title: Note: practical monitoring system using characteristic impedance measurement during plasma processing.
abstract: A method for characteristic impedance monitoring (CIM) is developed for anomaly detection during plasma processing. Advantages of the method include high-sensitivity and real-time monitoring, as well as structural simplicity to install the measurement system in the mass production equipment. To obtain real-time monitoring without time delay, our CIM system consists of a directional coupler and a newly developed vector processing system instead of the conventional high voltage and current probes. The system can measure the time variations of characteristic and load impedances even while the plasma is generated.
authors.affiliation: Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology, Tosu, Saga 841-0052, Japan.
authors.forename: T
authors.initials: T
authors.lastname: Motomura
authors.affiliation: Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology, Tosu, Saga 841-0052, Japan.
authors.forename: Y
authors.initials: Y
authors.lastname: Kasashima
authors.affiliation: Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology, Tosu, Saga 841-0052, Japan.
authors.forename: O
authors.initials: O
authors.lastname: Fukuda
authors.affiliation: Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology, Tosu, Saga 841-0052, Japan.
authors.forename: F
authors.initials: F
authors.lastname: Uesugi
authors.affiliation: RF Measuring Unit Business Division, ADVANTEST Corporation, Ora, Gunma 370-0718, Japan.
authors.forename: H
authors.initials: H
authors.lastname: Kurita
authors.affiliation: RF Measuring Unit Business Division, ADVANTEST Corporation, Ora, Gunma 370-0718, Japan.
authors.forename: N
authors.initials: N
authors.lastname: Kimura