title: Sub-15-nm patterning of asymmetric metal electrodes and devices by adhesion lithography.
abstract: Coplanar electrodes formed from asymmetric metals separated on the nanometre length scale are essential elements of nanoscale photonic and electronic devices. Existing fabrication methods typically involve electron-beam lithography--a technique that enables high fidelity patterning but suffers from significant limitations in terms of low throughput, poor scalability to large areas and restrictive choice of substrate and electrode materials. Here, we describe a versatile method for the rapid fabrication of asymmetric nanogap electrodes that exploits the ability of selected self-assembled monolayers to attach conformally to a prepatterned metal layer and thereby weaken adhesion to a subsequently deposited metal film. The method may be carried out under ambient conditions using simple equipment and a minimum of processing steps, enabling the rapid fabrication of nanogap electrodes and optoelectronic devices with aspect ratios in excess of 100,000.
authors.affiliation: 1] Department of Physics, Imperial College London, Prince Consort Road, South Kensington, London SW7 2AZ, UK [2] Department of Chemistry, Imperial College London, Exhibition Road, South Kensington, London SW7 2AZ, UK [3].
authors.forename: David J
authors.initials: DJ
authors.lastname: Beesley
authors.affiliation: 1] Department of Physics, Imperial College London, Prince Consort Road, South Kensington, London SW7 2AZ, UK [2].
authors.forename: James
authors.initials: J
authors.lastname: Semple
authors.affiliation: Division of Physical Sciences and Engineering, Solar and Photovoltaic Engineering Research, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia.
authors.forename: Lethy
authors.initials: L
authors.lastname: Krishnan Jagadamma
authors.affiliation: Division of Physical Sciences and Engineering, Solar and Photovoltaic Engineering Research, King Abdullah University of Science and Technology (KAUST), Thuwal 23955-6900, Saudi Arabia.
authors.forename: Aram
authors.initials: A
authors.lastname: Amassian
authors.affiliation: Department of Materials, Imperial College London, Exhibition Road, South Kensington, London SW7 2AZ, UK.
authors.forename: Martyn A
authors.initials: MA
authors.lastname: McLachlan
authors.affiliation: Department of Physics, Imperial College London, Prince Consort Road, South Kensington, London SW7 2AZ, UK.
authors.forename: Thomas D
authors.initials: TD
authors.lastname: Anthopoulos
authors.affiliation: Department of Chemistry, Imperial College London, Exhibition Road, South Kensington, London SW7 2AZ, UK.
authors.forename: John C
authors.initials: JC
authors.lastname: deMello