title: Process-controlled multiscale morphologies in metal-containing block copolymer thin films.
abstract: Poly(styrene-block-ferrocenyldimethylsilane) (PS-b-PFS) is a metal-containing block copolymer that exhibits certain advantages as a scaffold for nanoporous membranes and as a mask for lithographic applications. These advantages include compatibility with a wide range of substrates, ease of control over domain morphologies and remarkable stability, which aid in the development of robust nanoporous networks or high-aspect-ratio patterns. An asymmetric cylinder-forming PS-b-PFS copolymer is subjected to different processing to manipulate the morphology of the phase-separated domains. Control of film structure and domain morphology is achieved by adjusting the film thickness, mode of annealing, and/or annealing time. Changing the process from thermal or solvent annealing to hybrid annealing (thermal and then solvent annealing in sequence) leads to the formation of mesoscale spherulitic and dendritic morphologies. In this communication, we show that reversing the order of the hybrid annealing (solvent annealing first and then thermal annealing) of relatively thick films (> 100 nm) on homogeneously thick substrates develops a discontinuous lamellar structure. Furthermore, the same processing applied on a substrate with a thin, mechanically flexible window in the center leads to the formation of sub-micron scale concentric ring patterns. Enhanced material mobility in the thick film during hybrid annealing along with dynamic rippling effects that may arise from the vibration of the thin window during spin casting are likely causes for these morphologies.
authors.forename: Muruganathan
authors.initials: M
authors.lastname: Ramanathan
authors.forename: S Michael
authors.initials: SM
authors.lastname: Kilbey
authors.forename: Seth B
authors.initials: SB
authors.lastname: Darling
mesh_terms: D005296:Ferrous Compounds / Q000737:chemistry*; D006358:Hot Temperature; D007700:Kinetics; D008422:Materials Testing; D008670:Metals / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D046529:Microscopy, Electron, Transmission; D008956:Models, Chemical; D049329:Nanostructures / Q000737:chemistry; D011137:Polystyrenes / Q000737:chemistry*; D012833:Siloxanes / Q000737:chemistry*; D012997:Solvents / Q000737:chemistry; D013499:Surface Properties
chemical_list: D005296:Ferrous Compounds; D008670:Metals; D011137:Polystyrenes; D012833:Siloxanes; D012997:Solvents; C509667:poly(ferrocenyldimethylsilane-b-dimethylsiloxane)