title: Correction of large birefringent effect of windows for in situ ellipsometry measurements.
abstract: To extract true optical properties of samples in a chamber with entrance and exit optical windows, oftentimes the windows were approximated as simple retarders where the retardation was small and premeasured under a given condition. The proposed method allows to cope with large birefringent effect of chamber windows thanks to its capability of extracting ellipsometric parameters (Δ, Ψ) of isotropic samples as well as measuring birefringent parameters (δ, θ) of each window separately and simultaneously. This method is, however, not valid for anisotropic samples. Ex situ results and extracted ellipsometric parameters results from in situ measurements of a silicon substrate and a SiO2 film thermally grown on the silicon substrate exhibited excellent agreement and provided significance of this method.
authors.forename: Lianhua
authors.initials: L
authors.lastname: Jin
authors.forename: Eiichi
authors.initials: E
authors.lastname: Kondoh
mesh_terms: D000465:Algorithms; D016477:Artifacts; D001718:Birefringence; D058266:Dielectric Spectroscopy / Q000295:instrumentation / Q000379:methods*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D007368:Interferometry / Q000295:instrumentation / Q000379:methods*; D012031:Refractometry / Q000295:instrumentation / Q000379:methods*; D012822:Silicon Dioxide / Q000032:analysis* / Q000737:chemistry*
chemical_list: D012822:Silicon Dioxide