title: Significant improvements in stability and reproducibility of atomic-scale atomic force microscopy in liquid.
abstract: Recent advancement of dynamic-mode atomic force microscopy (AFM) for liquid-environment applications enabled atomic-scale studies on various interfacial phenomena. However, instabilities and poor reproducibility of the measurements often prevent systematic studies. To solve this problem, we have investigated the effect of various tip treatment methods for atomic-scale imaging and force measurements in liquid. The tested methods include Si coating, Ar plasma, Ar sputtering and UV/O₃ cleaning. We found that all the methods provide significant improvements in both the imaging and force measurements in spite of the tip transfer through the air. Among the methods, we found that the Si coating provides the best stability and reproducibility in the measurements. To understand the origin of the fouling resistance of the cleaned tip surface and the difference between the cleaning methods, we have investigated the tip surface properties by x-ray photoelectron spectroscopy and contact angle measurements. The results show that the contaminations adsorbed on the tip during the tip transfer through the air should desorb from the surface when it is immersed in aqueous solution due to the enhanced hydrophilicity by the tip treatments. The tip surface prepared by the Si coating is oxidized when it is immersed in aqueous solution. This creates local spots where stable hydration structures are formed. For the other methods, there is no active mechanism to create such local hydration sites. Thus, the hydration structure formed under the tip apex is not necessarily stable. These results reveal the desirable tip properties for atomic-scale AFM measurements in liquid, which should serve as a guideline for further improvements of the tip treatment methods.
authors.affiliation: Division of Electrical Engineering and Computer Science, Kanazawa University, Kakuma-machi, Kanazawa 920-1192, Japan.
authors.forename: S M R
authors.initials: SM
authors.lastname: Akrami
authors.forename: H
authors.initials: H
authors.lastname: Nakayachi
authors.forename: T
authors.initials: T
authors.lastname: Watanabe-Nakayama
authors.forename: H
authors.initials: H
authors.lastname: Asakawa
authors.forename: T
authors.initials: T
authors.lastname: Fukuma