title: Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source.
abstract: A self-contained electro-optical module for scanning extreme ultraviolet (EUV) reflection microscopy at 13.5 nm wavelength has been developed. The system has been designed to work with stand-alone commercially available EUV high harmonic generation (HHG) sources through the implementation of narrowband harmonic selecting multilayers and off-axis elliptical short focal length zoneplates. The module has been successfully integrated into an EUV mask scanning microscope achieving diffraction limited imaging performance (84 nm point spread function).
authors.forename: Patrick P
authors.initials: PP
authors.lastname: Naulleau
authors.forename: Christopher N
authors.initials: CN
authors.lastname: Anderson
authors.forename: Erik H
authors.initials: EH
authors.lastname: Anderson
authors.forename: Nord
authors.initials: N
authors.lastname: Andreson
authors.forename: Weilun
authors.initials: W
authors.lastname: Chao
authors.forename: Changhoon
authors.initials: C
authors.lastname: Choi
authors.forename: Kenneth A
authors.initials: KA
authors.lastname: Goldberg
authors.forename: Eric M
authors.initials: EM
authors.lastname: Gullikson
authors.forename: Seong-Sue
authors.initials: SS
authors.lastname: Kim
authors.forename: Donggun
authors.initials: D
authors.lastname: Lee
authors.forename: Ryan
authors.initials: R
authors.lastname: Miyakawa
authors.forename: Jongju
authors.initials: J
authors.lastname: Park
authors.forename: Seno
authors.initials: S
authors.lastname: Rekawa
authors.forename: Farhad
authors.initials: F
authors.lastname: Salmassi