title: Fabrication and characterization of a deep ultraviolet wire grid polarizer with a chromium-oxide subwavelength grating.
abstract: A wire grid polarizer comprised of chromium oxide is designed for a micro-lithography system using an ArF excimer laser. Optical properties for some material candidates are calculated using a rigorous coupled-wave analysis. The chromium oxide wire grid polarizer with a 90 nm period is fabricated by a double-patterning technique using KrF lithography and dry etching. The extinction ratio of the grating is greater than 20 dB (100:1) at a wavelength of 193 nm. Differences between the calculated and experimental results are discussed.
authors.forename: Kosuke
authors.initials: K
authors.lastname: Asano
authors.forename: Satoshi
authors.initials: S
authors.lastname: Yokoyama
authors.forename: Atsushi
authors.initials: A
authors.lastname: Kemmochi
authors.forename: Toyohiko
authors.initials: T
authors.lastname: Yatagai