title: Hybrid lithography: combining UV-exposure and two photon direct laser writing.
abstract: We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated.
authors: Carsten
authors: C
authors: Eschenbaum
authors: Daniel
authors: D
authors: Großmann
authors: Katja
authors: K
authors: Dopf
authors: Siegfried
authors: S
authors: Kettlitz
authors: Tobias
authors: T
authors: Bocksrocker
authors: Sebastian
authors: S
authors: Valouch
authors: Uli
authors: U
authors: Lemmer
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D007909:Lenses; D008422:Materials Testing; D046210:Microfluidic Analytical Techniques / Q000295:instrumentation*; D054802:Molecular Imprinting / Q000379:methods*; D010781:Photography / Q000379:methods*; D017785:Photons; D011108:Polymers / Q000737:chemistry* / Q000528:radiation effects*; D013499:Surface Properties / Q000528:radiation effects; D014466:Ultraviolet Rays
chemical_list: D011108:Polymers