title: Microscopically-tuned band structure of epitaxial graphene through interface and stacking variations using Si substrate microfabrication.
abstract: Graphene exhibits unusual electronic properties, caused by a linear band structure near the Dirac point. This band structure is determined by the stacking sequence in graphene multilayers. Here we present a novel method of microscopically controlling the band structure. This is achieved by epitaxy of graphene on 3C-SiC(111) and 3C-SiC(100) thin films grown on a 3D microfabricated Si(100) substrate (3D-GOS (graphene on silicon)) by anisotropic etching, which produces Si(111) microfacets as well as major Si(100) microterraces. We show that tuning of the interface between the graphene and the 3C-SiC microfacets enables microscopic control of stacking and ultimately of the band structure of 3D-GOS, which is typified by the selective emergence of semiconducting and metallic behaviours on the (111) and (100) portions, respectively. The use of 3D-GOS is thus effective in microscopically unlocking various potentials of graphene depending on the application target, such as electronic or photonic devices.
authors.affiliation: 1] Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aobaku-ku, Sendai, Miyagi 980-8577, Japan [2] Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, 5-7, Goban-cho, Chiyoda-ku, Tokyo 102-0076, Japan.
authors.forename: Hirokazu
authors.initials: H
authors.lastname: Fukidome
authors.affiliation: Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aobaku-ku, Sendai, Miyagi 980-8577, Japan.
authors.forename: Takayuki
authors.initials: T
authors.lastname: Ide
authors.affiliation: School of Engineering, Tohoku University, 6-6-01, Aramaki, Aoba-ku, Sendai 980-8578, Japan.
authors.forename: Yusuke
authors.initials: Y
authors.lastname: Kawai
authors.affiliation: Department of Applied Chemistry, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Tokyo 113-8656, Japan.
authors.forename: Toshihiro
authors.initials: T
authors.lastname: Shinohara
authors.affiliation: 1] Department of Applied Chemistry, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Tokyo 113-8656, Japan [2] Synchrotron Radiation Research Organization, The University of Tokyo, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan.
authors.forename: Naoka
authors.initials: N
authors.lastname: Nagamura
authors.affiliation: 1] Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, 5-7, Goban-cho, Chiyoda-ku, Tokyo 102-0076, Japan [2] Department of Applied Chemistry, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Tokyo 113-8656, Japan [3] Synchrotron Radiation Research Organization, The University of Tokyo, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan.
authors.forename: Koji
authors.initials: K
authors.lastname: Horiba
authors.affiliation: JASRI/SPring-8, 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan.
authors.forename: Masato
authors.initials: M
authors.lastname: Kotsugi
authors.affiliation: JASRI/SPring-8, 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan.
authors.forename: Takuo
authors.initials: T
authors.lastname: Ohkochi
authors.affiliation: JASRI/SPring-8, 1-1-1 Kouto, Sayo, Hyogo 679-5198, Japan.
authors.forename: Toyohiko
authors.initials: T
authors.lastname: Kinoshita
authors.affiliation: Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization, Ibaraki 305-0801, Japan.
authors.forename: Hiroshi
authors.initials: H
authors.lastname: Kumighashira
authors.affiliation: 1] Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, 5-7, Goban-cho, Chiyoda-ku, Tokyo 102-0076, Japan [2] Department of Applied Chemistry, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Tokyo 113-8656, Japan [3] Synchrotron Radiation Research Organization, The University of Tokyo, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, Japan.
authors.forename: Masaharu
authors.initials: M
authors.lastname: Oshima
authors.affiliation: 1] Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aobaku-ku, Sendai, Miyagi 980-8577, Japan [2] Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, 5-7, Goban-cho, Chiyoda-ku, Tokyo 102-0076, Japan.
authors.forename: Maki
authors.initials: M
authors.lastname: Suemitsu