title: Large scale low cost fabrication of diameter controllable silicon nanowire arrays.
abstract: We report on a novel solution etching method to fabricate vertically aligned aperiodic silicon nanowire (SiNW) arrays. We begin with a simple dewetting process to fabricate a monolayer of well-spaced metal particles in situ on a silicon wafer. The particles function as a sacrificial template to pattern a Ti/Au catalyst film into a metal mesh and the size of particles directly determines the diameter of SiNW. A conventional metal-assisted chemical etching process is then carried out with the obtained metal mesh as a catalyst to realize a vertically aligned SiNW array at a large scale and low cost.
authors.affiliation: Nanoelectronics Centre of Excellence, School of Electrical and Electronic Engineering, Nanyang Technological University, Singapore.
authors.forename: Leimeng
authors.initials: L
authors.lastname: Sun
authors.forename: Yu
authors.initials: Y
authors.lastname: Fan
authors.forename: Xinghui
authors.initials: X
authors.lastname: Wang
authors.forename: Rahmat
authors.initials: R
authors.lastname: Agung Susantyoko
authors.forename: Qing
authors.initials: Q
authors.lastname: Zhang