title: Conformal and highly luminescent monolayers of Alq3 prepared by gas-phase molecular layer deposition.
abstract: The gas-phase molecular layer deposition (MLD) of conformal and highly luminescent monolayers of tris(8-hydroxyquinolinato)aluminum (Alq3) is reported. The controlled formation of Alq3 monolayers is achieved for the first time by functionalization of the substrate with amino groups, which serve as initial docking sites for trimethyl aluminum (TMA) molecules binding datively to the amine. Thereby, upon exposure to 8-hydroxyquinoline (8-HQ), the self-limiting formation of highly luminescent Alq3 monolayers is afforded. The growth process and monolayer formation were studied and verified by in situ quartz crystal monitoring, optical emission and absorption spectroscopy, and X-ray photoelectron spectroscopy. The nature of the MLD process provides an avenue to coat arbitrarily shaped 3D surfaces and porous structures with high surface areas, as demonstrated in this work for silica aerogels. The concept presented here paves the way to highly sensitive luminescent sensors and dye-sensitized metal oxides for future applications (e.g., in photocatalysis and solar cells).
authors.affiliation: Institute of Electronic Devices, University of Wuppertal , 42119 Wuppertal, Germany.
authors.forename: André
authors.initials: A
authors.lastname: Räupke
authors.forename: Fabian
authors.initials: F
authors.lastname: Albrecht
authors.forename: Julia
authors.initials: J
authors.lastname: Maibach
authors.forename: Andreas
authors.initials: A
authors.lastname: Behrendt
authors.forename: Andreas
authors.initials: A
authors.lastname: Polywka
authors.forename: Ralf
authors.initials: R
authors.lastname: Heiderhoff
authors.forename: Jonatan
authors.initials: J
authors.lastname: Helzel
authors.forename: Torsten
authors.initials: T
authors.lastname: Rabe
authors.forename: Hans-Hermann
authors.initials: HH
authors.lastname: Johannes
authors.forename: Wolfgang
authors.initials: W
authors.lastname: Kowalsky
authors.forename: Eric
authors.initials: E
authors.lastname: Mankel
authors.forename: Thomas
authors.initials: T
authors.lastname: Mayer
authors.forename: Patrick
authors.initials: P
authors.lastname: Görrn
authors.forename: Thomas
authors.initials: T
authors.lastname: Riedl