title: Detailed statistical contact angle analyses; "slow moving" drops on inclining silicon-oxide surfaces.
abstract: Contact angle determination by sessile drop technique is essential to characterise surface properties in science and in industry. Different specific angles can be observed on every solid which are correlated with the advancing or the receding of the triple line. Different procedures and definitions for the determination of specific angles exist which are often not comprehensible or reproducible. Therefore one of the most important things in this area is to build standard, reproducible and valid methods for determining advancing/receding contact angles. This contribution introduces novel techniques to analyse dynamic contact angle measurements (sessile drop) in detail which are applicable for axisymmetric and non-axisymmetric drops. Not only the recently presented fit solution by sigmoid function and the independent analysis of the different parameters (inclination, contact angle, velocity of the triple point) but also the dependent analysis will be firstly explained in detail. These approaches lead to contact angle data and different access on specific contact angles which are independent from "user-skills" and subjectivity of the operator. As example the motion behaviour of droplets on flat silicon-oxide surfaces after different surface treatments is dynamically measured by sessile drop technique when inclining the sample plate. The triple points, the inclination angles, the downhill (advancing motion) and the uphill angles (receding motion) obtained by high-precision drop shape analysis are independently and dependently statistically analysed. Due to the small covered distance for the dependent analysis (<0.4mm) and the dominance of counted events with small velocity the measurements are less influenced by motion dynamics and the procedure can be called "slow moving" analysis. The presented procedures as performed are especially sensitive to the range which reaches from the static to the "slow moving" dynamic contact angle determination. They are characterised by small deviations of the computed values. Additional to the detailed introduction of this novel analytical approaches plus fit solution special motion relations for the drop on inclined surfaces and detailed relations about the reactivity of the freshly cleaned silicon wafer surface resulting in acceleration behaviour (reactive de-wetting) are presented.
authors.affiliation: Physical Chemistry, Saarland University, Campus B 2 2, 66123 Saarbrücken, Germany. Electronic address: mic.schmitt@mx.uni-saarland.de.
authors.forename: M
authors.initials: M
authors.lastname: Schmitt
authors.affiliation: Physical Chemistry, Saarland University, Campus B 2 2, 66123 Saarbrücken, Germany. Electronic address: s9kjgros@stud.uni-saarland.de.
authors.forename: K
authors.initials: K
authors.lastname: Groß
authors.affiliation: Physical Chemistry, Saarland University, Campus B 2 2, 66123 Saarbrücken, Germany. Electronic address: s9jugrub@stud.uni-saarland.de.
authors.forename: J
authors.initials: J
authors.lastname: Grub
authors.affiliation: Physical Chemistry, Saarland University, Campus B 2 2, 66123 Saarbrücken, Germany. Electronic address: f.heib@mx.uni-saarland.de.
authors.forename: F
authors.initials: F
authors.lastname: Heib
keywords: Contact angle; Inclining; Sessile drop; Silicon wafer surface; Statistical analysis