title: Investigation of a chalcohalide glass optical waveguide structure fabricated by dual-energy carbon-ion implantation.
abstract: A planar waveguide structure in a chalcohalide glass was fabricated by dual-energy C ion implantation with energies of 5.5 and 6.0 MeV at fluences of 7.0×10¹⁴ and 8.0×10¹⁴ions cm⁻², respectively. A waveguide with a thickness of 5.9 μm was formed. SRIM 2013 was used to simulate the defect distribution fabricated by C ion implantation. Images of the polished end face of the C-implanted chalcohalide glass were measured with a metallographic microscope using reflected polarized light. The micro-Raman spectra were measured in air. The near-field intensity distributions were investigated at visible (633 nm) and near-infrared (1300, 1400, and 1539 nm) bands.
authors: Xiao-Fei
authors: XF
authors: Yu
authors: Tao
authors: T
authors: Liu
authors: Lian
authors: L
authors: Zhang
authors: Yu-Fan
authors: YF
authors: Zhou
authors: Tie-Jun
authors: TJ
authors: Wang
authors: Xue-Lin
authors: XL
authors: Wang