title: Electrochemical dynamics of nanoscale metallic inclusions in dielectrics.
abstract: Nanoscale metal inclusions in or on solid-state dielectrics are an integral part of modern electrocatalysis, optoelectronics, capacitors, metamaterials and memory devices. The properties of these composite systems strongly depend on the size, dispersion of the inclusions and their chemical stability, and are usually considered constant. Here we demonstrate that nanoscale inclusions (for example, clusters) in dielectrics dynamically change their shape, size and position upon applied electric field. Through systematic in situ transmission electron microscopy studies, we show that fundamental electrochemical processes can lead to universally observed nucleation and growth of metal clusters, even for inert metals like platinum. The clusters exhibit diverse dynamic behaviours governed by kinetic factors including ion mobility and redox rates, leading to different filament growth modes and structures in memristive devices. These findings reveal the microscopic origin behind resistive switching, and also provide general guidance for the design of novel devices involving electronics and ionics.
authors: Department of Electrical Engineering and Computer Science, the University of Michigan, Ann Arbor, Michigan 48109, USA.
authors: Yuchao
authors: Y
authors: Yang
authors: 1] Department of Materials Science and Engineering, the University of Michigan, Ann Arbor, Michigan 48109, USA [2].
authors: Peng
authors: P
authors: Gao
authors: Department of Materials Science and Engineering, the University of Michigan, Ann Arbor, Michigan 48109, USA.
authors: Linze
authors: L
authors: Li
authors: Department of Materials Science and Engineering, the University of Michigan, Ann Arbor, Michigan 48109, USA.
authors: Xiaoqing
authors: X
authors: Pan
authors: Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, 52074 Aachen, Germany.
authors: Stefan
authors: S
authors: Tappertzhofen
authors: Department of Electrical Engineering and Computer Science, the University of Michigan, Ann Arbor, Michigan 48109, USA.
authors: ShinHyun
authors: S
authors: Choi
authors: 1] Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, 52074 Aachen, Germany [2] Peter Grünberg Institute 7, Research Centre Jülich GmbH, 52425 Jülich, Germany.
authors: Rainer
authors: R
authors: Waser
authors: 1] Institut für Werkstoffe der Elektrotechnik II, RWTH Aachen University, 52074 Aachen, Germany [2] Peter Grünberg Institute 7, Research Centre Jülich GmbH, 52425 Jülich, Germany.
authors: Ilia
authors: I
authors: Valov
authors: Department of Electrical Engineering and Computer Science, the University of Michigan, Ann Arbor, Michigan 48109, USA.
authors: Wei D
authors: WD
authors: Lu