title: Possibility of graphene growth by close space sublimation.
abstract: Carbon films on the Si/SiO2 substrate are fabricated using modified method of close space sublimation at atmospheric pressure. The film properties have been characterized by micro-Raman and X-ray photoelectron spectroscopy and monochromatic ellipsometry methods. Ellipsometrical measurements demonstrated an increase of the silicon oxide film thickness in the course of manufacturing process. The XPS survey spectra of the as-prepared samples indicate that the main elements in the near-surface region are carbon, silicon, and oxygen. The narrow-scan spectra of C1s, Si2p, O1s regions indicate that silicon and oxygen are mainly in the SiOx (x ≈ 2) oxide form, whereas the main component of C1s spectrum at 284.4 eV comes from the sp2-hybridized carbon phase. Micro-Raman spectra confirmed the formation of graphene films with the number of layers that depended on the distance between the graphite source and substrate.
authors.affiliation: V, Ye, Lashkaryov Institute of Semiconductor Physics, National Academy of Sciences of Ukraine, 45 Prospect Nauky, Kyiv 03028, Ukraine. sopinsky@isp.kiev.ua.
authors.forename: Mykola V
authors.initials: MV
authors.lastname: Sopinskyy
authors.forename: Viktoriya S
authors.initials: VS
authors.lastname: Khomchenko
authors.forename: Viktor V
authors.initials: VV
authors.lastname: Strelchuk
authors.forename: Andrii S
authors.initials: AS
authors.lastname: Nikolenko
authors.forename: Genadiy P
authors.initials: GP
authors.lastname: Olchovyk
authors.forename: Volodymyr V
authors.initials: VV
authors.lastname: Vishnyak
authors.forename: Viktor V
authors.initials: VV
authors.lastname: Stonis
references.citation: Phys Rev Lett. 2006 Nov 3;97(18):187401
references.pmid: 17155573
references.citation: Nanotechnology. 2011 Feb 4;22(5):055705
references.pmid: 21178230