title: Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition.
abstract: In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited d-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.
authors.affiliation: Soft Matter Materials Branch, Materials and Manufacturing Directorate, Wright-Patterson Air Force Base , Dayton, Ohio 45433, United States.
authors.forename: Milana C
authors.initials: MC
authors.lastname: Vasudev
authors.forename: Hilmar
authors.initials: H
authors.lastname: Koerner
authors.forename: Kristi M
authors.initials: KM
authors.lastname: Singh
authors.forename: Benjamin P
authors.initials: BP
authors.lastname: Partlow
authors.forename: David L
authors.initials: DL
authors.lastname: Kaplan
authors.forename: Ehud
authors.initials: E
authors.lastname: Gazit
authors.forename: Timothy J
authors.initials: TJ
authors.lastname: Bunning
authors.forename: Rajesh R
authors.initials: RR
authors.lastname: Naik
mesh_terms: D004151:Dipeptides; D049329:Nanostructures / Q000737:chemistry*; D010316:Particle Size; D010455:Peptides / Q000138:chemical synthesis / Q000737:chemistry*; D010649:Phenylalanine / Q000031:analogs & derivatives* / Q000737:chemistry; D058626:Plasma Gases / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D004151:Dipeptides; D010455:Peptides; D058626:Plasma Gases; C026650:phenylalanylphenylalanine; D010649:Phenylalanine