title: Fabrication of sub-20 nm nanopore arrays in membranes with embedded metal electrodes at wafer scales.
abstract: We introduce a method to fabricate solid-state nanopores with sub-20 nm diameter in membranes with embedded metal electrodes across a 200 mm wafer using CMOS compatible semiconductor processes. Multi-layer (metal-dielectric) structures embedded in membranes were demonstrated to have high uniformity (± 0.5 nm) across the wafer. Arrays of nanopores were fabricated with an average size of 18 ± 2 nm in diameter using a Reactive Ion Etching (RIE) method in lieu of TEM drilling. Shorts between the membrane-embedded metals were occasionally created after pore formation, but the RIE based pores had a much better yield (99%) of unshorted electrodes compared to TEM drilled pores (<10%). A double-stranded DNA of length 1 kbp was translocated through the multi-layer structure RIE-based nanopore demonstrating that the pores were open. The ionic current through the pore can be modulated with a gain of 3 using embedded electrodes functioning as a gate in 0.1 mM KCl aqueous solution. This fabrication approach can potentially pave the way to manufacturable nanopore arrays with the ability to electrically control the movement of single or double-stranded DNA inside the pore with embedded electrodes.
authors: IBM T. J. Watson Research Center, 1101 Kitchawan Road, Yorktown Heights, NY 10598, USA. gustavo@us.ibm.com.
authors: Jingwei
authors: J
authors: Bai
authors: Deqiang
authors: D
authors: Wang
authors: Sung-Wook
authors: SW
authors: Nam
authors: Hongbo
authors: H
authors: Peng
authors: Robert
authors: R
authors: Bruce
authors: Lynn
authors: L
authors: Gignac
authors: Markus
authors: M
authors: Brink
authors: Ernst
authors: E
authors: Kratschmer
authors: Stephen
authors: S
authors: Rossnagel
authors: Phil
authors: P
authors: Waggoner
authors: Kathleen
authors: K
authors: Reuter
authors: Chao
authors: C
authors: Wang
authors: Yann
authors: Y
authors: Astier
authors: Venkat
authors: V
authors: Balagurusamy
authors: Binquan
authors: B
authors: Luan
authors: Young
authors: Y
authors: Kwark
authors: Eric
authors: E
authors: Joseph
authors: Mike
authors: M
authors: Guillorn
authors: Stanislav
authors: S
authors: Polonsky
authors: Ajay
authors: A
authors: Royyuru
authors: S
authors: S
authors: Papa Rao
authors: Gustavo
authors: G
authors: Stolovitzky
mesh_terms: D004247:DNA / Q000737:chemistry; D004563:Electrochemistry; D004566:Electrodes; D007477:Ions; D008422:Materials Testing; D053768:Metal Nanoparticles / Q000737:chemistry*; D008670:Metals / Q000737:chemistry*; D008855:Microscopy, Electron, Scanning; D046529:Microscopy, Electron, Transmission; D058608:Nanopores; D036103:Nanotechnology; D010100:Oxygen / Q000737:chemistry; D011189:Potassium Chloride / Q000737:chemistry
chemical_list: D007477:Ions; D008670:Metals; D011189:Potassium Chloride; D004247:DNA; D010100:Oxygen