Polymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning.
We demonstrate the repeated utilization of self-assembled colloidal spheres for rapid nanopattern generations. Highly ordered micro-/nanosphere arrays were interlinked and confined by a soft transparent polymer (polydimethylsiloxane, PDMS), which can be used as light-focusing elements/photomasks for area-selective exposures of photoresist in contact. Because of the stiffness of the colloidal spheres, the photomasks do not encounter feature-deformation problems, enabling reliable production of highly uniform patterns over large areas. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design and exposure time. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications.
Department of Physics and Materials Science, ⊥Department of Biology and Chemistry, §Department of Electronic Engineering, and #Centre for Functional Photonics (CFP), City University of Hong Kong , 83 Tat Chee Avenue, Kowloon Tong, Kowloon, Hong Kong.
Ming
M
Fang
Hao
H
Lin
Ho-Yuen
HY
Cheung
Fei
F
Xiu
Lifan
L
Shen
SenPo
S
Yip
Edwin Yue-Bun
EY
Pun
Chun-Yuen
CY
Wong
Johnny C
JC
Ho
colloidal monolayer; nanopatterning; reusable; soft photomask; wafer scale