title: Vertically polarizing undulator with the dynamic compensation of magnetic forces for the next generation of light sources.
abstract: A short prototype (847-mm-long) of an Insertion Device (ID) with the dynamic compensation of ID magnetic forces has been designed, built, and tested at the Advanced Photon Source (APS) of the Argonne National Laboratory. The ID magnetic forces were compensated by the set of conical springs placed along the ID strongback. Well-controlled exponential characteristics of conical springs permitted a very close fit to the ID magnetic forces. Several effects related to the imperfections of actual springs, their mounting and tuning, and how these factors affect the prototype performance has been studied. Finally, series of tests to determine the accuracy and reproducibility of the ID magnetic gap settings have been carried out. Based on the magnetic measurements of the ID Beff, it has been demonstrated that the magnetic gaps within an operating range were controlled accurately and reproducibly within ±1 μm. Successful tests of this ID prototype led to the design of a 3-m long device based on the same concept. The 3-m long prototype is currently under construction. It represents R&D efforts by the APS toward APS Upgrade Project goals as well as the future generation of IDs for the Linac Coherent Light Source (LCLS).
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: N
authors.initials: N
authors.lastname: Strelnikov
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: E
authors.initials: E
authors.lastname: Trakhtenberg
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: I
authors.initials: I
authors.lastname: Vasserman
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: J
authors.initials: J
authors.lastname: Xu
authors.affiliation: Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, USA.
authors.forename: E
authors.initials: E
authors.lastname: Gluskin