title: An oxygen-insensitive degradable resist for fabricating metallic patterns on highly curved surfaces by UV-nanoimprint lithography.
abstract: In this paper, an oxygen-insensitive degradable resist for UV-nanoimprint is designed, com-prising a polycyclic degradable acrylate monomer, 2,10-diacryloyloxymethyl-1,4,9,12-tetraoxa-spiro [4.2.4.2] tetradecane (DAMTT), and a multifunctional thiol monomer pentaerythritol tetra(3-mercaptopropionate) (PETMP). The resist can be quickly UV-cured in the air atmosphere and achieve a high monomer conversion of over 98%, which greatly reduce the adhesion force between the resist and the soft mold. High conversion, in company with an adequate Young's modulus (about 1 GPa) and an extremely low shrinkage (1.34%), promises high nanoimprint resolution of sub-50 nm. The cross-linked resist is able to break into linear molecules in a hot acid solvent. As a result, metallic patterns are fabricated on highly curved surfaces via the lift off process without the assistance of a thermoplastic polymer layer.
authors.affiliation: Department of Materials Science and Engineering, College of Engineering and Applied Sciences, Nanjing University, National Laboratory of Solid State Microstructures, Nanjing, 210093, China; School of Chemistry and Materials Engineering, Changshu Institute of Technology, Changshu, 215500, China.
authors.forename: Xin
authors.initials: X
authors.lastname: Hu
authors.forename: Shisong
authors.initials: S
authors.lastname: Huang
authors.forename: Ronghua
authors.initials: R
authors.lastname: Gu
authors.forename: Changsheng
authors.initials: C
authors.lastname: Yuan
authors.forename: Haixiong
authors.initials: H
authors.lastname: Ge
authors.forename: Yanfeng
authors.initials: Y
authors.lastname: Chen
mesh_terms: D008670:Metals / Q000737:chemistry*; D036103:Nanotechnology; D010100:Oxygen / Q000737:chemistry*; D013499:Surface Properties; D014466:Ultraviolet Rays
chemical_list: D008670:Metals; D010100:Oxygen
keywords: curved surface; degradable resist; metallic pattern; nanoimprint; oxygen insensitive