title: Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics.
abstract: Although diffractive optics have played a major role in nanoscale soft X-ray imaging, high-resolution and high-efficiency diffractive optics have largely been unavailable for hard X-rays where many scientific, technological and biomedical applications exist. This is owing to the long-standing challenge of fabricating ultra-high aspect ratio high-resolution dense nanostructures. Here we report significant progress in ultra-high aspect ratio nanofabrication of high-resolution, dense silicon nanostructures using vertical directionality controlled metal-assisted chemical etching. The resulting structures have very smooth sidewalls and can be used to pattern arbitrary features, not limited to linear or circular. We focus on the application of X-ray zone plate fabrication for high-efficiency, high-resolution diffractive optics, and demonstrate the process with linear, circular, and spiral zone plates. X-ray measurements demonstrate high efficiency in the critical outer layers. This method has broad applications including patterning for thermoelectric materials, battery anodes and sensors among others.
authors: SLAC National Accelerator Laboratory, Stanford Synchrotron Radiation Lightsource, 2575 Sand Hill Road MS69, Menlo Park, California 94025, USA.
authors: Chieh
authors: C
authors: Chang
authors: SLAC National Accelerator Laboratory, Stanford Synchrotron Radiation Lightsource, 2575 Sand Hill Road MS69, Menlo Park, California 94025, USA.
authors: Anne
authors: A
authors: Sakdinawat