title: Fabrication of 10 nm-scale complex 3D nanopatterns with multiple shapes and components by secondary sputtering phenomenon.
abstract: We introduce an advanced ultrahigh-resolution (∼ 15 nm) patterning technique that enables the fabrication of various 3D high aspect ratio multicomponents/shaped nanostructures. This methodology utilizes the repetitive secondary sputtering phenomenon under etching plasma conditions and prepatterned fabrication control. The secondary sputtering phenomenon repetitively generates an angular distribution of target particles during ion-bombardment. This method, advanced repetitive secondary sputtering lithography, provides many strategies to fabricate complex continuous patterns and multilayer/material patterns with 10 nm-scale resolution. To demonstrate the versatility of this method, we show induced vertical alignment of liquid crystals (LCs) on indium-tin-oxide (ITO) grid patterns without any alignment layers. The ITO grid pattern fabricated in this method is found to have not only an alignment capability but also electrode properties without electrical or optical damage.
authors.affiliation: National Research Laboratory for Organic Opto-Electronic Materials, Department of Chemical and Biomolecular Engineering (BK-21), Korea Advanced Institute of Science and Technology , Daejeon 305-701, Korea.
authors.forename: Hwan-Jin
authors.initials: HJ
authors.lastname: Jeon
authors.forename: Hyeon Su
authors.initials: HS
authors.lastname: Jeong
authors.forename: Yun Ho
authors.initials: YH
authors.lastname: Kim
authors.forename: Woo-Bin
authors.initials: WB
authors.lastname: Jung
authors.forename: Jeong Yeon
authors.initials: JY
authors.lastname: Kim
authors.forename: Hee-Tae
authors.initials: HT
authors.lastname: Jung