Controlling of 6 nm sized and 10 nm pitched dot arrays ordered along narrow guide lines using PS-PDMS self-assembly.
We have studied graphoepitaxy to make nanodots or nanolines ordered along electron beam (EB)-drawn resist guide using block copolymers (BCPs) of polystyrene-polydimethylsiloxane (PS-PDMS). We found out that the number n of ordered molecular dot arrays in the line gap increases stepwise with the gap between guide lines. The n self-assembled dot arrays were ordered in a gap between n and n+1 times the mean PDMS pitch and self-assembled with no guide pattern. According to the ordering characteristics, 6 nm sized and 10 nm pitched PDMS dot arrays were formed using the BCP self-assembly with the guide lines.
Graduate School of Engineering, Gunma University 1-5-1 Tenjin-cho, Kiryu 376-8515, Japan.
Sumio
S
Hosaka
Takashi
T
Akahane
Miftakhul
M
Huda
Hui
H
Zhang
You
Y
Yin