title: A variable-temperature nanostencil compatible with a low-temperature scanning tunneling microscope/atomic force microscope.
abstract: We describe a nanostencil lithography tool capable of operating at variable temperatures down to 30 K. The setup is compatible with a combined low-temperature scanning tunneling microscope/atomic force microscope located within the same ultra-high-vacuum apparatus. The lateral movement capability of the mask allows the patterning of complex structures. To demonstrate operational functionality of the tool and estimate temperature drift and blurring, we fabricated LiF and NaCl nanostructures on Cu(111) at 77 K.
authors.affiliation: IBM Research-Zurich, 8803 Rüschlikon, Switzerland.
authors.forename: Wolfram
authors.initials: W
authors.lastname: Steurer
authors.affiliation: IBM Research-Zurich, 8803 Rüschlikon, Switzerland.
authors.forename: Leo
authors.initials: L
authors.lastname: Gross
authors.affiliation: IBM Research-Zurich, 8803 Rüschlikon, Switzerland.
authors.forename: Reto R
authors.initials: RR
authors.lastname: Schlittler
authors.affiliation: IBM Research-Zurich, 8803 Rüschlikon, Switzerland.
authors.forename: Gerhard
authors.initials: G
authors.lastname: Meyer