Fabricating nanopores with diameters of sub-1 nm to 3 nm using multilevel pulse-voltage injection.
To date, solid-state nanopores have been fabricated primarily through a focused-electronic beam via TEM. For mass production, however, a TEM beam is not suitable and an alternative fabrication method is required. Recently, a simple method for fabricating solid-state nanopores was reported by Kwok, H. et al. and used to fabricate a nanopore (down to 2 nm in size) in a membrane via dielectric breakdown. In the present study, to fabricate smaller nanopores stably--specifically with a diameter of 1 to 2 nm (which is an essential size for identifying each nucleotide)--via dielectric breakdown, a technique called "multilevel pulse-voltage injection" (MPVI) is proposed and evaluated. MPVI can generate nanopores with diameters of sub-1 nm in a 10-nm-thick Si3N4 membrane with a probability of 90%. The generated nanopores can be widened to the desired size (as high as 3 nm in diameter) with sub-nanometre precision, and the mean effective thickness of the fabricated nanopores was 3.7 nm.
Hitachi Ltd., Central Research Laboratory, 1-280 Higashi-koigakubo, Kokubunji, Tokyo, 185-8603.
Itaru
I
Yanagi
Hitachi Ltd., Central Research Laboratory, 1-280 Higashi-koigakubo, Kokubunji, Tokyo, 185-8603.
Rena
R
Akahori
Hitachi Ltd., Central Research Laboratory, 1-280 Higashi-koigakubo, Kokubunji, Tokyo, 185-8603.
Toshiyuki
T
Hatano
Hitachi Ltd., Central Research Laboratory, 1-280 Higashi-koigakubo, Kokubunji, Tokyo, 185-8603.
Ken-ichi
K
Takeda