title: Three-dimensional photonic crystals created by single-step multi-directional plasma etching.
abstract: We fabricate 3D photonic nanostructures by simultaneous multi-directional plasma etching. This simple and flexible method is enabled by controlling the ion-sheath in reactive-ion-etching equipment. We realize 3D photonic crystals on single-crystalline silicon wafers and show high reflectance (>95%) and low transmittance (<-15dB) at optical communication wavelengths, suggesting the formation of a complete photonic bandgap. Moreover, our method simply demonstrates Si-based 3D photonic crystals that show the photonic bandgap effect in a shorter wavelength range around 0.6 μm, where further fine structures are required.
authors.forename: Katsuyoshi
authors.initials: K
authors.lastname: Suzuki
authors.forename: Keisuke
authors.initials: K
authors.lastname: Kitano
authors.forename: Kenji
authors.initials: K
authors.lastname: Ishizaki
authors.forename: Susumu
authors.initials: S
authors.lastname: Noda