title: Lateral resolution of nanoscaled images delivered by surface-analytical instruments: application of the BAM-L200 certified reference material and related ISO standards.
abstract: The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1-xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface-analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013.
authors.affiliation: BAM Bundesanstalt für Materialforschung und -prüfung, 12200, Berlin, Germany.
authors.forename: M
authors.initials: M
authors.lastname: Senoner
authors.forename: A
authors.initials: A
authors.lastname: Maassdorf
authors.forename: H
authors.initials: H
authors.lastname: Rooch
authors.forename: W
authors.initials: W
authors.lastname: Österle
authors.forename: M
authors.initials: M
authors.lastname: Malcher
authors.forename: M
authors.initials: M
authors.lastname: Schmidt
authors.forename: F
authors.initials: F
authors.lastname: Kollmer
authors.forename: D
authors.initials: D
authors.lastname: Paul
authors.forename: V-D
authors.initials: VD
authors.lastname: Hodoroaba
authors.forename: S
authors.initials: S
authors.lastname: Rades
authors.forename: W E S
authors.initials: WE
authors.lastname: Unger