title: Low-loss, flat-topped and spectrally uniform silicon-nanowire-based 5th-order CROW fabricated by ArF-immersion lithography process on a 300-mm SOI wafer.
abstract: We report superior spectral characteristics of silicon-nanowire-based 5th-order coupled resonator optical waveguides (CROW) fabricated by 193-nm ArF-immersion lithography process on a 300-mm silicon-on-insulator wafer. We theoretically analyze spectral characteristics, considering random phase errors caused by micro fabrication process. It will be experimentally demonstrated that the fabricated devices exhibit a low excess loss of 0.4 ± 0.2 dB, a high out-of-band rejection ratio of >40dB, and a wide flatband width of ~2 nm. Furthermore, we evaluate manufacturing tolerances for intra-dies and inter-dies, comparing with the cases for 248-nm KrF-dry lithography process. It will be shown that the 193-nm ArF-immersion lithography process can provide much less excess phase errors of Si-nanowire waveguides, thus enabling to give better filter spectral characteristics. Finally, spectral superiorities will be reconfirmed by measuring 25 Gbps modulated signals launched into the fabricated device. Clear eye diagrams are observed when the wavelengths of modulated signals are stayed within almost passband of the 5th-order CROW.
authors: Seok-Hwan
authors: SH
authors: Jeong
authors: Daisuke
authors: D
authors: Shimura
authors: Takasi
authors: T
authors: Simoyama
authors: Miyoshi
authors: M
authors: Seki
authors: Nobuyuki
authors: N
authors: Yokoyama
authors: Minoru
authors: M
authors: Ohtsuka
authors: Keiji
authors: K
authors: Koshino
authors: Tsuyoshi
authors: T
authors: Horikawa
authors: Yu
authors: Y
authors: Tanaka
authors: Ken
authors: K
authors: Morito