title: Radiation-sensitive novel polymeric resist materials: iterative synthesis and their EUV fragmentation studies.
abstract: Polymerization of (4-(methacryloyloxy)phenyl)dimethylsulfoniumtriflate (MAPDST), as a key monomer containing the radiation sensitive sulfonium functionality, with various other monomers such as methyl methacrylate (MMA), 4-carboxy styrene (STYCOOH), N-vinyl carbazole (NVK) in different molar ratios via free-radical polymerization method is described. This methodology led to the development of a small chemical library of six different radiation sensitive polymers for lithography applications. Fourier transform infrared (FT-IR) and nuclear magnetic resonance (NMR) spectroscopy identified the reaction products as MAPDST homopolymer and MAPDST-MMA, MAPDST-STYCOOH, MAPDST-NVK copolymers. Molecular weights were obtained from gel permeation chromatography and the decomposition temperature (Td) values were determined using thermogravimetric analysis (TGA). The effect of extreme ultraviolet (EUV) irradiation on a thin poly(MAPDST) film was investigated using monochromatic synchrotron excitation. These new polymeric materials were also exposed to electron-beam lithography (EBL) and extreme ultraviolet lithography (EUVL) to achieve 20-nm line patterns.
authors.affiliation: School of Basic Sciences, Indian Institute of Technology Mandi , Mandi - 175001, Himachal Pradesh, India.
authors.forename: V S V
authors.initials: VS
authors.lastname: Satyanarayana
authors.forename: Felipe
authors.initials: F
authors.lastname: Kessler
authors.forename: Vikram
authors.initials: V
authors.lastname: Singh
authors.forename: Francine R
authors.initials: FR
authors.lastname: Scheffer
authors.forename: Daniel E
authors.initials: DE
authors.lastname: Weibel
authors.forename: Subrata
authors.initials: S
authors.lastname: Ghosh
authors.forename: Kenneth E
authors.initials: KE
authors.lastname: Gonsalves