title: Thermal characterization of diamond films through modulated photothermal radiometry.
abstract: Diamond (Dia) films are promising heat-dissipative materials for electronic packages because they combine high thermal conductivity with high electrical resistivity. However, precise knowledge of the thermal properties of the diamond films is crucial to their potential application as passive thermal management substrates in electronics. In this study, modulated photothermal radiometry in a front-face configuration was employed to thermally characterize polycrystalline diamond films deposited onto silicon (Si) substrates through laser-assisted combustion synthesis. The intrinsic thermal conductivity of diamond films and the thermal boundary resistance at the interface between the diamond film and the Si substrate were investigated. The results enlighten the correlation between the deposition process, film purity, film transverse thermal conductivity, and interface thermal resistance.
authors.affiliation: Institut de Chimie de la Matière Condensée de Bordeaux, CNRS, Université de Bordeaux , 33608 Pessac, France.
authors.forename: Thomas
authors.initials: T
authors.lastname: Guillemet
authors.forename: Andrzej
authors.initials: A
authors.lastname: Kusiak
authors.forename: Lisha
authors.initials: L
authors.lastname: Fan
authors.forename: Jean-Marc
authors.initials: JM
authors.lastname: Heintz
authors.forename: Namas
authors.initials: N
authors.lastname: Chandra
authors.forename: Yunshen
authors.initials: Y
authors.lastname: Zhou
authors.forename: Jean-François
authors.initials: JF
authors.lastname: Silvain
authors.forename: Yongfeng
authors.initials: Y
authors.lastname: Lu
authors.forename: Jean-Luc
authors.initials: JL
authors.lastname: Battaglia