title: Extreme strain rate and temperature dependence of the mechanical properties of nano silicon nitride thin layers in a basal plane under tension: a molecular dynamics study.
abstract: Molecular dynamics simulations are performed to clarify the extreme strain rate and temperature dependence of the mechanical behaviors of nano silicon nitride thin layers in a basal plane under tension. It is found that fracture stresses show almost no change with increasing strain rate. However, fracture strains decrease gradually due to the appearance of additional N(2c)-Si bond breaking defects in the deformation process. With increasing loading temperature, there is a noticeable drop in fracture stress and fracture strain. In the low temperature range, roughness phases can be observed owing to a combination of factors such as configuration evolution and energy change.
authors: State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China. hjwang@mail.xjtu.edu.cn.
authors: Xuefeng
authors: X
authors: Lu
authors: Hongjie
authors: H
authors: Wang
authors: Yin
authors: Y
authors: Wei
authors: Jiangbo
authors: J
authors: Wen
authors: Min
authors: M
authors: Niu
authors: Shuhai
authors: S
authors: Jia