title: Fourier spectrum method to determine dose-to-clear in a photoresist.
abstract: A Fourier spectrum method to determine the dose-to-clear in a photoresist is proposed. The frequency content of scanning electron microscope resist images is used to determine whether the resist has been dissolved. Using this method, the dose to clear the resist is calculated automatically instead of via visual inspection, a method in which operator influence can affect the result.
authors.forename: Lei
authors.initials: L
authors.lastname: Sun
authors.forename: Obert
authors.initials: O
authors.lastname: Wood
authors.forename: Chris
authors.initials: C
authors.lastname: Clifford
authors.forename: Sudhar
authors.initials: S
authors.lastname: Raghunathan
authors.forename: Oleg
authors.initials: O
authors.lastname: Kritsun
authors.forename: Myungjun
authors.initials: M
authors.lastname: Lee
authors.forename: Ryoung-Han
authors.initials: RH
authors.lastname: Kim
authors.forename: Pawitter
authors.initials: P
authors.lastname: Mangat
authors.forename: Hui Peng
authors.initials: HP
authors.lastname: Koh
authors.forename: Harry
authors.initials: H
authors.lastname: Levinson