title: Scattering reduction through oblique multilayer deposition.
abstract: Scattering from multilayer coatings depends on the roughness of each interface as well as their cross-correlation properties. By depositing thin film coatings under oblique incidence, the cross-correlation properties can be specifically adapted and consequently also the scattering characteristics. This will be illustrated for Mo/Si multilayers, for which a scattering reduction of more than 30% can be achieved. The characterization techniques used comprise of cross-sectional transmission electron microscopy, atomic force microscopy, and angle-resolved light scattering measurements at a wavelength of 13.5 nm.
authors: Marcus
authors: M
authors: Trost
authors: Tobias
authors: T
authors: Herffurth
authors: Sven
authors: S
authors: Schröder
authors: Angela
authors: A
authors: Duparré
authors: Andreas
authors: A
authors: Tünnermann