title: New tandem type ion source based on electron cyclotron resonance for universal source of synthesized ion beams.
abstract: A new tandem type source has been constructed on the basis of electron cyclotron resonance (ECR) plasma for producing synthesized ion beams. We investigate feasibility and hope to realize the device which has wide range operation window in a single device to produce many kinds of ion beams based on ECR ion source (ECRIS). It is considered that ECR plasmas are necessary to be available to individual operations with different plasma parameters. Both of analysis of ion beams and investigation of plasma parameters are conducted on produced plasmas. We describe construction of the new tandem type ion source based on ECRIS with wide operation window for aiming at producing synthesized ion beams as this new source can be a universal source.
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Yushi
authors.initials: Y
authors.lastname: Kato
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Yosuke
authors.initials: Y
authors.lastname: Kurisu
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Dai
authors.initials: D
authors.lastname: Nozaki
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Keisuke
authors.initials: K
authors.lastname: Yano
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Daiju
authors.initials: D
authors.lastname: Kimura
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Sho
authors.initials: S
authors.lastname: Kumakura
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Youta
authors.initials: Y
authors.lastname: Imai
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Takuya
authors.initials: T
authors.lastname: Nishiokada
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Fuminobu
authors.initials: F
authors.lastname: Sato
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Toshiyuki
authors.initials: T
authors.lastname: Iida