title: Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning.
abstract: Ordered metal nanopatterns are crucial requirements for electronics, magnetics, catalysts, photonics, and so on. Despite considerable progress in the synthetic route to metal nanostructures, highly ordered metal nanopatterning over a large-area is still challenging. Nanodomain swelling block copolymer lithography is presented as a general route to the systematic morphology tuning of metal nanopatterns from amphiphilic diblock copolymer self-assembly. Selective swelling of hydrophilic nanocylinder domains in amphiphilic block copolymer films during metal precursor loading and subsequent oxygen based etching generates diverse shapes of metal nanopatterns, including hexagonal nanoring array and hexagonal nanomesh and double line array in addition to common nanodot and nanowire arrays. Solvent annealing condition of block copolymer templates, selective swelling of hydrophilic cylinder nanodomains, block copolymer template thickness, and oxygen based etching methods are the decisive parameters for systematic morphology evolution. The plasmonic properties of ordered Au nanopatterns are characterized and analyzed with finite differential time domain calculation. This approach offers unprecedented opportunity for diverse metal nanopatterns from commonly used diblock copolymer self-assembly.
authors.affiliation: Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS), Daejeon, 305-701, Republic of Korea; Department of Materials Science and Engineering, KAIST, Daejeon, 305-701, Republic of Korea.
authors.forename: Jeong Ho
authors.initials: JH
authors.lastname: Mun
authors.forename: Seung Keun
authors.initials: SK
authors.lastname: Cha
authors.forename: Hyowook
authors.initials: H
authors.lastname: Kim
authors.forename: Hyoung-Seok
authors.initials: HS
authors.lastname: Moon
authors.forename: Ju Young
authors.initials: JY
authors.lastname: Kim
authors.forename: Hyeong Min
authors.initials: HM
authors.lastname: Jin
authors.forename: Young Joo
authors.initials: YJ
authors.lastname: Choi
authors.forename: Jeong Eun
authors.initials: JE
authors.lastname: Baek
authors.forename: Jonghwa
authors.initials: J
authors.lastname: Shin
authors.forename: Sang Ouk
authors.initials: SO
authors.lastname: Kim
keywords: block copolymers; metal; nanopatterns; plasmonics