title: Integration of nanoimprint lithography with block copolymer directed self-assembly for fabrication of a sub-20 nm template for bit-patterned media.
abstract: We propose a novel strategy to integrate the nanoimprint lithography (NIL) technique with directed self-assembly (DSA) of block copolymer (BCP) for providing a robust, high-yield, and low-defect-density path to sub-20 nm dense patterning. Through this new NIL-DSA method, UV nanoimprint resist is used as the DSA copolymer pre-pattern to expedite the DSA process. This method was successfully used to fabricate a 1.0 Td in(-2) servo-integrated nanoimprint template for bit-patterned media (BPM) application. The fabricated template was used for UV-cure NIL on a 2.5-inch disk. The imprint resist patterns were further transferred into the underlying CoCrPt magnetic layer through a carbon hard mask using ion beam etching. The successful integration of the NIL technique with the DSA process provides us with a new route to BPM nanofabrication, which includes the following three major advantages: (1) a simpler and faster way to implement DSA for high-density BPM patterning; (2) a novel method for fabricating a high-quality dot pattern template through an iterative imprint-DSA-template procedure; and (3) an uncomplicated integration scheme for implementing non-periodic servo features with BCP patterns, thus accelerating the transition of moving the DSA technique from laboratory research to the BPM manufacturing environment.
authors.affiliation: Media Research Center, Seagate Technology, 47010 Kato Road, Fremont, California 94538, USA.
authors.forename: XiaoMin
authors.initials: X
authors.lastname: Yang
authors.forename: Shuaigang
authors.initials: S
authors.lastname: Xiao
authors.forename: Wei
authors.initials: W
authors.lastname: Hu
authors.forename: Justin
authors.initials: J
authors.lastname: Hwu
authors.forename: René
authors.initials: R
authors.lastname: van de Veerdonk
authors.forename: Koichi
authors.initials: K
authors.lastname: Wago
authors.forename: Kim
authors.initials: K
authors.lastname: Lee
authors.forename: David
authors.initials: D
authors.lastname: Kuo