title: 11 nm hard X-ray focus from a large-aperture multilayer Laue lens.
abstract: The focusing performance of a multilayer Laue lens (MLL) with 43.4 μm aperture, 4 nm finest zone width and 4.2 mm focal length at 12 keV was characterized with X-rays using ptychography method. The reconstructed probe shows a full-width-at-half-maximum (FWHM) peak size of 11.2 nm. The obtained X-ray wavefront shows excellent agreement with the dynamical calculations, exhibiting aberrations less than 0.3 wave period, which ensures the MLL capable of producing a diffraction-limited focus while offering a sufficient working distance. This achievement opens up opportunities of incorporating a variety of in-situ experiments into ultra high-resolution X-ray microscopy studies.
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Xiaojing
authors.initials: X
authors.lastname: Huang
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Hanfei
authors.initials: H
authors.lastname: Yan
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Evgeny
authors.initials: E
authors.lastname: Nazaretski
authors.affiliation: 1] National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA [2] Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.
authors.forename: Raymond
authors.initials: R
authors.lastname: Conley
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Nathalie
authors.initials: N
authors.lastname: Bouet
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Juan
authors.initials: J
authors.lastname: Zhou
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Kenneth
authors.initials: K
authors.lastname: Lauer
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Li
authors.initials: L
authors.lastname: Li
authors.affiliation: 1] National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA [2].
authors.forename: Daejin
authors.initials: D
authors.lastname: Eom
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.
authors.forename: Daniel
authors.initials: D
authors.lastname: Legnini
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, IL 60439, USA.
authors.forename: Ross
authors.initials: R
authors.lastname: Harder
authors.affiliation: 1] London Centre for Nanotechnology, University College London, London, WC1H 0AH, UK [2] Research Complex at Harwell, Didcot, Oxfordshire OX11 0DE, UK.
authors.forename: Ian K
authors.initials: IK
authors.lastname: Robinson
authors.affiliation: National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973, USA.
authors.forename: Yong S
authors.initials: YS
authors.lastname: Chu