title: The Patterning of Sub-500 nm Inorganic Oxide Structures.
abstract: Elastomeric perfluoropolyether molds are applied to pattern arrays of sub-500 nm inorganic oxide features. This versatile soft-lithography technique can be used to pattern a wide range of materials; in this work inorganic oxides including TiO2 , SnO2 , ZnO, ITO, and BaTiO3 are patterned on a variety of substrates with different aspect ratios. An example of TiO2 posts is shown in the figure.
authors.affiliation: Department of Chemistry University of North Carolina at Chapel Hill CB #3290, Caudill Labs, Chapel Hill, NC 27599 (USA).
authors.forename: Meredith J
authors.initials: MJ
authors.lastname: Hampton
authors.forename: Stuart S
authors.initials: SS
authors.lastname: Williams
authors.forename: Zhilian
authors.initials: Z
authors.lastname: Zhou
authors.forename: Janine
authors.initials: J
authors.lastname: Nunes
authors.forename: Doo-Hyun
authors.initials: DH
authors.lastname: Ko
authors.forename: Joseph L
authors.initials: JL
authors.lastname: Templeton
authors.forename: Edward T
authors.initials: ET
authors.lastname: Samulski
authors.forename: Joseph M
authors.initials: JM
authors.lastname: DeSimone
keywords: embossing; inorganic oxides; patterning; perfluoropolyether elastomers; polymers; soft lithography