title: Cost-effective, transfer-free, flexible resistive random access memory using laser-scribed reduced graphene oxide patterning technology.
abstract: Laser scribing is an attractive reduced graphene oxide (rGO) growth and patterning technology because the process is low-cost, time-efficient, transfer-free, and flexible. Various laser-scribed rGO (LSG) components such as capacitors, gas sensors, and strain sensors have been demonstrated. However, obstacles remain toward practical application of the technology where all the components of a system are fabricated using laser scribing. Memory components, if developed, will substantially broaden the application space of low-cost, flexible electronic systems. For the first time, a low-cost approach to fabricate resistive random access memory (ReRAM) using laser-scribed rGO as the bottom electrode is experimentally demonstrated. The one-step laser scribing technology allows transfer-free rGO synthesis directly on flexible substrates or non-flat substrates. Using this time-efficient laser-scribing technology, the patterning of a memory-array area up to 100 cm(2) can be completed in 25 min. Without requiring the photoresist coating for lithography, the surface of patterned rGO remains as clean as its pristine state. Ag/HfOx/LSG ReRAM using laser-scribing technology is fabricated in this work. Comprehensive electrical characteristics are presented including forming-free behavior, stable switching, reasonable reliability performance and potential for 2-bit storage per memory cell. The results suggest that laser-scribing technology can potentially produce more cost-effective and time-effective rGO-based circuits and systems for practical applications.
authors.affiliation: Institute of Microelectronics and Tsinghua National Laboratory for Information Science and Technology (TNList), Tsinghua University , Beijing 100084, China.
authors.forename: He
authors.initials: H
authors.lastname: Tian
authors.forename: Hong-Yu
authors.initials: HY
authors.lastname: Chen
authors.forename: Tian-Ling
authors.initials: TL
authors.lastname: Ren
authors.forename: Cheng
authors.initials: C
authors.lastname: Li
authors.forename: Qing-Tang
authors.initials: QT
authors.lastname: Xue
authors.forename: Mohammad Ali
authors.initials: MA
authors.lastname: Mohammad
authors.forename: Can
authors.initials: C
authors.lastname: Wu
authors.forename: Yi
authors.initials: Y
authors.lastname: Yang
authors.forename: H-S Philip
authors.initials: HS
authors.lastname: Wong
mesh_terms: D003201:Computers; D006108:Graphite; D007834:Lasers; D010087:Oxides
chemical_list: D010087:Oxides; D006108:Graphite