title: Transition metal dichalcogenide growth via close proximity precursor supply.
abstract: Reliable chemical vapour deposition (CVD) of transition metal dichalcogenides (TMDs) is currently a highly pressing research field, as numerous potential applications rely on the production of high quality films on a macroscopic scale. Here, we show the use of liquid phase exfoliated nanosheets and patterned sputter deposited layers as solid precursors for chemical vapour deposition. TMD monolayers were realized using a close proximity precursor supply in a CVD microreactor setup. A model describing the growth mechanism, which is capable of producing TMD monolayers on arbitrary substrates, is presented. Raman spectroscopy, photoluminescence, X-ray photoelectron spectroscopy, atomic force microscopy, transmission electron microscopy, scanning electron microscopy and electrical transport measurements reveal the high quality of the TMD samples produced. Furthermore, through patterning of the precursor supply, we achieve patterned growth of monolayer TMDs in defined locations, which could be adapted for the facile production of electronic device components.
authors.affiliation: 1] School of Chemistry, Trinity College Dublin, Dublin 2, Ireland [2] Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Maria
authors.initials: M
authors.lastname: O'Brien
authors.affiliation: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Niall
authors.initials: N
authors.lastname: McEvoy
authors.affiliation: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Toby
authors.initials: T
authors.lastname: Hallam
authors.affiliation: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Hye-Young
authors.initials: HY
authors.lastname: Kim
authors.affiliation: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Nina C
authors.initials: NC
authors.lastname: Berner
authors.affiliation: 1] Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland [2] School of Physics, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Damien
authors.initials: D
authors.lastname: Hanlon
authors.affiliation: Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Kangho
authors.initials: K
authors.lastname: Lee
authors.affiliation: 1] Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland [2] School of Physics, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Jonathan N
authors.initials: JN
authors.lastname: Coleman
authors.affiliation: 1] School of Chemistry, Trinity College Dublin, Dublin 2, Ireland [2] Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and BioEngineering Research (AMBER) Centre, Trinity College Dublin, Dublin 2, Ireland.
authors.forename: Georg S
authors.initials: GS
authors.lastname: Duesberg