title: Time-resolved x-ray diffraction techniques for bulk polycrystalline materials under dynamic loading.
abstract: We have developed two techniques for time-resolved x-ray diffraction from bulk polycrystalline materials during dynamic loading. In the first technique, we synchronize a fast detector with loading of samples at strain rates of ~10(3)-10(4) s(-1) in a compression Kolsky bar (split Hopkinson pressure bar) apparatus to obtain in situ diffraction patterns with exposures as short as 70 ns. This approach employs moderate x-ray energies (10-20 keV) and is well suited to weakly absorbing materials such as magnesium alloys. The second technique is useful for more strongly absorbing materials, and uses high-energy x-rays (86 keV) and a fast shutter synchronized with the Kolsky bar to produce short (~40 μs) pulses timed with the arrival of the strain pulse at the specimen, recording the diffraction pattern on a large-format amorphous silicon detector. For both techniques we present sample data demonstrating the ability of these techniques to characterize elastic strains and polycrystalline texture as a function of time during high-rate deformation.
authors.affiliation: Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: P K
authors.initials: PK
authors.lastname: Lambert
authors.affiliation: Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: C J
authors.initials: CJ
authors.lastname: Hustedt
authors.affiliation: Department of NanoEngineering, University of California San Diego, La Jolla, California 92093, USA.
authors.forename: K S
authors.initials: KS
authors.lastname: Vecchio
authors.affiliation: Oak Ridge Institute for Science and Education, Oak Ridge, Tennessee 37830, USA.
authors.forename: E L
authors.initials: EL
authors.lastname: Huskins
authors.affiliation: US Army Research Laboratory, Aberdeen Proving Ground, Aberdeen, Maryland 21005, USA.
authors.forename: D T
authors.initials: DT
authors.lastname: Casem
authors.affiliation: Department of Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: S M
authors.initials: SM
authors.lastname: Gruner
authors.affiliation: Department of Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: M W
authors.initials: MW
authors.lastname: Tate
authors.affiliation: Department of Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: H T
authors.initials: HT
authors.lastname: Philipp
authors.affiliation: Cornell High Energy Synchrotron Source (CHESS), Cornell University, Ithaca, New York 14853, USA.
authors.forename: A R
authors.initials: AR
authors.lastname: Woll
authors.affiliation: Department of Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: P
authors.initials: P
authors.lastname: Purohit
authors.affiliation: Department of Physics, Cornell University, Ithaca, New York 14853, USA.
authors.forename: J T
authors.initials: JT
authors.lastname: Weiss
authors.affiliation: Department of Mechanical Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: V
authors.initials: V
authors.lastname: Kannan
authors.affiliation: Department of Mechanical Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: K T
authors.initials: KT
authors.lastname: Ramesh
authors.affiliation: X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: P
authors.initials: P
authors.lastname: Kenesei
authors.affiliation: X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: J S
authors.initials: JS
authors.lastname: Okasinski
authors.affiliation: X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: J
authors.initials: J
authors.lastname: Almer
authors.affiliation: Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: M
authors.initials: M
authors.lastname: Zhao
authors.affiliation: Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: A G
authors.initials: AG
authors.lastname: Ananiadis
authors.affiliation: Department of Materials Science and Engineering, Johns Hopkins University, Baltimore, Maryland 21218, USA.
authors.forename: T C
authors.initials: TC
authors.lastname: Hufnagel
mesh_terms: D004548:Elasticity; D054023:Lasers, Semiconductor; D008422:Materials Testing / Q000295:instrumentation*; D011312:Pressure; D013314:Stress, Mechanical; D013997:Time Factors; D016474:Weight-Bearing; D014961:X-Ray Diffraction / Q000295:instrumentation*