title: Numerical correction of anti-symmetric aberrations in single HRTEM images of weakly scattering 2D-objects.
abstract: Here, we present a numerical post-processing method for removing the effect of anti-symmetric residual aberrations in high-resolution transmission electron microscopy (HRTEM) images of weakly scattering 2D-objects. The method is based on applying the same aberrations with the opposite phase to the Fourier transform of the recorded image intensity and subsequently inverting the Fourier transform. We present the theoretical justification of the method, and its verification based on simulated images in the case of low-order anti-symmetric aberrations. Ultimately the method is applied to experimental hardware aberration-corrected HRTEM images of single-layer graphene and MoSe₂ resulting in images with strongly reduced residual low-order aberrations, and consequently improved interpretability. Alternatively, this method can be used to estimate by trial and error the residual anti-symmetric aberrations in HRTEM images of weakly scattering objects.
authors.affiliation: Central Facility for Electron Microscopy, Group of Electron Microscopy of Materials Science, University of Ulm, 89081 Ulm, Germany. Electronic address: ossi.lehtinen@gmail.com.
authors.forename: Ossi
authors.initials: O
authors.lastname: Lehtinen
authors.affiliation: Central Facility for Electron Microscopy, Group of Electron Microscopy of Materials Science, University of Ulm, 89081 Ulm, Germany.
authors.forename: Dorin
authors.initials: D
authors.lastname: Geiger
authors.affiliation: Central Facility for Electron Microscopy, Group of Electron Microscopy of Materials Science, University of Ulm, 89081 Ulm, Germany.
authors.forename: Zhongbo
authors.initials: Z
authors.lastname: Lee
authors.affiliation: Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
authors.forename: Michael Brian
authors.initials: MB
authors.lastname: Whitwick
authors.affiliation: Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
authors.forename: Ming-Wei
authors.initials: MW
authors.lastname: Chen
authors.affiliation: Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
authors.forename: Andras
authors.initials: A
authors.lastname: Kis
authors.affiliation: Central Facility for Electron Microscopy, Group of Electron Microscopy of Materials Science, University of Ulm, 89081 Ulm, Germany.
authors.forename: Ute
authors.initials: U
authors.lastname: Kaiser
keywords: Correction; HRTEM; Numerical image processing; Residual aberrations