title: Atomic layer deposition of L-alanine polypeptide.
abstract: L-Alanine polypeptide thin films were synthesized via atomic layer deposition (ALD). Instead of using an amino acid monomer as the precursor, an L-alanine amino acid derivatized with a protecting group was used to prevent self-polymerization, increase the vapor pressure, and allow linear cycle-by-cycle growth emblematic of ALD. The successful deposition of a conformal polypeptide film has been confirmed by FTIR, TEM, and Mass Spectrometry, and the ALD process has been extended to polyvaline.
authors.affiliation: Department of Chemical and Biological Engineering and Center for Micro-engineered Materials, University of New Mexico , Albuquerque, New Mexico 87131, United States.
authors.forename: Yaqin
authors.initials: Y
authors.lastname: Fu
authors.forename: Binsong
authors.initials: B
authors.lastname: Li
authors.forename: Ying-Bing
authors.initials: YB
authors.lastname: Jiang
authors.forename: Darren R
authors.initials: DR
authors.lastname: Dunphy
authors.forename: Andy
authors.initials: A
authors.lastname: Tsai
authors.forename: Siu-Yue
authors.initials: SY
authors.lastname: Tam
authors.forename: Hongyou
authors.initials: H
authors.lastname: Fan
authors.forename: Hongxia
authors.initials: H
authors.lastname: Zhang
authors.forename: David
authors.initials: D
authors.lastname: Rogers
authors.forename: Susan
authors.initials: S
authors.lastname: Rempe
authors.forename: Plamen
authors.initials: P
authors.lastname: Atanassov
authors.forename: Joseph L
authors.initials: JL
authors.lastname: Cecchi
authors.forename: C Jeffrey
authors.initials: CJ
authors.lastname: Brinker
mesh_terms: D000409:Alanine / Q000737:chemistry*; D053758:Nanoparticles / Q000737:chemistry; D010455:Peptides / Q000737:chemistry*; D058105:Polymerization; D012822:Silicon Dioxide / Q000737:chemistry
chemical_list: D010455:Peptides; D012822:Silicon Dioxide; D000409:Alanine