title: Design of a compact ultrahigh vacuum-compatible setup for the analysis of chemical vapor deposition processes.
abstract: Optimizing thin film deposition techniques requires contamination-free transfer from the reactor into an ultrahigh vacuum (UHV) chamber for surface science analysis. A very compact, multifunctional Chemical Vapor Deposition (CVD) reactor for direct attachment to any typical UHV system for thin film analysis was designed and built. Besides compactness, fast, easy, and at the same time ultimately clean sample transfer between reactor and UHV was a major goal. It was achieved by a combination of sample manipulation parts, sample heater, and a shutter mechanism designed to fit all into a NW38 Conflat six-ways cross. The present reactor design is versatile to be employed for all commonly employed variants of CVD, including Atomic Layer Deposition. A demonstration of the functionality of the system is provided. First results of the setup (attached to an Omicron Multiprobe x-ray photoelectron spectroscopy system) on the temperature dependence of Pulsed Spray Evaporation-CVD of Ni films from Ni acetylacetonate as the precursor demonstrate the reactor performance and illustrate the importance of clean sample transfer without breaking vacuum in order to obtain unambiguous results on the quality of CVD-grown thin Ni films. The widely applicable design holds promise for future systematic studies of the fundamental processes during chemical vapor deposition or atomic layer deposition.
authors.affiliation: Institut für Angewandte und Physikalische Chemie, Universität Bremen, Leobener Straße UFT, D-28359 Bremen, Germany.
authors.forename: Theodor
authors.initials: T
authors.lastname: Weiss
authors.affiliation: Institut für Angewandte und Physikalische Chemie, Universität Bremen, Leobener Straße UFT, D-28359 Bremen, Germany.
authors.forename: Martin
authors.initials: M
authors.lastname: Nowak
authors.affiliation: Physikalische Chemie I, Fakultät für Chemie, Universität Bielefeld, Universitätsstraße 25, D-33615 Bielefeld, Germany.
authors.forename: Udo
authors.initials: U
authors.lastname: Mundloch
authors.affiliation: Institut für Angewandte und Physikalische Chemie, Universität Bremen, Leobener Straße UFT, D-28359 Bremen, Germany.
authors.forename: Volkmar
authors.initials: V
authors.lastname: Zielasek
authors.affiliation: Physikalische Chemie I, Fakultät für Chemie, Universität Bielefeld, Universitätsstraße 25, D-33615 Bielefeld, Germany.
authors.forename: Katharina
authors.initials: K
authors.lastname: Kohse-Höinghaus
authors.affiliation: Institut für Angewandte und Physikalische Chemie, Universität Bremen, Leobener Straße UFT, D-28359 Bremen, Germany.
authors.forename: Marcus
authors.initials: M
authors.lastname: Bäumer