Sub-10 nm features obtained from directed self-assembly of semicrystalline polycarbosilane-based block copolymer thin films.
Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)-block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.
Laboratoire de Chimie des Polymères Organiques, Université de Bordeaux - CNRS UMR 5629 - ENSCPB, 16 Avenue Pey-Berland, F-33607, Pessac Cedex, France.
Karim
K
Aissou
Muhammad
M
Mumtaz
Guillaume
G
Fleury
Giuseppe
G
Portale
Christophe
C
Navarro
Eric
E
Cloutet
Cyril
C
Brochon
Caroline A
CA
Ross
Georges
G
Hadziioannou
anionic polymerization; block copolymer; crystallization; directed self-assembly; long-range order