A facile process for soak-and-peel delamination of CVD graphene from substrates using water.
We demonstrate a simple technique to transfer chemical vapour deposited (CVD) graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional doping, as confirmed by Raman and electrical measurements. The process allows the reuse of substrates and hence can enable the use of oriented substrates for growth of higher quality graphene, and is an inherently inexpensive and scalable process for large-area production.
1] Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India [2].
Priti
P
Gupta
1] Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India [2] Birla Institute of Technology and Science, Vidyavihar Campus, Pilani, Rajasthan 333031, India [3].
Pratiksha D
PD
Dongare
Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India.
Sameer
S
Grover
Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India.
Sudipta
S
Dubey
WITec GmbH, Lise-Meitner-Str. 6, D-89081 Ulm, Germany.
Hitesh
H
Mamgain
Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India.
Arnab
A
Bhattacharya
Tata Institute of Fundamental Research, Homi Bhabha Road, Colaba, Mumbai 400005, India.
Mandar M
MM
Deshmukh