title: Released micromachined beams utilizing laterally uniform porosity porous silicon.
abstract: Suspended micromachined porous silicon beams with laterally uniform porosity are reported, which have been fabricated using standard photolithography processes designed for compatibility with complementary metal-oxide-semiconductor (CMOS) processes. Anodization, annealing, reactive ion etching, repeated photolithography, lift off and electropolishing processes were used to release patterned porous silicon microbeams on a Si substrate. This is the first time that micromachined, suspended PS microbeams have been demonstrated with laterally uniform porosity, well-defined anchors and flat surfaces.
  81.16.-c; 81.16.Nd; 81.16.Rf.
authors.affiliation: School of Mechanical and Chemical Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia ; School of Electrical, Electronic and Computer Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.
authors.forename: Xiao
authors.initials: X
authors.lastname: Sun
authors.affiliation: School of Mechanical and Chemical Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.
authors.forename: Adrian
authors.initials: A
authors.lastname: Keating
authors.affiliation: School of Electrical, Electronic and Computer Engineering, University of Western Australia, 35 Stirling Hwy, Crawley, Western Australia 6009, Australia.
authors.forename: Giacinta
authors.initials: G
authors.lastname: Parish
keywords: Microbeams; Photolithography; Porous silicon; Release