Visible light photocatalytic activity of N-ion implanted TiO2 thin films prepared by oblique incident electron-beam evaporation method.
TiO2 thin films were prepared using electron-beam evaporation method with various oblique angles of 0 degrees, 30 degrees, 60 degrees and 75 degrees. All samples were annealed at 600 degrees C for 1 hour in air and their visible light photocatalytic properties were characterized after nitrogen implantation. The photocatalytic activity of the thin films was evaluated by the photodecomposition of methylene blue. The photocatalytic activity of N-ion implanted TiO2 film deposited with the oblique angle of 60 degrees was considerably enhanced due to high visible light absorption and low charge carrier recombination by sufficient N-ion implantation.
Department of Physics, University of Ulsan, Ulsan 680-749, South Korea.
Sung Don
SD
Hwang
Soon Wook
SW
Kim
Woo Kyung
WK
Lee
Eui Jung
EJ
Kim
Sung Hong
SH
Hahn