Enhanced temperature control method using ANFIS with FPGA.
Temperature control in etching process is important for semiconductor manufacturing technology. However, pressure variations in vacuum chamber results in a change in temperature, worsening the accuracy of the temperature of the wafer and the speed and quality of the etching process. This work develops an adaptive network-based fuzzy inference system (ANFIS) using a field-programmable gate array (FPGA) to improve the effectiveness. The proposed method adjusts every membership function to keep the temperature in the chamber stable. The improvement of the proposed algorithm is confirmed using a medium vacuum (MV) inductively-coupled plasma- (ICP-) type etcher.
Department of Electronic Engineering, Chien Hsin University of Science and Technology, Jhongli 320, Taiwan.
Chiung-Wei
0000-0001-8979-9469
CW
Huang
Department of Computer Science and Information Engineering, National University of Kaohsiung, Kaohsiung 811, Taiwan.
Shing-Tai
0000-0002-0943-9509
ST
Pan
Department of Electrical Engineering, Chung Yuan Christian University, Jhongli 320, Taiwan.
Jun-Tin
JT
Zhou
Department of Electrical Engineering, Chung Yuan Christian University, Jhongli 320, Taiwan.
Cheng-Yuan
0000-0002-7178-1655
CY
Chang
D003201:Computers; D017143:Fuzzy Logic; D008962:Models, Theoretical; D013696:Temperature