title: Fabrication of silicon nanowire arrays by macroscopic galvanic cell-driven metal catalyzed electroless etching in aerated HF solution.
abstract: Macroscopic galvanic cell-driven metal catalyzed electroless etching (MCEE) of silicon in aqueous hydrofluoric acid (HF) solution is devised to fabricate silicon nanowire (SiNW) arrays with dissolved oxygen acting as the one and only oxidizing agent. The key aspect of this strategy is the use of a graphite or other noble metal electrode that is electrically coupled with silicon substrate.
authors: Department of Physics and Beijing Key Laboratory of Energy Conversion and Storage Materials, Beijing Normal University, Beijing, 100875, China.
authors: Lin
authors: L
authors: Liu
authors: Kui-Qing
authors: KQ
authors: Peng
authors: Ya
authors: Y
authors: Hu
authors: Xiao-Ling
authors: XL
authors: Wu
authors: Shuit-Tong
authors: ST
authors: Lee
keywords: galvanic cell; metal catalyzed electroless etching; silicon nanowire