title: [Effects of annealing temperature on the structure and optical properties of ZnMgO films prepared by atom layer deposition].
abstract: In the present paper, we report the research on the effects of annealing temperature on the crystal quality and optical properties of ZnMgO films deposited by atom layer deposition(ALD). ZnMgO films were prepared on quartz substrates by ALD and then some of the samples were treated in air ambient at different annealing temperature. The effects of annealing temperature on the crystal quality and optical properties of ZnMgO films were characterized by X-ray diffraction (XRD), photoluminescence (PL) and ultraviolet-visible (UV-Vis) absorption spectra. The XRD results showed that the crystal quality of ZnMgO films was significantly improved when the annealing temperature was 600 degrees C, meanwhile the intensity of(100) diffraction peak was the strongest. Combination of PL and UV-Vis absorption measurements showed that it can strongly promote the Mg content increasing in ZnMgO films and increase the band gap of films. So the results illustrate that suitable annealing temperature can effectively improve the crystal quality and optical properties of ZnMgO films.
authors.forename: Dong-Xiao
authors.initials: DX
authors.lastname: Sun
authors.forename: Jin-Hua
authors.initials: JH
authors.lastname: Li
authors.forename: Xuan
authors.initials: X
authors.lastname: Fang
authors.forename: Xin-Ying
authors.initials: XY
authors.lastname: Chen
authors.forename: Fang
authors.initials: F
authors.lastname: Fang
authors.forename: Xue-Ying
authors.initials: XY
authors.lastname: Chu
authors.forename: Zhi-Peng
authors.initials: ZP
authors.lastname: Wei
authors.forename: Xiao-Hua
authors.initials: XH
authors.lastname: Wang