title: Study of N-isopropoxypropyl-N'-ethoxycarbonyl thiourea adsorption on chalcopyrite using in situ SECM, ToF-SIMS and XPS.
abstract: In situ scanning electrochemical microscopy (SECM) was used to study N-isopropoxypropyl-N'-ethoxycarbonyl thiourea (iPOPECTU) adsorption on chalcopyrite. The in situ SECM images indicated a preferential adsorption of iPOPECTU on chalcopyrite surfaces, resulting in a decrease in the probing electrochemical current response. The surfaces after iPOPECTU adsorption were analyzed by time-of-flight secondary ion mass spectrometry (ToF-SIMS) and X-ray photoelectron spectroscopy (XPS). ToF-SIMS results provided a strong evidence of iPOPECTU binding with copper only. XPS analysis showed the reduction of cupric to cuprous on chalcopyrite surfaces as a result of iPOPECTU adsorption. Our results shed light on adsorption mechanism of iPOPECTU on the surface of chalcopyrite samples.
authors.affiliation: College of Chemistry and Chemical Engineering, Central South University, Changsha 410083, China. Electronic address: guangyiliu@csu.edu.cn.
authors.forename: Guangyi
authors.initials: G
authors.lastname: Liu
authors.affiliation: College of Chemistry and Chemical Engineering, Central South University, Changsha 410083, China.
authors.forename: Zhaohui
authors.initials: Z
authors.lastname: Qiu
authors.affiliation: Department of Chemical and Materials Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada.
authors.forename: Jingyi
authors.initials: J
authors.lastname: Wang
authors.affiliation: Department of Chemical and Materials Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada.
authors.forename: Qingxia
authors.initials: Q
authors.lastname: Liu
authors.affiliation: College of Chemistry and Chemical Engineering, Central South University, Changsha 410083, China.
authors.forename: Jingjing
authors.initials: J
authors.lastname: Xiao
authors.affiliation: Department of Chemical and Materials Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada.
authors.forename: Hongbo
authors.initials: H
authors.lastname: Zeng
authors.affiliation: College of Chemistry and Chemical Engineering, Central South University, Changsha 410083, China.
authors.forename: Hong
authors.initials: H
authors.lastname: Zhong
authors.affiliation: Department of Chemical and Materials Engineering, University of Alberta, Edmonton, Alberta T6G 2V4, Canada. Electronic address: zhenghe@ualberta.ca.
authors.forename: Zhenghe
authors.initials: Z
authors.lastname: Xu
keywords: Adsorption; Chalcopyrite; In situ SECM; N-isopropoxypropyl-N’-ethoxycarbonyl thiourea; ToF-SIMS