title: CMUTs with high-K atomic layer deposition dielectric material insulation layer.
abstract: Use of high-κ dielectric, atomic layer deposition (ALD) materials as an insulation layer material for capacitive micromachined ultrasonic transducers (CMUTs) is investigated. The effect of insulation layer material and thickness on CMUT performance is evaluated using a simple parallel plate model. The model shows that both high dielectric constant and the electrical breakdown strength are important for the dielectric material, and significant performance improvement can be achieved, especially as the vacuum gap thickness is reduced. In particular, ALD hafnium oxide (HfO2) is evaluated and used as an improvement over plasma-enhanced chemical vapor deposition (PECVD) silicon nitride (Six)Ny)) for CMUTs fabricated by a low-temperature, complementary metal oxide semiconductor transistor-compatible, sacrificial release method. Relevant properties of ALD HfO2) such as dielectric constant and breakdown strength are characterized to further guide CMUT design. Experiments are performed on parallel fabricated test CMUTs with 50-nm gap and 16.5-MHz center frequency to measure and compare pressure output and receive sensitivity for 200-nm PECVD Six)Ny) and 100-nm HfO2) insulation layers. Results for this particular design show a 6-dB improvement in receiver output with the collapse voltage reduced by one-half; while in transmit mode, half the input voltage is needed to achieve the same maximum output pressure.
authors.forename: Toby
authors.initials: T
authors.lastname: Xu
authors.forename: Coskun
authors.initials: C
authors.lastname: Tekes
authors.forename: F
authors.initials: F
authors.lastname: Degertekin
mesh_terms: D006195:Hafnium / Q000737:chemistry; D008422:Materials Testing; D010087:Oxides / Q000737:chemistry; D014159:Transducers; D014463:Ultrasonography / Q000295:instrumentation*
chemical_list: D010087:Oxides; C545179:hafnium oxide; D006195:Hafnium