Nano-dot markers for electron tomography formed by electron beam-induced deposition: nanoparticle agglomerates application.
A method allowing fabrication of nano-dot markers for electron tomography was developed using an electron beam-induced deposition in an ordinary dual beam instrument (FIB and SEM) or an SEM. The electron beam deposited nano-dot markers are suitable for automatic alignment of tomographic series. The accuracy of the alignment was evaluated and the method was demonstrated on agglomerated nanoparticle samples using a rod-shaped sample with no missing wedge effect. Simulations were used to assess the effect of marker size on alignment accuracy.
National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1, Higashi, Tsukuba, Ibaraki 305-8565, Japan. Electronic address: misa-hayashida@aist.go.jp.
Misa
M
Hayashida
National Institute of Nanotechnology, 11421 Saskatchewan Drive, Edmonton, Canada; Department of Physics, University of Alberta, Edmonton, Canada T6G 2E1.
Marek
M
Malac
National Institute of Nanotechnology, 11421 Saskatchewan Drive, Edmonton, Canada.
Michael
M
Bergen
National Institute of Nanotechnology, 11421 Saskatchewan Drive, Edmonton, Canada.
Peng
P
Li
Electron beam induced deposition; Electron tomography; FIB sample preparation; Fiducial marker; Nano-dot marker; Nanoparticle agglomerate