title: Low-index nanopatterned barrier for hybrid oxide-free III-V silicon conductive bonding.
abstract: Oxide-free bonding of a III-V active stack emitting at 1300-1600 nm to a silicon-on-insulator wafer offers the capability to electrically inject lasers from the silicon side. However, a typical 500-nm-thick silicon layer notably attracts the fundamental guided mode of the silicon + III-V stack, a detrimental feature compared to established III-V Separate-Confinement Heterostructure (SCH) stacks. We experimentally probe with photoluminescence as an internal light source the guiding behavior for oxide-free bonding to a nanopatterned silicon wafer that acts as a low-index barrier. We use a sub-wavelength square array of small holes as an effective "low-index silicon" medium. It is weakly modulated along one dimension (superperiodic array) to outcouple the resulting guided modes to free space, where we use an angle-resolved spectroscopy study. Analysis of experimental branches confirms the capability to operate with a fundamental mode well localized in the III-V heterostructures.
authors.forename: Kristelle
authors.initials: K
authors.lastname: Bougot-Robin
authors.forename: Anne
authors.initials: A
authors.lastname: Talneau
authors.forename: Henri
authors.initials: H
authors.lastname: Benisty
mesh_terms: D004867:Equipment Design; D007834:Lasers; D010087:Oxides / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry*
chemical_list: D010087:Oxides; D012825:Silicon