title: Activated solutions enabling low-temperature processing of functional ferroelectric oxides for flexible electronics.
abstract: Functional ferroelectric oxides for flexible electronics are achieved from activated solutions enabling low-temperature processing and large-area deposition directly on polymeric substrates. This processing technology reaches the lower limit temperature of crystallization at 300 °C, using a strategy that combines seeded diphasic precursors and photochemical solution deposition. Properties of these materials are comparable to those of high-temperature-processed counterparts and organic ferroelectrics.
authors: Instituto de Ciencia de Materiales de Madrid (ICMM-CSIC), Cantoblanco, 28049, Madrid, Spain.
authors: Iñigo
authors: I
authors: Bretos
authors: Ricardo
authors: R
authors: Jiménez
authors: Aiying
authors: A
authors: Wu
authors: Angus I
authors: AI
authors: Kingon
authors: Paula M
authors: PM
authors: Vilarinho
authors: M Lourdes
authors: ML
authors: Calzada
keywords: ferroelectrics; flexible electronics; functional oxides; low-temperature; thin films