title: Performance of ultra-thin SOI-based resonators for sensing applications.
abstract: This work presents simulation and experimental results of ultra-thin optical ring resonators, having larger Evanescent Field (EF) penetration depths, and therefore larger sensitivities, as compared to conventional Silicon-on-Insulator (SOI)-based resonator sensors. Having higher sensitivities to the changes in the refractive indices of the cladding media is desirable for sensing applications, as the interactions of interest take place in this region. Using ultra-thin waveguides (<100 nm thick) shows promise to enhance sensitivity for both bulk and surface sensing, due to increased penetration of the EF into the cladding. In this work, the designs and characterization of ultra-thin resonator sensors, within the constraints of a multi-project wafer service that offers three waveguide thicknesses (90 nm, 150 nm, and 220 nm), are presented. These services typically allow efficient integration of biosensors with on-chip detectors, moving towards the implementation of lab-on-chip (LoC) systems. Also, higher temperature stability of ultra-thin resonator sensors were characterized and, in the presence of intentional environmental (temperature) fluctuations, were compared to standard transverse electric SOI-based resonator sensors.
authors: Sahba Talebi
authors: ST
authors: Fard
authors: Valentina
authors: V
authors: Donzella
authors: Shon A
authors: SA
authors: Schmidt
authors: Jonas
authors: J
authors: Flueckiger
authors: Samantha M
authors: SM
authors: Grist
authors: Pouria
authors: P
authors: Talebi Fard
authors: Yichen
authors: Y
authors: Wu
authors: Rick J
authors: RJ
authors: Bojko
authors: Ezra
authors: E
authors: Kwok
authors: Nicolas A F
authors: NA
authors: Jaeger
authors: Daniel M
authors: DM
authors: Ratner
authors: Lukas
authors: L
authors: Chrostowski