title: Microcontact-printing-assisted access of graphitic carbon nitride films with favorable textures toward photoelectrochemical application.
abstract: An "ink" (cyanamide) infiltrated anodic aluminum oxide (AAO) stamp is found capable of printing carbon nitride films featuring regular microstructures of the stamp onto the substrates via in situ "chemical vapor deposition". A photocurrent density of 30.2 μA cm(-2 --) at 1.23 VRHE is achieved for a film on a conductive substrate, which is so far the highest value for pure carbon nitride based photoelectrochemical devices.
authors.affiliation: Max Planck Institute of Colloids and Interfaces, Research Campus Golm, Potsdam, 14424, Germany.
authors.forename: Jian
authors.initials: J
authors.lastname: Liu
authors.forename: Hongqiang
authors.initials: H
authors.lastname: Wang
authors.forename: Zu Peng
authors.initials: ZP
authors.lastname: Chen
authors.forename: Helmuth
authors.initials: H
authors.lastname: Moehwald
authors.forename: Sebastian
authors.initials: S
authors.lastname: Fiechter
authors.forename: Roel
authors.initials: R
authors.lastname: van de Krol
authors.forename: Liping
authors.initials: L
authors.lastname: Wen
authors.forename: Lei
authors.initials: L
authors.lastname: Jiang
authors.forename: Markus
authors.initials: M
authors.lastname: Antonietti
keywords: anodic aluminum oxide; graphitic carbon nitride film; microcontact printing; pattern; photoelectrochemical