title: Gate length variation effect on performance of gate-first self-aligned In₀.₅₃Ga₀.₄₇As MOSFET.
abstract: A multi-gate n-type In₀.₅₃Ga₀.₄₇As MOSFET is fabricated using gate-first self-aligned method and air-bridge technology. The devices with different gate lengths were fabricated with the Al2O3 oxide layer with the thickness of 8 nm. In this letter, impact of gate length variation on device parameter such as threshold voltage, high and low voltage transconductance, subthreshold swing and off current are investigated at room temperature. Scaling the gate length revealed good enhancement in all investigated parameters but the negative shift in threshold voltage was observed for shorter gate lengths. The high drain current of 1.13 A/mm and maximum extrinsic transconductance of 678 mS/mm with the field effect mobility of 364 cm(2)/Vs are achieved for the gate length and width of 0.2 µm and 30 µm, respectively. The source/drain overlap length for the device is approximately extracted about 51 nm with the leakage current in order of 10(-8) A. The results of RF measurement for cut-off and maximum oscillation frequency for devices with different gate lengths are compared.
authors.affiliation: Institute of Electronics, Microelectronics and Nanotechnology (IEMN), University Lille 1, Villeneuve d'Ascq, France ; Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, Bangi, Selangor, Malaysia.
authors.forename: Mohd F
authors.initials: MF
authors.lastname: Mohd Razip Wee
authors.affiliation: Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, Bangi, Selangor, Malaysia.
authors.forename: Arash
authors.initials: A
authors.lastname: Dehzangi
authors.affiliation: Institute of Electronics, Microelectronics and Nanotechnology (IEMN), University Lille 1, Villeneuve d'Ascq, France.
authors.forename: Sylvain
authors.initials: S
authors.lastname: Bollaert
authors.affiliation: Institute of Electronics, Microelectronics and Nanotechnology (IEMN), University Lille 1, Villeneuve d'Ascq, France.
authors.forename: Nicolas
authors.initials: N
authors.lastname: Wichmann
authors.affiliation: Institute of Microengineering and Nanoelectronics (IMEN), Universiti Kebangsaan Malaysia, Bangi, Selangor, Malaysia.
authors.forename: Burhanuddin Y
authors.initials: BY
authors.lastname: Majlis