title: High-throughput nanofabrication of infra-red and chiral metamaterials using nanospherical-lens lithography.
abstract: Various infra-red and planar chiral metamaterials were fabricated using the modified Nanospherical-Lens Lithography. By replacing the light source with a hand-held ultraviolet lamp, its asymmetric light emission pattern produces the elliptical-shaped photoresist holes after passing through the spheres. The long axis of the ellipse is parallel to the lamp direction. The fabricated ellipse arrays exhibit localized surface plasmon resonance in mid-infra-red and are ideal platforms for surface enhanced infra-red absorption (SEIRA). We also demonstrate a way to design and fabricate complicated patterns by tuning parameters in each exposure step. This method is both high-throughput and low-cost, which is a powerful tool for future infra-red metamaterials applications.
authors.affiliation: Department of Photonics and Advanced Optoelectronic Technology Center, National Cheng Kung University, Tainan 701, Taiwan.
authors.forename: Yun-Chorng
authors.initials: YC
authors.lastname: Chang
authors.forename: Sih-Chen
authors.initials: SC
authors.lastname: Lu
authors.forename: Hsin-Chan
authors.initials: HC
authors.lastname: Chung
authors.forename: Shih-Ming
authors.initials: SM
authors.lastname: Wang
authors.forename: Tzung-Da
authors.initials: TD
authors.lastname: Tsai
authors.forename: Tzung-Fang
authors.initials: TF
authors.lastname: Guo