title: Holographic patterning of graphene-oxide films by light-driven reduction.
abstract: We report on the patterning and reduction of graphene-oxide films by holographic lithography. Light reduction can be used to engineer low-cost graphene-based devices by performing a local conversion of insulating oxide into the conductive graphene. In this work, computer-generated holograms have been exploited to realize complex graphene patterns in a single shot, different from serial laser writing or mask-based photolithographic processes. The technique has been further improved by achieving speckle noise reduction: submicron and diffraction-limited features have been obtained. In addition we have also demonstrated that the gray-scale lithography capability can be used to obtain different reduction levels in a single exposure.
authors.forename: E
authors.initials: E
authors.lastname: Orabona
authors.forename: A
authors.initials: A
authors.lastname: Ambrosio
authors.forename: A
authors.initials: A
authors.lastname: Longo
authors.forename: G
authors.initials: G
authors.lastname: Carotenuto
authors.forename: L
authors.initials: L
authors.lastname: Nicolais
authors.forename: P
authors.initials: P
authors.lastname: Maddalena