title: Graphene oxide-based micropatterns via high-throughput multiphoton-induced reduction and ablation.
abstract: In this study, a developed temporal focusing-based femtosecond laser system provides high-throughput multiphoton-induced reduction and ablation of graphene oxide (GO) films. Integrated with a digital micromirror device to locally control the laser pulse numbers, GO-based micropatterns can be quickly achieved instantly. Furthermore, the degree of reduction and ablation can be precisely adjusted via controlling the laser wavelength, power, and pulse number. Compared to point-by-point scanning laser direct writing, this approach offers a high-throughput and multiple-function approach to accomplish a large area of micro-scale patterns on GO films. The high-throughput micropatterning of GO via the temporal focusing-based femtosecond laser system fulfills the requirement of mass production for GO-based applications in microelectronic devices.
authors.forename: Yi-Cheng
authors.initials: YC
authors.lastname: Li
authors.forename: Te-Fu
authors.initials: TF
authors.lastname: Yeh
authors.forename: Hsin-Chieh
authors.initials: HC
authors.lastname: Huang
authors.forename: Hsin-Yu
authors.initials: HY
authors.lastname: Chang
authors.forename: Chun-Yu
authors.initials: CY
authors.lastname: Lin
authors.forename: Li-Chung
authors.initials: LC
authors.lastname: Cheng
authors.forename: Chia-Yuan
authors.initials: CY
authors.lastname: Chang
authors.forename: Hsisheng
authors.initials: H
authors.lastname: Teng
authors.forename: Shean-Jen
authors.initials: SJ
authors.lastname: Chen