title: Controlling precise magnetic field configuration around electron cyclotron resonance zone for enhancing plasma parameters and beam current.
abstract: Multi-charged ion source which has wide operating conditions is required in various application fields. We have constructed tandem type ECR ion source (ECRIS); one of the features of its main stage is an additional coil for controlling magnetic field distribution around the mirror bottom precisely. Here the effect of magnetic field variation caused by the additional coil is experimentally considered in terms of plasma parameters and beam current as the first investigation of the main stage plasma. Furthermore, behavior of magnetic lines of force flowing from the ECR zone is calculated, and is compared with measurement results aiming for better understanding of interrelationship between plasma production and ion beam generation on the ECRIS.
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Keisuke
authors.initials: K
authors.lastname: Yano
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Yosuke
authors.initials: Y
authors.lastname: Kurisu
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Dai
authors.initials: D
authors.lastname: Nozaki
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Daiju
authors.initials: D
authors.lastname: Kimura
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Youta
authors.initials: Y
authors.lastname: Imai
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Sho
authors.initials: S
authors.lastname: Kumakura
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Fuminobu
authors.initials: F
authors.lastname: Sato
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Yushi
authors.initials: Y
authors.lastname: Kato
authors.affiliation: Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita-shi, Osaka 565-0871, Japan.
authors.forename: Toshiyuki
authors.initials: T
authors.lastname: Iida
mesh_terms: D017357:Cyclotrons / Q000295:instrumentation*; D004583:Electrons; D060526:Magnetic Fields; D013696:Temperature