title: Instrumental requirements for the detection of electron beam-induced object excitations at the single atom level in high-resolution transmission electron microscopy.
abstract: This contribution touches on essential requirements for instrument stability and resolution that allows operating advanced electron microscopes at the edge to technological capabilities. They enable the detection of single atoms and their dynamic behavior on a length scale of picometers in real time. It is understood that the observed atom dynamic is intimately linked to the relaxation and thermalization of electron beam-induced sample excitation. Resulting contrast fluctuations are beam current dependent and largely contribute to a contrast mismatch between experiments and theory if not considered. If explored, they open the possibility to study functional behavior of nanocrystals and single molecules at the atomic level in real time.
authors.affiliation: National Center for Electron Microscopy and Joint Center for Artificial Photosynthesis, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, CA 94720, USA.
authors.forename: C
authors.initials: C
authors.lastname: Kisielowski
authors.affiliation: Department of Material Science & Engineering, University of California - Berkeley, Berkeley, CA 94720, USA. Electronic address: specht@berkeley.edu.
authors.forename: P
authors.initials: P
authors.lastname: Specht
authors.affiliation: Department of Material Science & Engineering, University of California - Berkeley, Berkeley, CA 94720, USA.
authors.forename: S M
authors.initials: SM
authors.lastname: Gygax
authors.affiliation: Material Sciences Division, Lawrence Berkeley National Laboratory, One Cyclotron Road, Berkeley, CA 94720, USA.
authors.forename: B
authors.initials: B
authors.lastname: Barton
authors.affiliation: Dept. Fisica, ESFM-IPN, Mexico, DF 07300, Mexico.
authors.forename: H A
authors.initials: HA
authors.lastname: Calderon
authors.affiliation: The DOW Chemical Company, Midland, MI 48667, USA.
authors.forename: J H
authors.initials: JH
authors.lastname: Kang
authors.affiliation: The DOW Chemical Company, Midland, MI 48667, USA.
authors.forename: R
authors.initials: R
authors.lastname: Cieslinski
keywords: Aberration-correction; Catalysis; Functionality; Low dose imaging; Single atom sensitivity; TEM