title: Mechanistic modeling of vacuum UV advanced oxidation process in an annular photoreactor.
abstract: A novel mechanistic model that describes the vacuum UV advanced oxidation process in an annular photoreactor initiated by 172 nm and 185 nm (in combination with 253.7 nm, with and without exogenous H2O2) is presented in this paper. The model was developed from first principles by incorporating the vacuum UV-AOP kinetics into the theoretical framework of in-series continuous flow stirred tank reactors. After conducting a sensitivity analysis, model predictions were compared against experiments conducted under a variety of conditions: (a) photo-induced formation of hydrogen peroxide by water photolysis at 172 nm (for both air- and oxygen-saturated conditions); (b) photo-induced formation of hydrogen peroxide by water photolysis at 185 + 253.7 nm (in the presence of formic acid, with and without the initial addition of hydrogen peroxide); (c) direct photolysis of hydrogen peroxide by 253.7 nm; (d) degradation of formic acid by 185 + 253.7 nm (with and without initial addition of hydrogen peroxide); and (e) degradation of formic acid by 253.7 nm (with the addition of exogenous hydrogen peroxide). In all cases, the model was able to accurately predict the time-dependent profiles of hydrogen peroxide and formic acid concentrations. Two newly recognized aspects associated with water photolysis were identified through the use of the validated model. Firstly, unlike the 185 nm and 253.7 nm cases, water photolysis by the 172 nm wavelength revealed a depth of photoactive water layer an order of magnitude greater (∼230-390 μm, depending on the specific operating conditions) than the 1-log photon penetration layer (∼18 μm). To further investigate this potentially very important finding, a computational fluid dynamics model was set up to assess the role of transport mechanisms and species distributions within the photoreactor annulus. The model confirmed that short-lived hydroxyl radicals were present at a radial distance far beyond the ∼18 μm photon penetration layer. Secondly, kinetic simulations showed that the higher penetration depth of hydroxyl radicals was not caused by diffusive or convective transport phenomena but rather the effect of non-linear behavior of the complex reaction kinetics involved in the process.
authors: Western University, 1151 Richmond St., London, ON N6A 3K7, Canada. Electronic address: f.crapulli@fastwebnet.it.
authors: F
authors: F
authors: Crapulli
authors: Western University, 1151 Richmond St., London, ON N6A 3K7, Canada; Trojan Technologies, 3020 Gore Rd., London, ON N5V 4T7, Canada.
authors: D
authors: D
authors: Santoro
authors: Trojan Technologies, 3020 Gore Rd., London, ON N5V 4T7, Canada.
authors: M R
authors: MR
authors: Sasges
authors: Western University, 1151 Richmond St., London, ON N6A 3K7, Canada.
authors: A K
authors: AK
authors: Ray
mesh_terms: D005561:Formates / Q000737:chemistry; D006861:Hydrogen Peroxide / Q000737:chemistry*; D017665:Hydroxyl Radical / Q000737:chemistry; D007700:Kinetics; D008962:Models, Theoretical; D010084:Oxidation-Reduction; D010782:Photolysis; D014466:Ultraviolet Rays; D014618:Vacuum; D014867:Water / Q000737:chemistry*
chemical_list: D005561:Formates; D014867:Water; C030544:formic acid; D017665:Hydroxyl Radical; D006861:Hydrogen Peroxide
keywords: Advanced oxidation process; Hydroxyl radical; Numerical modeling; Vacuum UV; Water photolysis