title: Conjugated polymer patterning through photooxidative backbone cleavage.
abstract: Photolithographic patterning of a xanthate precursor to poly(3,4-diphenyl-2,5-thienylene vinylene) is described. Unlike xanthate precursors to poly(p-phenylene vinylene), the thienylene vinylene analogue patterns as a positive tone resist. Characterization of irradiated films reveals photooxidative cleavage of the vinylene linker decreases the molecular weight of the polymer (increasing the solubility of the UV-exposed areas). As a result of the mechanism, the developed pattern sees no UV light exposure, which is a significant advantage compared with negative-tone-conjugated polymer resists. Single micron resolution of a low-bandgap polymer is achieved in an efficient and scalable process.
authors.affiliation: Sandia National Laboratories, Organic Materials Department, P.O. Box 5800, Albuquerque, New Mexico, 87185, USA.
authors.forename: Ross S
authors.initials: RS
authors.lastname: Johnson
authors.forename: Jacob J
authors.initials: JJ
authors.lastname: Haworth
authors.forename: Patrick S
authors.initials: PS
authors.lastname: Finnegan
authors.forename: David R
authors.initials: DR
authors.lastname: Wheeler
authors.forename: Shawn M
authors.initials: SM
authors.lastname: Dirk
mesh_terms: D015394:Molecular Structure; D010084:Oxidation-Reduction; D055668:Photochemical Processes; D011108:Polymers / Q000737:chemistry*; D011145:Polyvinyls / Q000737:chemistry*; D014466:Ultraviolet Rays
chemical_list: D011108:Polymers; D011145:Polyvinyls
keywords: conjugated polymers; lithography; patterning; photochemistry