title: Improving area-selective molecular layer deposition by selective SAM removal.
abstract: Area selective molecular layer deposition (MLD) is a promising technique for achieving micro- or nanoscale patterned organic structures. However, this technique still faces challenges in attaining high selectivity, especially at large MLD cycle numbers. Here, we illustrate a new strategy for achieving high quality patterns in selective film deposition on patterned Cu/Si substrates. We employed the intrinsically selective adsorption of an octadecylphosphonic acid self-assembled monolayer (SAM) on Cu over Si surfaces to selectively create a resist layer only on Cu. MLD was then performed on the patterns to deposit organic films predominantly on the Si surface, with only small amounts growing on the Cu regions. A negative potential bias was subsequently applied to the pattern to selectively desorb the layer of SAMs electrochemically from the Cu surface while preserving the MLD films on Si. Selectivity could be enhanced up to 30-fold after this treatment.
authors.affiliation: Department of Chemical Engineering and ‡Department of Material Science and Engineering, Stanford University , Stanford, California 94305-5025, United States.
authors.forename: Chaiya
authors.initials: C
authors.lastname: Prasittichai
authors.forename: Katie L
authors.initials: KL
authors.lastname: Pickrahn
authors.forename: Fatemeh Sadat Minaye
authors.initials: FS
authors.lastname: Hashemi
authors.forename: David S
authors.initials: DS
authors.lastname: Bergsman
authors.forename: Stacey F
authors.initials: SF
authors.lastname: Bent
keywords: molecular layer deposition (MLD); organic thin film; patterned organic structures; reductive SAM desorption; selective deposition; self-assembled monolayer