Stability scheme of ZnO-thin film resistive switching memory: influence of defects by controllable oxygen pressure ratio.
We report a stability scheme of resistive switching devices based on ZnO films deposited by radio frequency (RF) sputtering process at different oxygen pressure ratios. I-V measurements and statistical results indicate that the operating stability of ZnO resistive random access memory (ReRAM) devices is highly dependent on oxygen conditions. Data indicates that the ZnO film ReRAM device fabricated at 10% O2 pressure ratio exhibits the best performance. Transmission electron microscopy (TEM) and X-ray diffraction (XRD) of ZnO at different O2 pressure ratios were investigated to reflect influence of structure to the stable switching behaviors. In addition, PL and XPS results were measured to investigate the different charge states triggered in ZnO by oxygen vacancies, which affect the stability of the switching behavior.
Hsin-Wei
HW
Huang
Chen-Fang
CF
Kang
Fang-I
FI
Lai
Jr-Hau
JH
He
Su-Jien
SJ
Lin
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan. ylchueh@mx.nthu.edu.tw.
Yu-Lun
YL
Chueh