title: Fabricating nanostructures on fused silica using femtosecond infrared pulses combined with sub-nanojoule ultraviolet pulses.
abstract: Circular craters with diameters of 500 nm are fabricated on the surface of fused silica by femtosecond ultraviolet-infrared (UV-IR) pulse trains with 0.8 nJ UV pulse energy. UV damage thresholds at different IR energies and UV-IR delays are measured. Diameters and depths of the ablated craters can be modified by adding the IR pulse and varying the UV-IR delays. These results demonstrate the feasibility of nanomachining using short wavelength lasers with pulse energy far below normal damage thresholds.
authors.forename: Xiaoming
authors.initials: X
authors.lastname: Yu
authors.forename: Zenghu
authors.initials: Z
authors.lastname: Chang
authors.forename: P B
authors.initials: PB
authors.lastname: Corkum
authors.forename: Shuting
authors.initials: S
authors.lastname: Lei