title: Back gated multilayer InSe transistors with enhanced carrier mobilities via the suppression of carrier scattering from a dielectric interface.
abstract: The back gate multilayer InSe FETs exhibit ultrahigh carrier mobilities, surpassing all the reported layer semiconductor based electronics with the same device configuration, which is achieved by the suppression of the carrier scattering from interfacial coulomb impurities or surface polar phonons at the interface of an oxidized dielectric substrate. The room-temperature mobilities of multilayer InSe transistors increase from 64 cm(2)V(-1)s(-1) to 1055 cm(2)V(-1)s(-1) using a bilayer dielectric of poly-(methyl methacrylate) (PMMA)/Al2O3. The transistors also have high current on/off ratios of 1 × 10(8), low standby power dissipation, and robust current saturation in a broad voltage range.
authors.affiliation: State Key Laboratory of Robotics and System, Harbin Institute of Technology, Harbin, 150080, China; School of Materials Science and Engineering, Harbin Institute of Technology, Harbin, 150080, China.
authors.forename: Wei
authors.initials: W
authors.lastname: Feng
authors.forename: Wei
authors.initials: W
authors.lastname: Zheng
authors.forename: Wenwu
authors.initials: W
authors.lastname: Cao
authors.forename: PingAn
authors.initials: P
authors.lastname: Hu
keywords: carrier scatter; field-effect transistor; indium selenide; mobility; two dimensional layer semiconductor