title: Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths.
abstract: Manufacturing efficient and broadband optics is of high technological importance for various applications in all wavelength regimes. Particularly in the extreme ultraviolet and soft x-ray spectra, this becomes challenging due to the involved atomic absorption edges that rapidly change the optical constants in these ranges. Here we demonstrate a new interference lithography grating mask that can be used for nanopatterning in this spectral range. We demonstrate photolithography with cutting-edge resolution at 6.5 and 13.5 nm wavelengths, relevant to the semiconductor industry, as well as using 2.5 and 4.5 nm wavelength for patterning thick photoresists and fabricating high-aspect-ratio metal nanostructures for plasmonics and sensing applications.
authors: Nassir
authors: N
authors: Mojarad
authors: Daniel
authors: D
authors: Fan
authors: Jens
authors: J
authors: Gobrecht
authors: Yasin
authors: Y
authors: Ekinci