title: Electron-beam and ion-beam-induced deposited tungsten contacts for carbon nanofiber interconnects.
abstract: Ion-beam-induced deposition (IBID) and electron-beam-induced deposition (EBID) with tungsten (W) are evaluated for engineering electrical contacts with carbon nanofibers (CNFs). While a different tungsten-containing precursor gas is utilized for each technique, the resulting tungsten deposits result in significant contact resistance reduction. The performance of CNF devices with W contacts is examined and conduction across these contacts is analyzed. IBID-W, while yielding lower contact resistance than EBID-W, can be problematic in the presence of on-chip semiconducting devices, whereas EBID-W provides substantial contact resistance reduction that can be further improved by current stressing. Significant differences between IBID-W and EBID-W are observed at the electrode contact interfaces using high-resolution transmission electron microscopy. These differences are consistent with the observed electrical behaviors of their respective test devices.
authors.affiliation: Center for Nanostructures, Santa Clara University, Santa Clara, CA 95053, USA.
authors.forename: Patrick
authors.initials: P
authors.lastname: Wilhite
authors.forename: Hyung Soo
authors.initials: HS
authors.lastname: Uh
authors.forename: Nobuhiko
authors.initials: N
authors.lastname: Kanzaki
authors.forename: Phillip
authors.initials: P
authors.lastname: Wang
authors.forename: Anshul
authors.initials: A
authors.lastname: Vyas
authors.forename: Shusaku
authors.initials: S
authors.lastname: Maeda
authors.forename: Toshishige
authors.initials: T
authors.lastname: Yamada
authors.forename: Cary Y
authors.initials: CY
authors.lastname: Yang