title: A novel method for photolithographic polymer shadow masking: toward high-resolution high-performance top-contact organic field effect transistors.
abstract: A novel and universal method, based on water-soluble poly(4-styrene sulfonate), was introduced into the preparation of a polymer mask. Using this mask, high-resolution, high-performance, bottom-gate, top-contact OFETs can be achieved. There is no solvent intervention in the process of manufacturing these OFETs and the mask can be recycled.
authors.affiliation: Beijing National Laboratory for Molecular Science, Key Laboratory of Organic Solids, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China. huwp@iccas.ac.cn ljiang@iccas.ac.cn.
authors.forename: Deyang
authors.initials: D
authors.lastname: Ji
authors.forename: Longfeng
authors.initials: L
authors.lastname: Jiang
authors.forename: Lang
authors.initials: L
authors.lastname: Jiang
authors.forename: Xiaolong
authors.initials: X
authors.lastname: Fu
authors.forename: Huanli
authors.initials: H
authors.lastname: Dong
authors.forename: Junsheng
authors.initials: J
authors.lastname: Yu
authors.forename: Wenping
authors.initials: W
authors.lastname: Hu