title: Ion implantation technology and ion sources.
abstract: Ion implantation (I/I) technology has been developed with a great economic success of industries of VLSI (Very Large-Scale Integrated circuit) devices. Due to its large flexibility and good controllability, the I/I technology has been assuming various challenging requirements of VLSI evolutions, especially in advanced evolutional characteristics of CMOSFET. Here, reviewing the demands of VLSI manufacturing to the I/I technology, required characteristics of ion implanters, and their ion sources are discussed.
authors.affiliation: SEN Corporation, Shinagawa, Tokyo 141-6025, Japan.
authors.forename: Michiro
authors.initials: M
authors.lastname: Sugitani