title: Interaction between SiO2 and a KF-KCl-K2SiF6 Melt.
abstract: The solubility mechanism of silica in a fluoride-chloride melt has been determined in situ using Raman spectroscopy. The spectroscopy data revealed that the silica solubility process involved Si-O bond breakage and Si-F bond formation. The process results in the formation of silicate complexes, fluorine-bearing silicate complexes, and silicon tetrafluoride in the melt. Mass spectrometry of the vapor phase over the KF-KCl-K2SiF6 and KF-KCl-K2SiF6-SiO2 melts and differential scanning calorimetry coupled with thermal gravimetric analysis of these melts were performed to verify the silica solubility mechanism.
authors.affiliation: Institute of High Temperature Electrochemistry, Ural Branch of Russian Academy of Sciences , S. Kovalevsokaya Street, 22, Akademicheskaya Street, 20, Yekaterinburg, 620990 Russian Federation.
authors.forename: Yurii P
authors.initials: YP
authors.lastname: Zaykov
authors.forename: Andrey V
authors.initials: AV
authors.lastname: Isakov
authors.forename: Irina D
authors.initials: ID
authors.lastname: Zakiryanova
authors.forename: Olga G
authors.initials: OG
authors.lastname: Reznitskikh
authors.forename: Oleg V
authors.initials: OV
authors.lastname: Chemezov
authors.forename: Alexander A
authors.initials: AA
authors.lastname: Redkin