title: Improvement in the breakdown endurance of high-κ dielectric by utilizing stacking technology and adding sufficient interfacial layer.
abstract: Improvement in the time-zero dielectric breakdown (TZDB) endurance of metal-oxide-semiconductor (MOS) capacitor with stacking structure of Al/HfO2/SiO2/Si is demonstrated in this work. The misalignment of the conduction paths between two stacking layers is believed to be effective to increase the breakdown field of the devices. Meanwhile, the resistance of the dielectric after breakdown for device with stacking structure would be less than that of without stacking structure due to a higher breakdown field and larger breakdown power. In addition, the role of interfacial layer (IL) in the control of the interface trap density (D it) and device reliability is also analyzed. Device with a thicker IL introduces a higher breakdown field and also a lower D it. High-resolution transmission electron microscopy (HRTEM) of the samples with different IL thicknesses is provided to confirm that IL is needed for good interfacial property.
authors.affiliation: Department of Electrical Engineering and the Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 10617, Taiwan.
authors.forename: Chin-Sheng
authors.initials: CS
authors.lastname: Pang
authors.affiliation: Department of Electrical Engineering and the Graduate Institute of Electronics Engineering, National Taiwan University, Taipei 10617, Taiwan.
authors.forename: Jenn-Gwo
authors.initials: JG
authors.lastname: Hwu
keywords: HfO2/SiO2; Interface trap density; Interfacial layer; MOS; Nitric acid oxidation; Stacking structure; Time-zero dielectric breakdown