title: Bottom-up nanofabrication through catalyzed vapor phase HF etching of SiO2.
abstract: We show that a wide range of inorganic and organic molecules or nanostructures can enhance the vapor phase HF etching of SiO2 resulting in a negative tone pattern transfer to a SiO2 substrate. The templates used in this study include micron- and nanometer-sized NaCl crystals, graphene oxide flakes, and albumin molecules. In all cases, a negative-tone pattern transfer to the underlying SiO2 substrate was obtained. The results suggest that vapor phase HF etching could be a general purpose pattern transfer technique for nanoscale and supramolecular templates.
authors.affiliation: College of Materials and Environmental Engineering, Hangzhou Dianzi University, Hangzhou 310018, People's Republic of China. Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA.
authors.forename: Shichao
authors.initials: S
authors.lastname: Zhao
authors.forename: Haitao
authors.initials: H
authors.lastname: Liu