Dual photosensitive polymers with wavelength-selective photoresponse.
Polyurethane thin films that photopolymerize and photodegrade upon exposure to light of different wavelengths are presented. The chromic response is based on two caged monomers with the ability to be activated or photocleaved with different wavelengths under single and two-photon excitation. This material represents a dual photoresist with "positive" and "negative" tone contained in a single resist formulation and with the ability to generate complex 2D and 3D patterns.
Max-Planck-Institut für Polymerforschung, Ackermannweg 10, 55128, Mainz, Germany.
Luis
L
García-Fernández
Cyril
C
Herbivo
Verónica San Miguel
VS
Arranz
David
D
Warther
Loïc
L
Donato
Alexandre
A
Specht
Aránzazu
A
del Campo
D008027:Light; D009574:Nitro Compounds / Q000737:chemistry; D055668:Photochemical Processes; D058105:Polymerization; D011108:Polymers / Q000737:chemistry*
D009574:Nitro Compounds; D011108:Polymers
caged compounds; photoremovable groups; photoresist; photosensitive polymers; wavelength selectivity