title: RF-MEMS Load Sensors with Enhanced Q-factor and Sensitivity in a Suspended Architecture.
abstract: In this paper, we present and demonstrate RF-MEMS load sensors designed and fabricated in a suspended architecture that increases their quality-factor (Q-factor), accompanied with an increased resonance frequency shift under load. The suspended architecture is obtained by removing silicon under the sensor. We compare two sensors that consist of 195 μm × 195 μm resonators, where all of the resonator features are of equal dimensions, but one's substrate is partially removed (suspended architecture) and the other's is not (planar architecture). The single suspended device has a resonance of 15.18 GHz with 102.06 Q-factor whereas the single planar device has the resonance at 15.01 GHz and an associated Q-factor of 93.81. For the single planar device, we measured a resonance frequency shift of 430 MHz with 3920 N of applied load, while we achieved a 780 MHz frequency shift in the single suspended device. In the planar triplet configuration (with three devices placed side by side on the same chip, with the two outmost ones serving as the receiver and the transmitter), we observed a 220 MHz frequency shift with 3920 N of applied load while we obtained a 340 MHz frequency shift in the suspended triplet device with 3920 N load applied. Thus, the single planar device exhibited a sensitivity level of 0.1097 MHz/N while the single suspended device led to an improved sensitivity of 0.1990 MHz/N. Similarly, with the planar triplet device having a sensitivity of 0.0561 MHz/N, the suspended triplet device yielded an enhanced sensitivity of 0.0867 MHz/N.
authors.affiliation: Departments of Electrical Engineering and Physics, Nanotechnology Research Center, and Institute of Materials Science and Nanotechnology, Bilkent University, Ankara, 06800, Turkey.
authors.forename: Rohat
authors.initials: R
authors.lastname: Melik
authors.affiliation: Departments of Electrical Engineering and Physics, Nanotechnology Research Center, and Institute of Materials Science and Nanotechnology, Bilkent University, Ankara, 06800, Turkey.
authors.forename: Emre
authors.initials: E
authors.lastname: Unal
authors.affiliation: Departments of Electrical Engineering and Physics, Nanotechnology Research Center, and Institute of Materials Science and Nanotechnology, Bilkent University, Ankara, 06800, Turkey.
authors.forename: Nihan Kosku
authors.initials: NK
authors.lastname: Perkgoz
authors.affiliation: Department of Mechanical Engineering, Orthopaedic Bioengineering Research Laboratory, Colorado State University, Fort Collins, CO 80523, USA.
authors.forename: Christian
authors.initials: C
authors.lastname: Puttlitz
authors.affiliation: Departments of Electrical Engineering and Physics, Nanotechnology Research Center, and Institute of Materials Science and Nanotechnology, Bilkent University, Ankara, 06800, Turkey.
authors.forename: Hilmi Volkan
authors.initials: HV
authors.lastname: Demir
keywords: Fabrication; IC; RF-MEMS; bio-implant; quality-factor; resonance frequency shift