title: Nanostructured TiO2/carbon nanosheet hybrid electrode for high-rate thin-film lithium-ion batteries.
abstract: Heterogeneous nanostructured electrodes using carbon nanosheets (CNS) and TiO2 exhibit high electronic and ionic conductivity. In order to realize the chip level power sources, it is necessary to employ microelectronic compatible techniques for the fabrication and characterization of TiO2-CNS thin-film electrodes. To achieve this, vertically standing CNS grown through a catalytic free approach on a TiN/SiO2/Si substrate by plasma enhanced chemical vapour deposition (PECVD) was used. The substrate-attached CNS is responsible for the sufficient electronic conduction and increased surface-to-volume ratio due to its unique morphology. Atomic layer deposition (ALD) of nanostructured amorphous TiO2 on CNS provides enhanced Li storage capacity, high rate performance and stable cycling. The amount of deposited TiO2 masks the underlying CNS, thereby controlling the accessibility of CNS, which gets reflected in the total electrochemical performance, as revealed by the cyclic voltammetry and charge/discharge measurements. TiO2 thin-films deposited with 300, 400 and 500 ALD cycles on CNS have been studied to understand the kinetics of Li insertion/extraction. A large potential window of operation (3-0.01 V); the excellent cyclic stability, with a capacity retention of 98% of the initial value; and the remarkable rate capability (up to 100 C) are the highlights of TiO2/CNS thin-film anode structures. CNS with an optimum amount of TiO2 coating is proposed as a promising approach for the fabrication of electrodes for chip compatible thin-film Li-ion batteries.
authors.affiliation: Imec, Kapeldreef 75, B-3001 Leuven, Belgium.
authors.forename: S
authors.initials: S
authors.lastname: Moitzheim
authors.forename: C S
authors.initials: CS
authors.lastname: Nimisha
authors.forename: Shaoren
authors.initials: S
authors.lastname: Deng
authors.forename: Daire J
authors.initials: DJ
authors.lastname: Cott
authors.forename: C
authors.initials: C
authors.lastname: Detavernier
authors.forename: P M
authors.initials: PM
authors.lastname: Vereecken