title: Order-disorder transition and alignment dynamics of a block copolymer under high magnetic fields by in situ x-ray scattering.
abstract: We examine the influence of magnetic fields on the order-disorder transition (ODT) in a liquid crystalline block copolymer. This is motivated by a desire to understand the dynamics of microstructure alignment during field annealing as potentially dictated by selective destabilization of nonaligned material. Temperature resolved scattering across the ODT and time-resolved measurements during isothermal field annealing at sub-ODT temperatures were performed in situ. Strongly textured mesophases resulted in each case but no measurable field-induced shift in T(ODT) was observed. This suggests that selective melting does not play a discernable role in the system's field response. Our data indicate instead that alignment occurs by slow grain rotation within the mesophase. We identify an optimum subcooling that maximizes alignment during isothermal field annealing. This is corroborated by a simple model incorporating the competing effects of an exponentially decreasing mobility and divergent, increasing magnetic anisotropy on cooling below T(ODT). The absence of measurable field effects on T(ODT) is consistent with estimates based on the relative magnitudes of the field interaction energy and the enthalpy associated with the ODT.
authors.affiliation: Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06511, USA.
authors.forename: Manesh
authors.initials: M
authors.lastname: Gopinadhan
authors.affiliation: Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06511, USA.
authors.forename: Paweł W
authors.initials: PW
authors.lastname: Majewski
authors.affiliation: Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06511, USA.
authors.forename: Youngwoo
authors.initials: Y
authors.lastname: Choo
authors.affiliation: Department of Chemical and Environmental Engineering, Yale University, New Haven, Connecticut 06511, USA.
authors.forename: Chinedum O
authors.initials: CO
authors.lastname: Osuji