title: Pulse laser deposited nanostructured ZnO thin films: a review.
abstract: This review summarizes the work principles of pulse laser deposition (PLD) apparatus, physical processes like ablation, and plasma plume formation accompanying the deposition of un-doped ZnO from target to substrate material. Various modes of deposition and factors influencing the properties of thin films such as substrate temperature, background gas pressure, laser energy density (laser fluence), target to substrate distance, repetition rate, oxygen partial pressure in deposition chamber, deposition time and post growth annealing which control deposition parameters such as adsorption, desorption, surface diffusion, nucleation, and crystallization/re-crystallization are also discussed in this review. Moreover, various film properties such as morphology, roughness of the film surface, film thickness, grain size, optical transmittance, sensitivity, electrical conductivity, uniformity and electrical resistivity of the deposited ZnO thin films have also been enumerated in the present review.
authors.forename: Rajesh
authors.initials: R
authors.lastname: Kumar
authors.forename: Girish
authors.initials: G
authors.lastname: Kumar
authors.forename: Ahmad
authors.initials: A
authors.lastname: Umar
mesh_terms: D007834:Lasers; D008422:Materials Testing; D008567:Membranes, Artificial; D008968:Molecular Conformation / Q000528:radiation effects; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects* / Q000648:ultrastructure; D010316:Particle Size; D058626:Plasma Gases / Q000737:chemistry* / Q000528:radiation effects; D011829:Radiation Dosage; D013499:Surface Properties / Q000528:radiation effects; D015034:Zinc Oxide / Q000737:chemistry* / Q000528:radiation effects*
chemical_list: D008567:Membranes, Artificial; D058626:Plasma Gases; D015034:Zinc Oxide