title: Study on the optical property and surface morphology of N doped TiO₂ film deposited with different N₂ flow rates by DCPMS.
abstract: N doped TiO2 films were deposited by direct current pulse magnetron sputtering system at room temperature. By using UV-Vis spectrophotometer and atomic force microscope, we studied the influence of N2 flow rate on the optical property and surface morphology of films. The results indicate that the optical property and surface morphology of N doped TiO2 film was dominated by the N2 flow rate. The mean absorbency in visible range of pure TiO2 films is near to 0%, which means that the pure TiO2 could hardly display the photocatalytic property in visible range. When N2 flow rate is 2 sccm, the mean absorbency in visible range of N doped TiO2 film could reach at 24%. In this case, the film could be used as photocatalyst induced by visible light. While with increasing N2 flow rate, the mean absorbency in visible range of N doped TiO2 film decreased abruptly. Especially when N2 flow rate exceeded 8 sccm, the mean absorbency in visible range of N doped TiO2 film decreased to about 0%, which is like pure TiO2 fimls.
authors: School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China.
authors: Honglin
authors: H
authors: Liu
authors: School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China.
authors: Tingting
authors: T
authors: Yao
authors: School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China; Liaoning Province Education Department Engineering Research Center of Optoelectronic Materials and Device, Dalian 116028, China; Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Dalian University of Technology, Ministry of Education, Dalian 116028, China. Electronic address: dwysd_2000@163.com.
authors: Wanyu
authors: W
authors: Ding
authors: School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China; Liaoning Province Education Department Engineering Research Center of Optoelectronic Materials and Device, Dalian 116028, China.
authors: Hualin
authors: H
authors: Wang
authors: Department of Material Science and Engineering, Saitama Institute of Technology, Fukaya 369-0293, Japan.
authors: Dongying
authors: D
authors: Ju
authors: School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China; Liaoning Province Education Department Engineering Research Center of Optoelectronic Materials and Device, Dalian 116028, China.
authors: Weiping
authors: W
authors: Chai
mesh_terms: D004560:Electricity; D018625:Microscopy, Atomic Force; D009584:Nitrogen / Q000737:chemistry; D055620:Optical Phenomena; D012212:Rheology / Q000379:methods; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry
chemical_list: C009495:titanium dioxide; D014025:Titanium; D009584:Nitrogen
keywords: N doped TiO(2) film; magnetron sputtering; optical property; surface morphology