Correction method for the self-absorption effects in fluorescence extended X-ray absorption fine structure on multilayer samples.
A novel correction method for self-absorption effects is proposed for extended X-ray absorption fine structure (EXAFS) detected in the fluorescence mode on multilayer samples. The effects of refraction and multiple reflection at the interfaces are fully considered in this correction method. The correction is performed in k-space before any further data analysis, and it can be applied to single-layer or multilayer samples with flat surfaces and without thickness limit when the model parameters for the samples are known. The validity of this method is verified by the fluorescence EXAFS data collected for a Cr/C multilayer sample measured at different experimental geometries.
MOE Key Laboratory of Advanced Micro-structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.
Wen Bin
WB
Li
MOE Key Laboratory of Advanced Micro-structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.
Xiao Yue
XY
Yang
MOE Key Laboratory of Advanced Micro-structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.
Jing Tao
JT
Zhu
MOE Key Laboratory of Advanced Micro-structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.
Yu Chun
YC
Tu
MOE Key Laboratory of Advanced Micro-structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.
Bao Zhong
BZ
Mu
Shanghai Institute of Applied Physics, Chinese Academy of Science, Shanghai 201204, People's Republic of China.
Hai Sheng
HS
Yu
Shanghai Institute of Applied Physics, Chinese Academy of Science, Shanghai 201204, People's Republic of China.
Xiang Jun
XJ
Wei
Shanghai Institute of Applied Physics, Chinese Academy of Science, Shanghai 201204, People's Republic of China.
Yu Ying
YY
Huang
MOE Key Laboratory of Advanced Micro-structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai 200092, People's Republic of China.
Zhan Shan
ZS
Wang
EXAFS; X-ray fluorescence; XRR; multilayer; scattering factors; self-absorption effects