title: Hollow metal target magnetron sputter type radio frequency ion source.
abstract: A 70 mm diameter 70 mm long compact ion source equipped with a hollow sputtering target has been designed and tested. The hollow sputtering target serves as the radio frequency (RF) plasma excitation electrode at 13.56 MHz. A stable beam of Cu(+) has been extracted when Ar was used as the discharge support gas. In the extracted beam, Cu(+) had occupied more than 85% of the total ion current. Further increase in Cu(+) ions in the beam is anticipated by increasing the RF power and Ar pressure.
authors.affiliation: Graduate School of Science and Engineering, Doshisha University, Kyoto 610-0321, Japan.
authors.forename: N
authors.initials: N
authors.lastname: Yamada
authors.affiliation: Graduate School of Science and Engineering, Doshisha University, Kyoto 610-0321, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Kasuya
authors.affiliation: Kansai Institute, Advanced Industrial Science and Technology, Osaka 563-8577, Japan.
authors.forename: N
authors.initials: N
authors.lastname: Tsubouchi
authors.affiliation: Graduate School of Science and Engineering, Doshisha University, Kyoto 610-0321, Japan.
authors.forename: M
authors.initials: M
authors.lastname: Wada