title: Long-range ordered self-assembly of novel acrylamide-based diblock copolymers for nanolithography and metallic nanostructure fabrication.
abstract: Novel acrylamide-based hard-soft hybrid block copolymers generate high-quality nanolithographic patterns satisfying high-resolution, long-range ordering, low defect density, moderate etch selectivity, and easy pattern transfer onto a substrate. The resulting patterns can also be used as a scaffold for metallic nanostructures such as aligned nanowires and nanomeshes with extraordinary structural regularity.
authors: Department of Chemistry, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul, 133-791, Korea.
authors: Je Gwon
authors: JG
authors: Lee
authors: Yeon Sik
authors: YS
authors: Jung
authors: Sung-Hwan
authors: SH
authors: Han
authors: Kwan-Mook
authors: KM
authors: Kim
authors: Yang-Kyoo
authors: YK
authors: Han
keywords: direct self-assembly; metallic nanostructures; nanolithography; novel diblock copolymers