title: Grazing-incidence small-angle X-ray scattering from Ge nanodots self-organized on Si(001) examined with soft X-rays.
abstract: Grazing-incidence small-angle X-ray scattering (GISAXS) measurements with soft X-rays have been applied to Ge nanodots capped with a Si layer. Spatially anisotropic distribution of nanodots resulted in strongly asymmetric GISAXS patterns in the qy direction in the soft X-ray region, which have not been observed with conventional hard X-rays. However, such apparent differences were explained by performing a GISAXS intensity calculation on the Ewald sphere, i.e. taking the curvature of Ewald sphere into account.
authors.affiliation: Graduate School of Engineering, Kyoto University, Yoshida Honmachi, Kyoto 606-8501, Japan.
authors.forename: Takayoshi
authors.initials: T
authors.lastname: Yamamoto
authors.affiliation: Department of Materials Science and Engineering, Kyoto University, Yoshida Honmachi, Sakyo-ku, Kyoto 606-8501, Japan.
authors.forename: Hiroshi
authors.initials: H
authors.lastname: Okuda
authors.affiliation: Graduate School of Engineering, Kyoto University, Yoshida Honmachi, Kyoto 606-8501, Japan.
authors.forename: Kohki
authors.initials: K
authors.lastname: Takeshita
authors.affiliation: Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Sendai 980-8577, Japan.
authors.forename: Noritaka
authors.initials: N
authors.lastname: Usami
authors.affiliation: Photon Factory, High Energy Accelerator Research Organization, Oho, Tsukuba 305-0801, Japan.
authors.forename: Yoshinori
authors.initials: Y
authors.lastname: Kitajima
authors.affiliation: JASRI, SPring-8, Kohto, Sayo 679-5198, Japan.
authors.forename: Hiroki
authors.initials: H
authors.lastname: Ogawa
keywords: Ge nanodot; Si K absorption edge; grazing-incidence small-angle X-ray scattering (GISAXS); soft X-ray