title: Flat-stitching error analysis of large-aperture photon sieves.
abstract: Large aperture can be easily achieved by employing photon sieves fabricated on the stitching membrane, which are suitable for packaging and folding. We have done research to find out the image quality degradation caused by stitching. A simulation has been done to investigate the behavior of the stitching wavefront. 10×10 pieces have been used as a model, and their wavefront error has been evaluated using the wavefront method discussed in this work. Besides, we find that the errors in the outer zones are more remarkable than in the inner ones of the same photon sieve. Testing and alignment directions based on this method are also mentioned in this work.
authors: Guang
authors: G
authors: Jin
authors: Junliang
authors: J
authors: Yan
authors: Hua
authors: H
authors: Liu
authors: Xing
authors: X
authors: Zhong
authors: Yong
authors: Y
authors: Yan