title: Highly uniform hole spacing micro brushes based on aligned carbon nanotube arrays.
abstract: Highly uniform hole spacing micro brushes were fabricated based on aligned carbon nanotube (CNT) arrays synthesized by chemical vapor deposition method with the assistance of anodic aluminum oxide (AAO) template. Different micro brushes from CNT arrays were constructed on silicon, glass, and polyimide substrates, respectively. The micro brushes had highly uniform hole spacing originating from the regularly periodic pore structure of AAO template. The CNT arrays, serving as bristles, were firmly grafted on the substrates. The brushes can easily clean particles with scale of micrometer on the surface of silicon wafer and from the narrow spaces between the electrodes in a series of cleaning experiments. The results show the potential application of the CNT micro brushes as a cleaning tool in microelectronics manufacture field.
authors.forename: Zhi
authors.initials: Z
authors.lastname: Yang
authors.forename: Xingzhong
authors.initials: X
authors.lastname: Zhu
authors.forename: Xiaolu
authors.initials: X
authors.lastname: Huang
authors.forename: Yingwu
authors.initials: Y
authors.lastname: Cheng
authors.forename: Yun
authors.initials: Y
authors.lastname: Liu
authors.forename: Huijuan
authors.initials: H
authors.lastname: Geng
authors.forename: Yue
authors.initials: Y
authors.lastname: Wu
authors.forename: Yanjie
authors.initials: Y
authors.lastname: Su
authors.affiliation: Key Laboratory for Thin Film and Microfabrication of Ministry of Education, Research Institute of Micro/Nano Science and Technology, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China. haowei@sjtu.edu.cn.
authors.forename: Hao
authors.initials: H
authors.lastname: Wei
authors.forename: Yafei
authors.initials: Y
authors.lastname: Zhang