title: Scale-invariant quantum anomalous Hall effect in magnetic topological insulators beyond the two-dimensional limit.
abstract: We investigate the quantum anomalous Hall effect (QAHE) and related chiral transport in the millimeter-size (Cr(0.12)Bi(0.26)Sb(0.62))₂Te₃ films. With high sample quality and robust magnetism at low temperatures, the quantized Hall conductance of e²/h is found to persist even when the film thickness is beyond the two-dimensional (2D) hybridization limit. Meanwhile, the Chern insulator-featured chiral edge conduction is manifested by the nonlocal transport measurements. In contrast to the 2D hybridized thin film, an additional weakly field-dependent longitudinal resistance is observed in the ten-quintuple-layer film, suggesting the influence of the film thickness on the dissipative edge channel in the QAHE regime. The extension of the QAHE into the three-dimensional thickness region addresses the universality of this quantum transport phenomenon and motivates the exploration of new QAHE phases with tunable Chern numbers. In addition, the observation of scale-invariant dissipationless chiral propagation on a macroscopic scale makes a major stride towards ideal low-power interconnect applications.
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Xufeng
authors.initials: X
authors.lastname: Kou
authors.affiliation: Institute of Physics, Academia Sinica, Taipei 11529, Taiwan.
authors.forename: Shih-Ting
authors.initials: ST
authors.lastname: Guo
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Yabin
authors.initials: Y
authors.lastname: Fan
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Lei
authors.initials: L
authors.lastname: Pan
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Murong
authors.initials: M
authors.lastname: Lang
authors.affiliation: Center for Electron Microscopy and State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
authors.forename: Ying
authors.initials: Y
authors.lastname: Jiang
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Qiming
authors.initials: Q
authors.lastname: Shao
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Tianxiao
authors.initials: T
authors.lastname: Nie
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Koichi
authors.initials: K
authors.lastname: Murata
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Jianshi
authors.initials: J
authors.lastname: Tang
authors.affiliation: Center for Electron Microscopy and State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
authors.forename: Yong
authors.initials: Y
authors.lastname: Wang
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Liang
authors.initials: L
authors.lastname: He
authors.affiliation: Institute of Physics, Academia Sinica, Taipei 11529, Taiwan.
authors.forename: Ting-Kuo
authors.initials: TK
authors.lastname: Lee
authors.affiliation: Institute of Physics, Academia Sinica, Taipei 11529, Taiwan.
authors.forename: Wei-Li
authors.initials: WL
authors.lastname: Lee
authors.affiliation: Department of Electrical Engineering, University of California, Los Angeles, California 90095, USA.
authors.forename: Kang L
authors.initials: KL
authors.lastname: Wang