
JW
Lyding
D008670:Metals / Q000737:chemistry; D036103:Nanotechnology; D037742:Nanotubes, Carbon / Q000737:chemistry*; D013499:Surface Properties; D013696:Temperature
D008670:Metals; D037742:Nanotubes, Carbon