title: A large-area 15 nm graphene nanoribbon array patterned by a focused ion beam.
abstract: Using a focused ion beam, we patterned epitaxial graphene on SiC into an array of graphene nanoribbons as narrow as 15 nm by optimizing the Ga(+) ion beam current, acceleration voltage, dwell time, beam center-to-center distance and ion dose. The ion dose required to completely etch away graphene on SiC was determined and compared with the Monte Carlo simulation result. In addition, a photodetector using an array of 300 20 nm graphene nanoribbons was fabricated and its photoresponse was studied.
authors.affiliation: Department of Materials Science and Engineering, University of Utah, Salt Lake City, UT 84112, USA.
authors.forename: Ye
authors.initials: Y
authors.lastname: Zhang
authors.forename: Chao
authors.initials: C
authors.lastname: Hui
authors.forename: Rujie
authors.initials: R
authors.lastname: Sun
authors.forename: Kang
authors.initials: K
authors.lastname: Li
authors.forename: Ke
authors.initials: K
authors.lastname: He
authors.forename: Xucun
authors.initials: X
authors.lastname: Ma
authors.forename: Feng
authors.initials: F
authors.lastname: Liu