Formation of a macro-porous SiO2 layer as an anti-reflective coating on glass substrates.
A macro-porous silica layer, consisting of a silica layer with macro-sized pores, was formed as an antireflective material on glass substrates. The silica layer and macro-pores were formed by the oxidative thermal decomposition of tetra-ethylorthorsilicate (TEOS) used as the precursor and polystyrene (PS) spherical beads used as the polymer template for the macro-pores at high temperatures. The size of pores was determined by the size of PS beads in the antireflective agent solution. The size of the PS spherical beads can be controlled by changing the concentration of styrene monomer, and the porosity of the macro pore in the silica layer could be controlled by the TEOS/PS ratio. The optimal thermal treating temperature for the formation of a macro-porous silica layer was found to be 650 degrees C. The size of the spherical type macro pores formed in the silica layer on the glass substrate was 100-150 nm. UV-Vis spectrophotometry confirmed the improved antireflective properties of the glass substrate with the macro-porous silica layer.
School of Chemical Engineering, Yeungnam Univeristy, 214-1 Daedong, Gyeongsan, Gyeongbuk, 712-749, Korea.
No-Kuk
NK
Park
Yong Sul
YS
Kim
Min Jung
MJ
Kim
Tae Jin
TJ
Lee
Seung Hyun
SH
Lee
Seung Hun
SH
Lee
D000327:Adsorption; D003460:Crystallization / Q000379:methods*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D005898:Glass / Q000737:chemistry*; D007909:Lenses; D008027:Light; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D016062:Porosity; D012031:Refractometry / Q000295:instrumentation*; D012542:Scattering, Radiation; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties
D012822:Silicon Dioxide