title: Modeling of multiple-optical-axis pattern-integrated interference lithography systems.
abstract: The image quality and collimation in a multiple-optical-axis pattern-integrated interference lithography system are evaluated for an elementary optical system composed of single-element lenses. Image quality and collimation are individually and jointly optimized for these lenses. Example images for a jointly optimized system are simulated using a combination of ray tracing and Fourier analysis. Even with these nonoptimized components, reasonable fidelity is shown to be possible.
authors.forename: Donald E
authors.initials: DE
authors.lastname: Sedivy
authors.forename: Thomas K
authors.initials: TK
authors.lastname: Gaylord