title: Si-nanowire-based multistage delayed Mach-Zehnder interferometer optical MUX/DeMUX fabricated by an ArF-immersion lithography process on a 300 mm SOI wafer.
abstract: We report good phase controllability and high production yield in Si-nanowire-based multistage delayed Mach-Zehnder interferometer-type optical multiplexers/demultiplexers (MUX/DeMUX) fabricated by an ArF-immersion lithography process on a 300 mm silicon-on-insulator (SOI) wafer. Three kinds of devices fabricated in this work exhibit clear 1×4 Ch wavelength filtering operations for various optical frequency spacing. These results are promising for their applications in high-density wavelength division multiplexing-based optical interconnects.
authors: Seok-Hwan
authors: SH
authors: Jeong
authors: Daisuke
authors: D
authors: Shimura
authors: Takasi
authors: T
authors: Simoyama
authors: Tsuyoshi
authors: T
authors: Horikawa
authors: Yu
authors: Y
authors: Tanaka
authors: Ken
authors: K
authors: Morito