title: Controllable atmospheric pressure growth of mono-layer, bi-layer and tri-layer graphene.
abstract: Here we report a three-step growth method for high-quality mono-layer, bi-layer and tri-layer graphene with coverage ~90% at atmospheric pressure. The growth temperature and gas flow rate have been found to be the key factors. This method would be of great importance for the large scale production of graphene with defined thickness.
authors.affiliation: Key Laboratory of Molecular Nanostructure and Nanotechnology and Beijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences (CAS), Beijing 100190, P.R. China. wangd@iccas.ac.cn wanlijun@iccas.ac.cn.
authors.forename: Jing
authors.initials: J
authors.lastname: Li
authors.forename: Hengxing
authors.initials: H
authors.lastname: Ji
authors.forename: Xing
authors.initials: X
authors.lastname: Zhang
authors.forename: Xuanyun
authors.initials: X
authors.lastname: Wang
authors.forename: Zhi
authors.initials: Z
authors.lastname: Jin
authors.forename: Dong
authors.initials: D
authors.lastname: Wang
authors.forename: Li-Jun
authors.initials: LJ
authors.lastname: Wan