title: CMOS-compatible highly efficient polarization splitter and rotator based on a double-etched directional coupler.
abstract: We present a highly efficient polarization splitter and rotator (PSR), fabricated using 248 nm deep ultraviolet lithography on a silicon-on-insulator substrate. The PSR is based on a double-etched directional coupler with a length of 27 µm. The fabricated PSR yields a TM-to-TE conversion loss better than 0.5 dB and TE insertion loss better than 0.3 dB, with an ultra-low crosstalk (-20 dB) in the wavelength regime 1540-1570 nm.
authors.forename: Hang
authors.initials: H
authors.lastname: Guan
authors.forename: Ari
authors.initials: A
authors.lastname: Novack
authors.forename: Matthew
authors.initials: M
authors.lastname: Streshinsky
authors.forename: Ruizhi
authors.initials: R
authors.lastname: Shi
authors.forename: Qing
authors.initials: Q
authors.lastname: Fang
authors.forename: Andy Eu-Jin
authors.initials: AE
authors.lastname: Lim
authors.forename: Guo-Qiang
authors.initials: GQ
authors.lastname: Lo
authors.forename: Tom
authors.initials: T
authors.lastname: Baehr-Jones
authors.forename: Michael
authors.initials: M
authors.lastname: Hochberg