Influence of photo-curing distance on bond strength and nanoleakage of self-etching adhesive bonds to enamel and dentin.
OBJECTIVE
To assess the influence of light-curing unit tip distance on the microtensile bond strength (μTBS) and nanoleakage of self-etching adhesives to enamel and dentin.


METHODS
Flat buccal surfaces were prepared on 198 bovine incisors. The teeth were randomly assigned into nine groups for μTBS (n = 8) and nanoleakage (n = 3) testing according to the adhesive system (Clearfil Protect Bond, Clearfil Tri-S Bond or One Up Bond F Plus) and distance from the light-curing tip (0, 3 or 6 mm). The bonded samples were tested in tension (0.5 mm/min) and nanoleakage was analyzed using SEM.


RESULTS
Clearfil Protect Bond exhibited the highest tensile strength on both enamel and dentin. Leakage was higher in samples exposed at a distance of 6 mm on enamel and 0 mm on dentin. One Up Bond F Plus experienced the greatest amount of nanoleakage on both substrates.


CONCLUSIONS
Light-curing unit distance did not influence the μTBS of the adhesives, but nanoleakage increased on enamel samples when photoactivation occurred at a distance of 6 mm.
Department of Restorative Dentistry, Piracicaba School of Dentistry, State University of Campinas , SP , Brazil.
Cíntia Tereza
CT
Pimenta de Araújo
Lúcia Trazzi
LT
Prieto
Adriano Fonseca
AF
Lima
Eduardo José
EJ
Souza-Junior
Carlos Tadeu Santos
CT
Dias
Luís Alexandre Maffei Sartini
LA
Paulillo
D001840:Dental Bonding; D003738:Dental Cements; D003743:Dental Enamel / Q000737:chemistry*; D003804:Dentin / Q000737:chemistry*; D036103:Nanotechnology; D013500:Surface Tension; D013718:Tensile Strength
D003738:Dental Cements