title: Vertically oriented, three-dimensionally tapered deep-subwavelength metallic nanohole arrays developed by photofluidization lithography.
abstract: The field-gradient, superficial photo fluidization of azomaterials allows a specific 3D nano-silhouette to be shaped over a large area, so as to get easy access to a 3D-tapered, deep sub-wavelength Au nanohole (20 nm spatial size) array. The squeezing of visible light into the deep sub-wavelength point and the relevant extraordinary optical transmission (EOT) are achieved using this 3D-tapered, 20 nm Au nanohole.
authors.affiliation: Department of Chemical and Biomolecular Engineering, Graduate School of EEWS, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 305-701, Republic of Korea.
authors.forename: Sol-Ah
authors.initials: SA
authors.lastname: Lee
authors.forename: Hong Suk
authors.initials: HS
authors.lastname: Kang
authors.forename: Jung-Ki
authors.initials: JK
authors.lastname: Park
authors.forename: Seungwoo
authors.initials: S
authors.lastname: Lee
keywords: 3D metallic nanohole; directional photofluidization; nanofocusing; plasmonics