Fabrication of 200 nm period hard X-ray phase gratings.
Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments.
Imaging Physics Laboratory, Biochemistry and Biophysics Center, National Heart, Lung and Blood Institute, National Institutes of Health , Bethesda, Maryland 20892, United States.
Houxun
H
Miao
Andrew A
AA
Gomella
Nicholas
N
Chedid
Lei
L
Chen
Han
H
Wen
D007368:Interferometry; D049329:Nanostructures; D014965:X-Rays