title: Concept for three-dimensional optical addressing by ultralow one-photon absorption method.
abstract: With respect to experimental condition, we have investigated the point spread function of a high numerical aperture objective lens, taking into account the absorption effect of the studied material. By using a material possessing an ultralow one-photon absorption (LOPA) coefficient at the excitation wavelength, the light beam can penetrate deeply inside the material and be tightly focused into a subwavelength spot, almost the same as in the absence of material. Combining tight focusing and ultralow absorption conditions, we show that LOPA-based microscopy is thus capable of three-dimensional imaging and fabrication with long penetration depth up to 300 μm. As compared to the commonly used two-photon absorption microscope, the LOPA method allows simplification of the experimental setup and also minimization of the photodamaging or bleaching effect of materials.
authors: Qinggele
authors: Q
authors: Li
authors: Mai Trang
authors: MT
authors: Do
authors: Isabelle
authors: I
authors: Ledoux-Rak
authors: Ngoc Diep
authors: ND
authors: Lai
mesh_terms: D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007089:Image Enhancement / Q000295:instrumentation*; D021621:Imaging, Three-Dimensional / Q000295:instrumentation* / Q000379:methods; D007909:Lenses; D008853:Microscopy / Q000295:instrumentation*; D010783:Photometry / Q000295:instrumentation*; D017785:Photons