High-transmittance subwavelength metal grating with relief structure composed of multiple steps.
A new kind of subwavelength metal grating with relief structure is designed and analyzed, in which the shape of the grating lines is no longer a single rectangle, but a relief structure with multiple steps. GsolverV52 was used to determine the optimal values of the grating period, groove depth, and the number of steps. The optical performance of the novel structure is evaluated and compared in terms of the transmission efficiency and extinction ratio over the visible and near-infrared wavelength spectrum. It is shown that, in the near-infrared band, the maximum transmittance can be increased about 15% compared to the traditional metal grating under the same parameters. With the unique characteristics, the metal grating is expected to find applications in liquid crystal display fields, polarization imaging, optical communication, and so on.
Shanghai Key Laboratory of Modern Optical System, Optical Instruments and Systems Engineering Research Center of Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Zhongfei
0000-0002-1586-0180
Z
Wang
Shanghai Key Laboratory of Modern Optical System, Optical Instruments and Systems Engineering Research Center of Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Dawei
D
Zhang
Shanghai Key Laboratory of Modern Optical System, Optical Instruments and Systems Engineering Research Center of Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Qi
Q
Wang
Shanghai Key Laboratory of Modern Optical System, Optical Instruments and Systems Engineering Research Center of Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Banglian
B
Xu
Shanghai Key Laboratory of Modern Optical System, Optical Instruments and Systems Engineering Research Center of Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Qingyong
Q
Tang
Shanghai Key Laboratory of Modern Optical System, Optical Instruments and Systems Engineering Research Center of Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Yuanshen
Y
Huang
Shanghai Key Laboratory of Modern Optical System, Optical Instruments and Systems Engineering Research Center of Ministry of Education, School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China.
Songlin
S
Zhuang
D004867:Equipment Design; D008027:Light; D008670:Metals / Q000737:chemistry*
D008670:Metals