title: Fast and gentle side approach for atomic force microscopy.
abstract: Atomic force microscopy is one of the most popular imaging tools with atomic resolution in different research fields. Here, a fast and gentle side approach for atomic force microscopy is proposed to image the same surface location and to reduce the time delay between modification and imaging without significant tip degradation. This reproducible approach to image the same surface location using atomic force microscopy shortly after, for example, any biological, chemical, or physical modification on a geometrically separated position has the potential to become widely used.
authors.affiliation: Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: W A
authors.initials: WA
authors.lastname: Wessels
authors.affiliation: Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: J J
authors.initials: JJ
authors.lastname: Broekmaat
authors.affiliation: Philips Innovation Services, High Tech Campus 7, 5656 AE Eindhoven, The Netherlands.
authors.forename: R J L
authors.initials: RJ
authors.lastname: Beerends
authors.affiliation: Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: G
authors.initials: G
authors.lastname: Koster
authors.affiliation: Faculty of Science and Technology and MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: G
authors.initials: G
authors.lastname: Rijnders