title: Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer.
abstract: A general concept for parallel near-field photochemical and radiation-induced chemical processes for the fabrication of nanopatterns of a self-assembled monolayer (SAM) of (3-aminopropyl)triethoxysilane (APTES) is explored with three different processes: 1) a near-field photochemical process by photochemical bleaching of a monomolecular layer of dye molecules chemically bound to an APTES SAM, 2) a chemical process induced by oxygen plasma etching as well as 3) a combined near-field UV-photochemical and ozone-induced chemical process, which is applied directly to an APTES SAM. All approaches employ a sandwich configuration of the surface-supported SAM, and a lithographic mask in form of gold nanostructures fabricated through colloidal sphere lithography (CL), which is either exposed to visible light, oxygen plasma or an UV-ozone atmosphere. The gold mask has the function to inhibit the photochemical reactions by highly localized near-field interactions between metal mask and SAM and to inhibit the radiation-induced chemical reactions by casting a highly localized shadow. The removal of the gold mask reveals the SAM nanopattern.
authors.affiliation: Physikalisches Institut, Interface Physics Group, Westfälische Wilhelms-University Münster, Wilhelm Klemm Str. 10, 48149 Münster, Germany.
authors.forename: Ulrich Christian
authors.initials: UC
authors.lastname: Fischer
authors.affiliation: Physikalisches Institut, Interface Physics Group, Westfälische Wilhelms-University Münster, Wilhelm Klemm Str. 10, 48149 Münster, Germany.
authors.forename: Carsten
authors.initials: C
authors.lastname: Hentschel
authors.affiliation: Physikalisches Institut, Interface Physics Group, Westfälische Wilhelms-University Münster, Wilhelm Klemm Str. 10, 48149 Münster, Germany.
authors.forename: Florian
authors.initials: F
authors.lastname: Fontein
authors.affiliation: Physikalisches Institut, Interface Physics Group, Westfälische Wilhelms-University Münster, Wilhelm Klemm Str. 10, 48149 Münster, Germany.
authors.forename: Linda
authors.initials: L
authors.lastname: Stegemann
authors.affiliation: Physikalisches Institut, Interface Physics Group, Westfälische Wilhelms-University Münster, Wilhelm Klemm Str. 10, 48149 Münster, Germany.
authors.forename: Christiane
authors.initials: C
authors.lastname: Hoeppener
authors.affiliation: Physikalisches Institut, Interface Physics Group, Westfälische Wilhelms-University Münster, Wilhelm Klemm Str. 10, 48149 Münster, Germany.
authors.forename: Harald
authors.initials: H
authors.lastname: Fuchs
authors.affiliation: Laboratory of Organic and Macromolecular Chemistry (IOMC) and Jena Center for Soft Matter (JCSM), Friedrich Schiller University, Humboldtstr. 10, 07743 Jena, Germany.
authors.forename: Stefanie
authors.initials: S
authors.lastname: Hoeppener
keywords: colloid lithography; contact lithography; near-field; photochemistry; self-assembled silane monolayers