title: Diatom-inspired templates for 3D replication: natural diatoms versus laser written artificial diatoms.
abstract: The diatoms are ubiquitous, exist in large numbers and show a great diversity of features on their porous silica structures. Therefore, they inspire the fabrication of nanostructured templates for nanoimprint processes (NIL), where large structured areas with nanometer precision are required. In this study, two approaches regarding the respective challenges and potential exploitations are followed and discussed: the first one takes advantage of a template that is directly made of natural occurring diatoms. Here, two replication steps via soft lithography are needed to obtain a template which is subsequently used for NIL. The second approach exploits the technical capabilities of the precise 3D laser lithography (3DLL) based on two-photon polymerization of organic materials. This method enables the fabrication of arbitrary artificial diatom-inspired micro- and nanostructures and the design of an inverse structure. Therefore, only one replication step is needed to obtain a template for NIL. In both approaches, a replication technique for true 3D structures is shown.
authors.affiliation: Institute for Surface Technologies and Photonics, Joanneum Research, Franz-Pichler Straße 30, A-8160 Weiz, Austria.
authors.forename: M R
authors.initials: MR
authors.lastname: Belegratis
authors.forename: V
authors.initials: V
authors.lastname: Schmidt
authors.forename: D
authors.initials: D
authors.lastname: Nees
authors.forename: B
authors.initials: B
authors.lastname: Stadlober
authors.forename: P
authors.initials: P
authors.lastname: Hartmann
mesh_terms: D040761:Biomimetic Materials / Q000138:chemical synthesis*; D017377:Diatoms / Q000648:ultrastructure*; D007834:Lasers; D008422:Materials Testing; D054802:Molecular Imprinting / Q000379:methods*; D053758:Nanoparticles / Q000737:chemistry* / Q000648:ultrastructure*; D012822:Silicon Dioxide / Q000737:chemistry* / Q000528:radiation effects; D013499:Surface Properties / Q000528:radiation effects
chemical_list: D012822:Silicon Dioxide