Efficacy of reducing agent and surfactant contacting pattern on the performance characteristics of nickel electroless plating baths coupled with and without ultrasound.
This article addresses furthering the role of sonication for the optimal fabrication of nickel ceramic composite membranes using electroless plating. Deliberating upon process modifications for surfactant induced electroless plating (SIEP) and combined surfactant and sonication induced electroless plating (SSOEP), this article highlights a novel method of contacting of the reducing agent and surfactant to the conventional electroless nickel plating baths. Rigorous experimental investigations indicated that the combination of ultrasound (in degas mode), surfactant and reducing agent pattern had a profound influence in altering the combinatorial plating characteristics. For comparison purpose, purely surfactant induced nickel ELP baths have also been investigated. These novel insights consolidate newer research horizons for the role of ultrasound to achieve dense metal ceramic composite membranes in a shorter span of total plating time. Surface and physical characterizations were carried out using BET, FTIR, XRD, FESEM and nitrogen permeation experiments. It has been analyzed that the SSOEP baths provided maximum ratio of percent pore densification per unit metal film thickness (PPDδ) and hold the key for further fine tuning of the associated degrees of freedom. On the other hand SIEP baths provided lower (PPDδ) ratio but higher PPD. For SSOEP baths with dropwise reducing agent and bulk surfactant, the PPD and metal film thickness values were 73.4% and 8.4 μm which varied to 66.9% and 13.3 μm for dropwise reducing agent and drop surfactant case.
Department of Chemical Engineering, Indian Institute of Technology Guwahati, Guwahati 781039, Assam, India.
Amrita
A
Agarwal
Department of Chemical Engineering, Indian Institute of Technology Guwahati, Guwahati 781039, Assam, India.
Murali
M
Pujari
Department of Chemical Engineering, Indian Institute of Technology Guwahati, Guwahati 781039, Assam, India. Electronic address: ramgopalu@iitg.ernet.in.
Ramgopal
R
Uppaluri
Department of Chemical Engineering, Indian Institute of Technology Guwahati, Guwahati 781039, Assam, India.
Anil
A
Verma
Ceramic; Densification; Reducing agent; Sonication; Surfactant