title: Design of an ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline.
abstract: A new ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline has been designed and is under construction at the Shanghai Synchrotron Radiation Facility. The beamline has two branches: one dedicated to angle-resolved photoemission spectroscopy (ARPES) and the other to photoelectron emission microscopy (PEEM). The two branches share the same plane-grating monochromator, which is equipped with four variable-line-spacing gratings and covers the 20-2000 eV energy range. Two elliptically polarized undulators are employed to provide photons with variable polarization, linear in every inclination and circular. The expected energy resolution is approximately 10 meV at 1000 eV with a flux of more than 3 × 10(10) photons s(-1) at the ARPES sample positions. The refocusing of both branches is based on Kirkpatrick-Baez pairs. The expected spot sizes when using a 10 µm exit slit are 15 µm × 5 µm (horizontal × vertical FWHM) at the ARPES station and 10 µm × 5 µm (horizontal × vertical FWHM) at the PEEM station. The use of plane optical elements upstream of the exit slit, a variable-line-spacing grating and a pre-mirror in the monochromator that allows the influence of the thermal deformation to be eliminated are essential for achieving the ultrahigh-energy resolution.
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
authors.forename: L
authors.initials: L
authors.lastname: Xue
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, IL 06439, USA.
authors.forename: R
authors.initials: R
authors.lastname: Reininger
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
authors.forename: Y-Q
authors.initials: YQ
authors.lastname: Wu
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
authors.forename: Y
authors.initials: Y
authors.lastname: Zou
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
authors.forename: Z-M
authors.initials: ZM
authors.lastname: Xu
authors.affiliation: Institute of Physics, Chinese Academy of Sciences, Beijing 100190, People's Republic of China.
authors.forename: Y-B
authors.initials: YB
authors.lastname: Shi
authors.affiliation: Institute of Physics, Chinese Academy of Sciences, Beijing 100190, People's Republic of China.
authors.forename: J
authors.initials: J
authors.lastname: Dong
authors.affiliation: Institute of Physics, Chinese Academy of Sciences, Beijing 100190, People's Republic of China.
authors.forename: H
authors.initials: H
authors.lastname: Ding
authors.affiliation: Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, People's Republic of China.
authors.forename: J-L
authors.initials: JL
authors.lastname: Sun
authors.affiliation: Dalian Jiaotong University, Shahekou, Dalian, People's Republic of China.
authors.forename: F-Z
authors.initials: FZ
authors.lastname: Guo
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
authors.forename: Y
authors.initials: Y
authors.lastname: Wang
authors.affiliation: Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, People's Republic of China.
authors.forename: R-Z
authors.initials: RZ
authors.lastname: Tai
keywords: ARPES; soft X-ray beamline; thermal deformation; ultrahigh-energy resolution