title: Selective hydrothermal method to create patterned and photoelectrochemically effective Pt/WO3 interfaces.
abstract: A hydrothermal method based on the use of hydrogen peroxide is described to grow a homogeneous layer of tungsten oxide (WO3) on a platinum (Pt) film supported on a silicon wafer. WO3 growth is highly selective for Pt when present on silicon in a patterned arrangement, demonstrating that Pt catalyzes decomposition of the WO3 precursor in solution. The obtained Pt/WO3 interface yields high photocurrents of 1.1 mA/cm(2) in photoelectrochemical water splitting when illuminated by a solar simulator. The photocurrents are significantly higher than most previously reported values for hydrothermally grown layers on indium-tin oxide and fluorine-tin oxide glasses. The selective growth method thus provides new options to effectively implement WO3 in photoelectrochemical devices.
authors.affiliation: MESA+ Institute for Nanotechnology, University of Twente , P.O. Box 217, 7500 AE Enschede, The Netherlands .
authors.forename: Michel G C
authors.initials: MG
authors.lastname: Zoontjes
authors.forename: Mark
authors.initials: M
authors.lastname: Huijben
authors.forename: Jonas
authors.initials: J
authors.lastname: Baltrusaitis
authors.forename: Wilfred G
authors.initials: WG
authors.lastname: van der Wiel
authors.forename: Guido
authors.initials: G
authors.lastname: Mul