Suppressing instability of liquid thin films by a fibril network and its application to micropatterning without a residual layer.
This study proposes a method to coat thin films of non-volatile solvents on substrates. A small amount of crystalline polymer dissolved in solvents forms a network of crystalline fibrils during the coating process. The network suppresses dewetting of the solvent liquid and helps the liquid film sustaining on the substrate. This strategy can be used in soft lithography to generate micropatterns of diverse materials without having a residual layer. This process does not request etching for achieving residual layer-free micropatterns, which has been a long challenge in soft lithography. As examples, we demonstrate micropatterns of polymer hydrogels and metal oxides (ZnO, In2O3).
Department of Materials Science and Engineering, Yonsei University, 134 Shinchon-dong, Seoul, Korea.
Jaeyoon
J
Park
Minwoo
M
Park
Unyong
U
Jeong
D003460:Crystallization; D016650:Fluorescein-5-isothiocyanate / Q000737:chemistry; D007204:Indium / Q000737:chemistry; D008856:Microscopy, Fluorescence; D055616:Microtechnology / Q000379:methods*; D011092:Polyethylene Glycols / Q000737:chemistry; D012997:Solvents / Q000737:chemistry*
D012997:Solvents; D007204:Indium; D011092:Polyethylene Glycols; C047711:indium oxide; D016650:Fluorescein-5-isothiocyanate
capillary force; dewetting; gelation; lithography; micropatterning; thin film instability