title: Thin films with high surface roughness: thickness and dielectric function analysis using spectroscopic ellipsometry.
abstract: An optical surface roughness model is presented, which allows a reliable determination of the dielectric function of thin films with high surface roughnesses of more than 10 nm peak to valley distance by means of spectroscopic ellipsometry. Starting from histogram evaluation of atomic force microscopy (AFM) topography measurements a specific roughness layer (RL) model was developed for an organic thin film grown in vacuum which is well suited as an example. Theoretical description based on counting statistics allows generalizing the RL model developed to be used for all non-conducting materials. Finally, a direct input of root mean square (RMS) values found by AFM measurements into the proposed model is presented, which is important for complex ellipsometric evaluation models where a reduction of the amount of unknown parameters can be crucial. Exemplarily, the evaluation of a N,N'-dimethoxyethyl-3,4,9,10-perylene-tetracarboxylic-diimide (DiMethoxyethyl-PTCDI) film is presented, which exhibits a very high surface roughness, i.e. showing no homogeneous film at all.
authors.affiliation: Semiconductor Physics, Technische Universität Chemnitz, 09107 Chemnitz, Germany.
authors.forename: Daniel
authors.initials: D
authors.lastname: Lehmann
authors.affiliation: Semiconductor Physics, Technische Universität Chemnitz, 09107 Chemnitz, Germany.
authors.forename: Falko
authors.initials: F
authors.lastname: Seidel
authors.affiliation: Semiconductor Physics, Technische Universität Chemnitz, 09107 Chemnitz, Germany.
authors.forename: Dietrich Rt
authors.initials: DR
authors.lastname: Zahn
keywords: AFM; Dielectric function; Ellipsometry; PTCDI; RMS; Roughness; Thickness