Controlled evaporative self-assembly of poly(acrylic acid) in a confined geometry for fabricating patterned polymer brushes.
A simple yet robust approach was exploited to fabricate large-scaled patterned polymer brushes by combining controlled evaporative self-assembly (CESA) in a confined geometry and self-initiated photografting and photopolymerization (SIPGP). Our method was carried out without any sophisticated instruments, free of lithography, overcoming current difficulties in fabricating polymer patterns by using complex instruments.
Division of Polymer and Composite Materials, Ningbo Institute of Material Technology and Engineering, Chinese Academy of Science , 519 Zhuangshi Road, Ningbo 315201, China.
Yonghong
Y
Men
Peng
P
Xiao
Jing
J
Chen
Jun
J
Fu
Youju
Y
Huang
Jiawei
J
Zhang
Zhengchao
Z
Xie
Wenqin
W
Wang
Tao
T
Chen
D000180:Acrylic Resins / Q000737:chemistry*; D011108:Polymers / Q000737:chemistry*
D000180:Acrylic Resins; D011108:Polymers; C006903:carbopol 940