Rapid fabrication of designable large-scale aligned graphene nanoribbons by electro-hydrodynamic nanowire lithography.
A new technique, electro-hydrodynamic nanowire (e-NW) lithography , is demonstrated for the rapid, inexpensive, and efficient fabrication of graphene nanorib bons (GNRs) on a large scale while simultaneously controlling the location and alignment of the GNRs. A series of interesting GNR architectures, including parallel lines, grids, ladders, and stars are produced. A sub-10-nm-wide GNR is obtained to fabricate field-effect transistors that show a room-temperature on/off current ratio of ca. 70.
Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyungbuk, 790-784, Republic of Korea.
Wentao
W
Xu
Hong-Kyu
HK
Seo
Sung-Yong
SY
Min
Himchan
H
Cho
Tae-Seok
TS
Lim
Chang-yeol
CY
Oh
Yeongjun
Y
Lee
Tae-Woo
TW
Lee
electrohydrodynamic nanowire lithography; electrohydrodynamically printed nanowires; field-effect transistors; graphene nanoribbons; large-scale fabrication