title: Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325  nm and its spatial resolution limit.
abstract: In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples.
authors: D
authors: D
authors: Sáez-Rodríguez
authors: K
authors: K
authors: Nielsen
authors: O
authors: O
authors: Bang
authors: D J
authors: DJ
authors: Webb