title: The deviation of growth model for transparent conductive graphene.
abstract: An approximate growth model was employed to predict the time required to grow a graphene film by chemical vapor deposition (CVD). Monolayer graphene films were synthesized on Cu foil at various hydrogen flow rates from 10 to 50 sccm. The sheet resistance of the graphene film was 310Ω/□ and the optical transmittance was 97.7%. The Raman intensity ratio of the G-peak to the 2D peak of the graphene film was as high as ~4 when the hydrogen flow rate was 30 sccm. The fitting curve obtained by the deviation equation of growth model closely matches the data. We believe that under the same conditions and with the same setup, the presented growth model can help manufacturers and academics to predict graphene growth time more accurately.
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Shih-Hao
authors.initials: SH
authors.lastname: Chan
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Jia-Wei
authors.initials: JW
authors.lastname: Chen
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Hung-Pin
authors.initials: HP
authors.lastname: Chen
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Hung-Sen
authors.initials: HS
authors.lastname: Wei
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan ; Optical Sciences Center/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Meng-Chi
authors.initials: MC
authors.lastname: Li
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Sheng-Hui
authors.initials: SH
authors.lastname: Chen
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Cheng-Chung
authors.initials: CC
authors.lastname: Lee
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan ; Graduate Institute of Energy Engineering/Thin Film Technology Center, National Central University, 300 Chung-Da Rd, Chung-Li 32001, Taiwan.
authors.forename: Chien-Cheng
authors.initials: CC
authors.lastname: Kuo
keywords: Chemical vapor deposition; Graphene; Transparent conductive electrode