title: Aberration measurement technique based on an analytical linear model of a through-focus aerial image.
abstract: We propose an in situ aberration measurement technique based on an analytical linear model of through-focus aerial images. The aberrations are retrieved from aerial images of six isolated space patterns, which have the same width but different orientations. The imaging formulas of the space patterns are investigated and simplified, and then an analytical linear relationship between the aerial image intensity distributions and the Zernike coefficients is established. The linear relationship is composed of linear fitting matrices and rotation matrices, which can be calculated numerically in advance and utilized to retrieve Zernike coefficients. Numerical simulations using the lithography simulators PROLITH and Dr.LiTHO demonstrate that the proposed method can measure wavefront aberrations up to Z(37). Experiments on a real lithography tool confirm that our method can monitor lens aberration offset with an accuracy of 0.7 nm.
authors.forename: Guanyong
authors.initials: G
authors.lastname: Yan
authors.forename: Xiangzhao
authors.initials: X
authors.lastname: Wang
authors.forename: Sikun
authors.initials: S
authors.lastname: Li
authors.forename: Jishuo
authors.initials: J
authors.lastname: Yang
authors.forename: Dongbo
authors.initials: D
authors.lastname: Xu
authors.forename: Andreas
authors.initials: A
authors.lastname: Erdmann