title: Chemical pattern on silica surface prepared by UV irradiation of 3-mercaptopropyltriethoxy silane layer: surface characterization and fibrinogen adsorption.
abstract: A flat silica surface modified with 3-mercaptopropyltriethoxy silane (MTS) was patterned using UV irradiation and a custom-designed mask. The irradiated surface was characterized by X-ray photoelectron spectroscopy (XPS), scanning force microscopy (SFM) and water contact angle measurements. The XPS S2p spectra indicated that the UV treatment resulted in the oxidation of MTS sulfur. The optimal UV irradiation dose for patterning, estimated from the XPS S2p binding energy shifts and water contact angles of irradiated surfaces, was 4.8 J cm-2at 270 nm. The surface patterns were visualized by total internal reflection fluorescence microscopy, while exposing the pattern to a solution of acridine orange, by water vapor condensation, and by SFM lateral force imaging in dilute electrolyte solution. The adhesion SFM measurements revealed the adhesion force only on the areas which were not UV-irradiated. The adsorption of fluorescein-labeled fibrinogen (FITC-Fgn) from dilute buffer solution also produced visual information on the pattern. The kinetics of FITC-Fgn adsorption onto the oxidized and unoxidized MTS-silica surfaces from dilute protein solution proceeded with identical initial adsorption rates. The steady-state FITC-Fgn adsorption was twice as large on the unoxidized MTS-silica than on the oxidized MTS-silica surface.
authors.affiliation: Department of Materials Science and Engineering, University of Utah, Salt Lake City, UT84112, USA.
authors.forename: Jie
authors.initials: J
authors.lastname: Liu
authors.affiliation: Department of Materials Science and Engineering, University of Utah, Salt Lake City, UT84112, USA ; Department of Bioengineering, University of Utah, Salt Lake City, UT84112, USA.
authors.forename: Vladimir
authors.initials: V
authors.lastname: Hlady
keywords: 3-Mercaptopropyltriethoxy silane; Fibrinogen adsorption; Modified silica; Scanning force microscopy; Total internal reflection fluorescence microscopy