title: The seeded growth of graphene.
abstract: In this paper, we demonstrate the seeded growth of graphene under a plasma chemical vapor deposition condition. First, we fabricate graphene nanopowders (~5 nm) by ball-milling commercial multi-wall carbon nanotubes. The graphene nanoparticles were subsequently subject to a direct current plasma generated in a 100 Torr 10%CH4 - 90%H2 gas mixture. The plasma growth enlarged, over one hour, the nuclei to graphene sheets larger than one hundred nm(2) in area. Characterization by electron and X-ray diffraction, high-resolution transmission electron microscopy images provide evidence for the presence of monolayer graphene sheets.
authors.affiliation: Interface Control Research Center, Korea Institute of Science and Technology (KIST), Seoul 130-650, Korea.
authors.forename: Jae-Kap
authors.initials: JK
authors.lastname: Lee
authors.affiliation: 1] Interface Control Research Center, Korea Institute of Science and Technology (KIST), Seoul 130-650, Korea [2] Department of Semiconductor Science, Dongguk University, Seoul 100-715, Korea.
authors.forename: Sohyung
authors.initials: S
authors.lastname: Lee
authors.affiliation: Korea Research Institute of Standards and Science, Daejeon 305-600, Korea.
authors.forename: Yong-Il
authors.initials: YI
authors.lastname: Kim
authors.affiliation: Division of Electron Microscopic Research, Korea Basic Science Institute, Daejeon 305-333, Korea.
authors.forename: Jin-Gyu
authors.initials: JG
authors.lastname: Kim
authors.affiliation: Center for Spintronics Research, KIST, Seoul 130-650, Korea.
authors.forename: Bong-Ki
authors.initials: BK
authors.lastname: Min
authors.affiliation: Instrumental Analysis Center, Yeungnam University, Daegu 712-749, Korea.
authors.forename: Kyung-Il
authors.initials: KI
authors.lastname: Lee
authors.affiliation: Interface Control Research Center, Korea Institute of Science and Technology (KIST), Seoul 130-650, Korea.
authors.forename: Yeseul
authors.initials: Y
authors.lastname: Park
authors.affiliation: School of Engineering and Physical Sciences, Heriot-Watt University, Edinburgh EH14 4AS, UK.
authors.forename: Phillip
authors.initials: P
authors.lastname: John